Patents by Inventor Jong-Yoon Park

Jong-Yoon Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer polishing carrier apparatus and chemical mechanical polishing equipment using the same
    Patent number: 8202140
    Abstract: A wafer polishing carrier apparatus and a chemical mechanical polishing equipment employing the same includes a drive rotary union rotating on an axis and receiving a flow of fluid through a first conduit in a sealed-up state; driven rotary unions revolving on their own axis at different sides of the drive rotary union, and receiving the flow of fluid from the drive rotary union through a second conduit in a sealed-up state; a carrier attached to an end part of the driven rotary union to adsorb/detach a wafer using a fluid pressure provided through a third conduit connected through the second conduit; and a filter filtering pollution material in the fluid flowing in and out of the third conduit on the periphery of the carrier to prevent the pollution material from escaping external to the carrier, the pollution material generated from rotation of the drive rotary union and driven rotary unions.
    Type: Grant
    Filed: September 3, 2008
    Date of Patent: June 19, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong-Sung Hong, Jong-Yoon Park, Hyun-Joon Park
  • Wafer polishing carrier apparatus and chemical mechanical polishing equipment using the same
    Publication number: 20090068934
    Abstract: A wafer polishing carrier apparatus and a chemical mechanical polishing equipment employing the same includes a drive rotary union rotating on an axis and receiving a flow of fluid through a first conduit in a sealed-up state; driven rotary unions revolving on their own axis at different sides of the drive rotary union, and receiving the flow of fluid from the drive rotary union through a second conduit in a sealed-up state; a carrier attached to an end part of the driven rotary union to adsorb/detach a wafer using a fluid pressure provided through a third conduit connected through the second conduit; and a filter filtering pollution material in the fluid flowing in and out of the third conduit on the periphery of the carrier to prevent the pollution material from escaping external to the carrier, the pollution material generated from rotation of the drive rotary union and driven rotary unions.
    Type: Application
    Filed: September 3, 2008
    Publication date: March 12, 2009
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yong-Sung Hong, Jong-Yoon Park, Hyun-Joon Park