Patents by Inventor Jonghyun Rho

Jonghyun Rho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230139586
    Abstract: Discussed is a photodiode and a method for manufacturing the photodiode. The photodiode can include a semiconductor substrate, an insulating layer on the semiconductor substrate, an electrode on the insulating layer; and a graphene layer on the semiconductor substrate, the insulating layer, and the electrode, wherein the insulating layer can include an ion gel.
    Type: Application
    Filed: March 18, 2020
    Publication date: May 4, 2023
    Applicant: LG ELECTRONICS INC.
    Inventors: Jinwoo SUNG, Jonghyun RHO
  • Patent number: 9764956
    Abstract: The present invention provides a method for manufacturing graphene, said graphene, and an apparatus for manufacturing same. The method for manufacturing graphene comprises the steps of: loading a catalytic metal layer into a chamber; applying tensile force to the catalytic metal layer; and forming graphene on the catalytic metal layer by supplying a carbon source into the chamber while the tension is applied to the catalytic metal layer. Therefore, the size of the grains on the catalytic metal layer can be increased by applying tension to the catalytic metal layer, and high quality uniform graphene can be grown through the use of the catalytic metal layer.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: September 19, 2017
    Assignees: LG ELECTRONICS INC., SNU R&DB FOUNDATION
    Inventors: Jinsan Moon, Jonghyun Rho, Subeom Park, Taehyeong Kim, Byunghee Hong, Wonbae Park, Myunghee Jung
  • Patent number: 9666759
    Abstract: Disclosed is a method of manufacturing a light emitting device. More particularly, disclosed are a growth substrate, a nitride semiconductor device and a method of manufacturing a light emitting device. The method includes preparing a growth substrate including a metal substrate, forming a semiconductor structure including a nitride-based semiconductor on the growth substrate, providing a support structure on the semiconductor structure, and separating the growth substrate from the semiconductor structure.
    Type: Grant
    Filed: February 19, 2014
    Date of Patent: May 30, 2017
    Assignee: LG ELECTRONICS INC.
    Inventors: Jonghyun Rho, Minseok Choi, Taehyeong Kim
  • Publication number: 20150368109
    Abstract: The present invention provides a method for manufacturing graphene, said graphene, and an apparatus for manufacturing same. The method for manufacturing graphene comprises the steps of: loading a catalytic metal layer into a chamber; applying tensile force to the catalytic metal layer; and forming graphene on the catalytic metal layer by supplying a carbon source into the chamber while the tension is applied to the catalytic metal layer. Therefore, the size of the grains on the catalytic metal layer can be increased by applying tension to the catalytic metal layer, and high quality uniform graphene can be grown through the use of the catalytic metal layer.
    Type: Application
    Filed: August 1, 2013
    Publication date: December 24, 2015
    Inventors: Jinsan MOON, Jonghyun RHO, Subeom PARK, Taehyeong KIM, Byunghee HONG, Wonbae PARK, Myunghee JUNG
  • Patent number: 8828523
    Abstract: A method for manufacturing graphene using light capable of transferring and patterning graphene, and graphene manufactured using the method are disclosed. The method includes forming a graphene layer on a catalyst metal layer, attaching a support layer losing adhesion by light on the graphene layer, removing the catalyst metal layer, disposing a substrate on the graphene layer, and separating the support layer from the graphene layer by irradiating light to the support layer.
    Type: Grant
    Filed: January 24, 2013
    Date of Patent: September 9, 2014
    Assignee: LG Electronics Inc.
    Inventors: Jinsan Moon, Wonbae Park, Mynghee Jung, Jonghyun Rho, Byunghwa Seo
  • Publication number: 20140239310
    Abstract: Disclosed is a method of manufacturing a light emitting device. More particularly, disclosed are a growth substrate, a nitride semiconductor device and a method of manufacturing a light emitting device. The method includes preparing a growth substrate including a metal substrate, forming a semiconductor structure including a nitride-based semiconductor on the growth substrate, providing a support structure on the semiconductor structure, and separating the growth substrate from the semiconductor structure.
    Type: Application
    Filed: February 19, 2014
    Publication date: August 28, 2014
    Applicant: LG ELECTRONICS INC.
    Inventors: Jonghyun RHO, Minseok CHOI, Taehyeong KIM
  • Patent number: 8729614
    Abstract: The present disclosure relates to a flexible nonvolatile ferroelectric memory device, a 1T-1R (1Transistor-1Resistor) flexible ferroelectric memory device, and a manufacturing method for the same.
    Type: Grant
    Filed: May 25, 2011
    Date of Patent: May 20, 2014
    Assignee: Sungkyunkwan University Foundation for Corporate Collaboration
    Inventors: Jong-Hyun Ahn, Jonghyun Rho
  • Publication number: 20130309458
    Abstract: A method for manufacturing graphene using light capable of transferring and patterning graphene, and graphene manufactured using the method are disclosed. The method includes forming a graphene layer on a catalyst metal layer, attaching a support layer losing adhesion by light on the graphene layer, removing the catalyst metal layer, disposing a substrate on the graphene layer, and separating the support layer from the graphene layer by irradiating light to the support layer.
    Type: Application
    Filed: January 24, 2013
    Publication date: November 21, 2013
    Applicant: LG ELECTRONICS INC.
    Inventors: Jinsan MOON, Wonbae PARK, Mynghee JUNG, Jonghyun RHO, Byunghwa SEO
  • Publication number: 20110316059
    Abstract: The present disclosure relates to a flexible nonvolatile ferroelectric memory device, a 1T-1R (1Transistor-1Resistor) flexible ferroelectric memory device, and a manufacturing method for the same.
    Type: Application
    Filed: May 25, 2011
    Publication date: December 29, 2011
    Applicant: Sungkyunkwan University Foundation for Corporate Collaboration
    Inventors: Jong-Hyun Ahn, Jonghyun Rho