Patents by Inventor JONGJU PARK

JONGJU PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190108136
    Abstract: A memory system includes a nonvolatile memory device including a plurality of memory blocks; and a controller including a command queue adapted to store a plurality of commands from the host, wherein the controller is suitable for managing mapping information for mapping logical addresses of the commands to physical addresses of the nonvolatile memory device, storing partial mapping information into an internal cache memory, storing the whole mapping information into the memory blocks, selecting a piece of victim mapping information among the partial mapping information stored in the internal cache memory, and removing the piece of victim mapping information based on logical addresses of the commands stored in the command queue.
    Type: Application
    Filed: August 3, 2018
    Publication date: April 11, 2019
    Inventor: JongJu PARK
  • Patent number: 9703186
    Abstract: Provided is a mask. The mask may include a mask substrate, mask patterns on the mask substrate, frames disposed on an edge of the mask substrate outside the mask patterns, and a pellicle spaced apart from the mask patterns, the pellicle being disposed on the frames, wherein the pellicle includes protection layers each of which has a nanometer thickness.
    Type: Grant
    Filed: June 30, 2015
    Date of Patent: July 11, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mun Ja Kim, Byunggook Kim, Jongju Park, Jaehyuck Choi
  • Publication number: 20170031142
    Abstract: An extreme ultraviolet (EUV) light generation apparatus includes a source supplying unit in a chamber, the source supplying unit including a source material for generation of extreme ultraviolet light, a plasma generator to generate plasma from the source material, an optical unit in the chamber, and at least one protection film adjacent to the optical unit, the at least one protection film including at least one of graphite or graphene.
    Type: Application
    Filed: June 15, 2016
    Publication date: February 2, 2017
    Inventors: Eokbong KIM, Mun Ja KIM, Jongju PARK, Donggun LEE, Byunggook KIM
  • Patent number: 9466490
    Abstract: A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: October 11, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sanghyun Kim, Chalykh Roman, Jongju Park, Donggun Lee, Seongsue Kim
  • Publication number: 20160139501
    Abstract: Provided is a mask. The mask may include a mask substrate, mask patterns on the mask substrate, frames disposed on an edge of the mask substrate outside the mask patterns, and a pellicle spaced apart from the mask patterns, the pellicle being disposed on the frames, wherein the pellicle includes protection layers each of which has a nanometer thickness.
    Type: Application
    Filed: June 30, 2015
    Publication date: May 19, 2016
    Inventors: Mun Ja Kim, Byunggook KIM, Jongju Park, Jaehyuck Choi
  • Publication number: 20150311078
    Abstract: A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.
    Type: Application
    Filed: June 16, 2015
    Publication date: October 29, 2015
    Inventors: Sanghyun Kim, Chalykh Roman, Jongju Park, Donggun Lee, Seongsue Kim
  • Patent number: 9087698
    Abstract: A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: July 21, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sanghyun Kim, Chalykh Roman, Jongju Park, Donggun Lee, Seongsue Kim
  • Patent number: 8697318
    Abstract: A method of manufacturing a photomask includes forming a multi-layer on a substrate and a blank layer on the multi-layer, patterning the blank layer to form openings exposing the multi-layer on a projection region of the substrate, and irradiating at least a portion of the multi-layer exposed by the openings with pulses of light output by a pulse laser whose pulse width is substantially greater than 0.001 seconds. Thus, the photomask has a reflective layer that includes a low-reflectance part corresponding to that part of the multi-layer irradiated by the light output by the pulse laser.
    Type: Grant
    Filed: September 4, 2012
    Date of Patent: April 15, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jongju Park, Sang Hyun Kim, Donggun Lee
  • Publication number: 20140076867
    Abstract: A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.
    Type: Application
    Filed: March 8, 2013
    Publication date: March 20, 2014
    Inventors: Sanghyun Kim, Chalykh Roman, Jongju Park, Donggun Lee, Seongsue Kim
  • Publication number: 20130122404
    Abstract: A method of manufacturing a photomask includes forming a multi-layer on a substrate and a blank layer on the multi-layer, patterning the blank layer to form openings exposing the multi-layer on a projection region of the substrate, and irradiating at least a portion of the multi-layer exposed by the openings with pulses of light output by a pulse laser whose pulse width is substantially greater than 0.001 seconds. Thus, the photomask has a reflective layer that includes a low-reflectance part corresponding to that part of the multi-layer irradiated by the light output by the pulse laser.
    Type: Application
    Filed: September 4, 2012
    Publication date: May 16, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: JONGJU PARK, SANG HYUN KIM, DONGGUN LEE