Patents by Inventor Jong Koo Lee

Jong Koo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7980546
    Abstract: A mail paper sealing apparatus is provided. The apparatus includes an input part, a compression roller part, a driving unit, and a convey accelerator. The input part supplies a mail paper. The compression roller part seals the folded mail paper conveyed from the input part. The driving unit generates a rotary force. The convey accelerator is provided between the input part and the compression roller part and adds a rotation frictional force to a top surface of one side of the mail paper in a convey direction.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: July 19, 2011
    Assignee: Well Tec System
    Inventor: Jong Koo Lee
  • Patent number: 7922463
    Abstract: Disclosed herein is a linear compressor wherein a compression unit, including a cylinder and a linear motor, is supported by a frame mounted in a hermetic container. The frame is die cast using diamagnetic zinc having a high forming accuracy, thereby preventing an electromagnetic force of the linear motor from being leaked therethrough, and enabling a reduction in the number of machining times thereof after die casting.
    Type: Grant
    Filed: October 21, 2005
    Date of Patent: April 12, 2011
    Assignee: LG Electronics Inc.
    Inventors: Jong Koo Lee, Jin Taek Oh, Kwang Wook Kim, Min Chul Han, Gye Young Song, Hyung Pyo Yoon, Kwang Ha Suh, Kyoung Seok Kang
  • Patent number: 7748963
    Abstract: Disclosed herein is a linear compressor, which is designed in such a fashion that oil is suctioned into a space between a cylinder and a piston by a low pressure produced between the cylinder and the piston when the piston moves backward, and then is discharged to the outside by a high pressure produced between the cylinder and the piston when the piston moves forward, resulting in a simplified oil pumping structure and low cost.
    Type: Grant
    Filed: January 19, 2005
    Date of Patent: July 6, 2010
    Assignee: LG Electronics Inc.
    Inventors: Jong Koo Lee, Gye Young Song
  • Publication number: 20100148433
    Abstract: A mail paper sealing apparatus is provided. The apparatus includes an input part, a compression roller part, a driving unit, and a convey accelerator. The input part supplies a mail paper. The compression roller part seals the folded mail paper conveyed from the input part. The driving unit generates a rotary force. The convey accelerator is provided between the input part and the compression roller part and adds a rotation frictional force to a top surface of one side of the mail paper in a convey direction.
    Type: Application
    Filed: July 30, 2009
    Publication date: June 17, 2010
    Inventor: Jong Koo LEE
  • Publication number: 20090252625
    Abstract: The present invention relates to a linear compressor compressing a working fluid in the cylinder such as a refrigerant and etc with the reciprocating movement of the piston in the cylinder due to the reciprocating force of the linear motor, and provides a linear compressor and the supporter for the same that the change of the lateral resonance frequency due to the lateral stiffness of the piston spring is easy as having a stub or a narrow part on the supporter preventing the increase of the mass inertia moment compared with the distance between the centroid of the supporter and the center of the piston spring sat on the supporter arm of the supporter, and capable of reducing the entire size and the manufacturing costs as raising the lateral resonance frequency easily without extending the length of the supporter arm.
    Type: Application
    Filed: October 9, 2006
    Publication date: October 8, 2009
    Applicant: LG ELECTRONICS INC.
    Inventors: Jong Koo Lee, Yang Jun Kang
  • Patent number: 7566206
    Abstract: A linear compressor for multi-compression includes a stationary cylinder, a moving piston, and a stationary piston. The stationary cylinder has a first compression chamber formed therein. The stationary cylinder is provided at one side thereof with an outlet part. The moving piston is movable forward and backward by a linear motor, that compresses a fluid in the first compression chamber. The moving piston has a second compression chamber formed and is provided, at the position where the second compression chamber communicates with the first compression chamber, with a first valve. The stationary piston is fixedly disposed in the compressor. The stationary piston is fitted in the moving piston so that the fluid in the second compression chamber is compressed as the moving piston is reciprocated.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: July 28, 2009
    Assignee: LG Electronics Inc.
    Inventors: Jong Koo Lee, Gye Young Song
  • Patent number: 7540723
    Abstract: A reciprocating compressor includes a reciprocating motor that generates a reciprocation force and a compressing unit to which a discharge pipe that discharges a compressed fluid is connected. The compressing unit compresses a fluid by receiving the reciprocation force generated by the reciprocating motor. A frame, to which the reciprocating motor and the compressing unit are fixed, is connected to a suction pipe that sucks a fluid to be compressed at one side thereof, and that contains lubricating oil therein.
    Type: Grant
    Filed: July 19, 2004
    Date of Patent: June 2, 2009
    Assignee: LG Electronics Inc.
    Inventors: Gye Young Song, Jong Koo Lee
  • Patent number: 6867141
    Abstract: A method for fabricating a semiconductor device and forming an insulating film used therein, includes forming an isolation insulating film on a semiconductor wafer and forming gates, separated by gaps having a predetermined distance, on an active region. Next, a first interlayer dielectric film is deposited to a predetermined thickness on the semiconductor wafer having the gates, so that the gaps between the gates are not completely filled. Then, a sputtering etch is performed entirely on a surface of the first interlayer dielectric film. Thereafter, the first interlayer dielectric film is partially removed through isotropic etching. Next, a second interlayer dielectric film is deposited on the first interlayer dielectric film so that the gaps between the gates are completely filled.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: March 15, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woo Chan Jung, Jong Koo Lee
  • Publication number: 20040247466
    Abstract: A linear compressor for multi-compression includes a stationary cylinder, a moving piston, and a stationary piston. The stationary cylinder has a first compression chamber formed therein. The stationary cylinder is provided at one side thereof with an outlet part. The moving piston is movable forward and backward by a linear motor, that compresses a fluid in the first compression chamber. The moving piston has a second compression chamber formed and is provided, at the .position where the second compression chamber communicates with the first compression chamber, with a first valve. The stationary piston is fixedly disposed in the compressor. The stationary piston is fitted in the moving piston so that the fluid in the second compression chamber is compressed as the moving piston is reciprocated.
    Type: Application
    Filed: June 2, 2004
    Publication date: December 9, 2004
    Applicant: LG Electronics Inc.
    Inventors: Jong Koo Lee, Gye Young Song
  • Publication number: 20030207553
    Abstract: A method for fabricating a semiconductor device and forming an insulating film used therein, includes forming an isolation insulating film on a semiconductor wafer and forming gates, separated by gaps having a predetermined distance, on an active region. Next, a first interlayer dielectric film is deposited to a predetermined thickness on the semiconductor wafer having the gates, so that the gaps between the gates are not completely filled. Then, a sputtering etch is performed entirely on a surface of the first interlayer dielectric film. Thereafter, the first interlayer dielectric film is partially removed through isotropic etching. Next, a second interlayer dielectric film is deposited on the first interlayer dielectric film so that the gaps between the gates are completely filled.
    Type: Application
    Filed: June 4, 2003
    Publication date: November 6, 2003
    Inventors: Woo Chan Jung, Jong Koo Lee
  • Patent number: 6617259
    Abstract: A method for fabricating a semiconductor device and forming an insulating film used therein, includes forming an isolation insulating film on a semiconductor wafer and forming gates, separated by gaps having a predetermined distance, on an active region. Next, a first interlayer dielectric film is deposited to a predetermined thickness on the semiconductor wafer having the gates, so that the gaps between the gates are not completely filled. Then, a sputtering etch is performed entirely on a surface of the first interlayer dielectric film. Thereafter, the first interlayer dielectric film is partially removed through isotropic etching. Next, a second interlayer dielectric film is deposited on the first interlayer dielectric film so that the gaps between the gates are completely filled.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: September 9, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woo Chan Jung, Jong Koo Lee
  • Publication number: 20030008492
    Abstract: A method for fabricating a semiconductor device and forming an insulating film used therein, includes forming an isolation insulating film on a semiconductor wafer and forming gates, separated by gaps having a predetermined distance, on an active region. Next, a first interlayer dielectric film is deposited to a predetermined thickness on the semiconductor wafer having the gates, so that the gaps between the gates are not completely filled. Then, a sputtering etch is performed entirely on a surface of the first interlayer dielectric film. Thereafter, the first interlayer dielectric film is partially removed through isotropic etching. Next, a second interlayer dielectric film is deposited on the first interlayer dielectric film so that the gaps between the gates are completely filled.
    Type: Application
    Filed: May 8, 2002
    Publication date: January 9, 2003
    Inventors: Woo Chan Jung, Jong Koo Lee