Abstract: A method of manufacturing a display device including forming a polysilicon layer on a substrate, patterning the polysilicon layer to form a polysilicon pattern including a first region and a second region each having a first thickness, and a third region having a second thickness less than the first thickness, forming a gate insulation layer on the polysilicon pattern, forming a gate electrode on the gate insulation layer, partially implanting ions into the polysilicon pattern to form an active layer, forming an insulation interlayer on the gate electrode, forming source and drain contact holes each passing through the insulation interlayer and the gate insulation layer and respectively overlapping the first region and the second region, forming source and drain electrodes respectively filling the source and drain contact holes, and forming a light emitting element electrically connected to the source electrode or the drain electrode.

Abstract: A method of manufacturing a display device including forming a polysilicon layer on a substrate, patterning the polysilicon layer to form a polysilicon pattern including a first region and a second region each having a first thickness, and a third region having a second thickness less than the first thickness, forming a gate insulation layer on the polysilicon pattern, forming a gate electrode on the gate insulation layer, partially implanting ions into the polysilicon pattern to form an active layer, forming an insulation interlayer on the gate electrode, forming source and drain contact holes each passing through the insulation interlayer and the gate insulation layer and respectively overlapping the first region and the second region, forming source and drain electrodes respectively filling the source and drain contact holes, and forming a light emitting element electrically connected to the source electrode or the drain electrode.

Abstract: A laser crystallization apparatus includes a laser generating module configured to generate a laser beam, an optical module configured to guide the laser beam, an annealing chamber comprising a stage on which a target substrate comprising an amorphous thin film formed therein is disposed, the stage being movable along an X-axis direction and a Y-axis direction, and a tilt refractive lens configured to transform the laser beam having a cross-sectional area of a rectangle shape into a tilted laser beam having a cross-sectional area of a non-rectangular parallelogram shape and to irradiate the tilted laser beam perpendicular to the stage.

Abstract: A laser crystallization apparatus includes a laser generating module configured to generate a laser beam, an optical module configured to guide the laser beam, an annealing chamber comprising a stage on which a target substrate comprising an amorphous thin film formed therein is disposed, the stage being movable along an X-axis direction and a Y-axis direction, and a tilt refractive lens configured to transform the laser beam having a cross-sectional area of a rectangle shape into a tilted laser beam having a cross-sectional area of a non-rectangular parallelogram shape and to irradiate the tilted laser beam perpendicular to the stage.

Abstract: A display device includes a substrate; a color filter layer positioned on the substrate correspondingly to a path where an image is outputted; and an organic overcoat layer covering the color filter layer and including an ion implantation layer coated on the surface.

Abstract: A display device includes a substrate; a color filter layer positioned on the substrate correspondingly to a path where an image is outputted; and an organic overcoat layer covering the color filter layer and including an ion implantation layer coated on the surface.