Abstract: A semiconductor manufacturing apparatus includes a process chamber, a wafer support plate disposed inside the process chamber, an edge ring disposed inside the process chamber and surrounding the wafer support plate, and a robot including a control circuit and a gripper. The control circuit controls the gripper to load a dummy wafer having a first diameter on the wafer support plate during a cleaning process and load a wafer having a second diameter, greater than the first diameter, on the wafer support plate during a mass production process, the gripper being adjustable to accommodate the dummy wafer having the first diameter and the wafer having the second diameter, and controls the robot to place a center of the dummy wafer at a center of the wafer support plate during the cleaning process.

Abstract: Provided is an electrostatic chuck and a plasma processing apparatus including same, the electrostatic chuck including: an upper plate including an upper surface, the upper surface including a center region configured to have a substrate mounted thereto and an edge region surrounding the center region; a lower plate under the upper plate and supporting the upper plate; and a focus ring on the edge region, wherein the center region and the edge region are on the same plane, and wherein a thickness of the upper plate in the center region is the same as a thickness of the upper plate in the edge region.

Abstract: A sensor device includes a lower substrate, an upper substrate disposed on the lower substrate, formed of a material different from a material of the lower substrate, and including a plurality of light-receiving regions disposed in different positions, a plurality of optical members disposed between the lower substrate and the upper substrate, and configured to be generated in a plasma formed in a space above the upper substrate and to provide a traveling path of light entering the plurality of light-receiving regions, a spectrum sensor configured to detect intensity of light received through each of the plurality of optical members in a predetermined wavelength band, a controller configured to generate raw data including intensity of light according to the wavelength band by matching the raw data with each of the plurality of light-receiving regions.

Abstract: A sensor device includes a first substrate, a second substrate on the first substrate, a plurality of detection units between the first substrate and the second substrate and configured to collect detection information from plasma formed in a space above the second substrate, a controller configured to generate characteristic data representing characteristics of the plasma based on the detection information collected by the plurality of detection units, and a power supply unit including a radio frequency (RF) energy harvester configured to produce power for operation of at least one of the plurality of detection units and the controller from RF power used to form the plasma.

Abstract: A sensor device includes a lower substrate, an upper substrate disposed on the lower substrate, formed of a material different from a material of the lower substrate, and including a plurality of light-receiving regions disposed in different positions, a plurality of optical members disposed between the lower substrate and the upper substrate, and configured to be generated in a plasma formed in a space above the upper substrate and to provide a traveling path of light entering the plurality of light-receiving regions, a spectrum sensor configured to detect intensity of light received through each of the plurality of optical members in a predetermined wavelength band, a controller configured to generate raw data including intensity of light according to the wavelength band by matching the raw data with each of the plurality of light-receiving regions.

Abstract: The present disclosure relates to calibration apparatuses of sensor devices. An example calibration apparatus of a sensor device includes a housing providing a darkroom space by blocking light from the outside, a lighting unit installed in the darkroom space and configured to output light in a specific wavelength band, a stage on which the sensor device, configured to detect intensity of light output by the lighting unit in at least one measurement position, is mounted, the stage installed below the lighting unit in the darkroom space, and a control device configured to receive raw data including intensity of light measured by the sensor device. The control device generates calibration data for adjusting intensity of light measured at the at least one measurement position.