Abstract: A system and method of providing an advertisement through a streaming video is proposed. In the system of providing the advertisement through the streaming video, when advertisers registers advertisements on a streaming server, a streamer may select any one of the registered advertisements, and when the streamer activates an advertisement function, a real-time broadcast video of the streamer may be converted into an advertisement video of the advertisement selected by the streamer. A streamer selects any one of the advertisements registered by the advertisers, and provides advertising content to viewers by including an advertising content provision object, such as an advertising product information link, in a streaming video transmitted by the streamer. In an embodiment, the advertiser may perform advertiser and advertisement registration in an advertisement server, and may limit conditions, such as streamer's broadcast content to be advertised, the number of followers, and the number of viewers.

Abstract: Provided is a sponsorship server including: a transceiver; at least one processor; and at least one memory operably connected to the at least one processor, and storing instructions for enabling the at least one processor to perform operations.

Abstract: A check cassette according to an embodiment of the present disclosure is a cassette which is used in a measurement device which allows an analyte of a biopsy sample to be measured on the basis of reaction properties of light irradiated from a light source including at least one of reflection, absorption, and transmission of the light (the measurement device provides an inner space into which a measurement cassette, in which the biopsy sample and at least one reagent react with each other, is inserted, and after the measurement cassette is inserted into the inner space, the analyte of the biopsy sample is measured on the basis of pieces of reaction property information of the light irradiated from the light source regarding a substance that results from the reaction between the biopsy sample and the at least one reagent) so that a change in light intensity of the light source in accordance with use of the measurement device is compensated for.

Abstract: A gas supply device may include a first gas supply member that may be disposed in a chamber and around a substrate loaded in the chamber. The first gas supply member may include nozzles for providing a gas onto the substrate. A second gas supply member that may provide the gas supplied from at least one gas supply line to the first gas supply member.

Abstract: A gas supply device may include a first gas supply member that may be disposed in a chamber and around a substrate loaded in the chamber. The first gas supply member may include nozzles for providing a gas onto the substrate. A second gas supply member that may provide the gas supplied from at least one gas supply line to the first gas supply member.

Abstract: Provided are improved nozzles suitable for injecting source gases or other gases into a plasma chamber in which the gas is conveyed along a single passage or channel to an outlet region at which point the single channel is divided into a plurality of outlet channels. The outlet channels are configured to suppress formation of a plasma within the nozzle itself, thereby reducing deposition and/or damage within the nozzle. The outlet channels may be defined through the use of one or more insertion members that can be inserted in the outlet region of the nozzle and may be used in combination with an outer pipe attached to a supply pipe for completing the nozzle assembly.

Abstract: Provided is a high density plasma chemical vapor deposition (HDP-CVD) apparatus that includes a plurality of nozzles and/or injection pipes arranged for injecting a source gas mixture into a reaction chamber. The nozzles will each include an outlet region that includes a plurality of outlet channels or ports, the outlet channels are, in turn, configured to have a sufficiently small width and a sufficient length to suppress the formation of a plasma within the source gases passing through the respective nozzles. By suppressing the formation of a plasma within the nozzles, the thickness of deposits formed on the nozzles during the deposition processes can be maintained at a level generally no greater than deposits formed on the other chamber surfaces. This control of the deposit thickness allows the nozzles to be cleaned effectively by the same cleaning process applied to the chamber.