Abstract: In a method of forming an electrode structure for a photovoltaic cell, a transparent conductive layer is formed on a semiconductor layer of amorphous silicon material doped with dopants of a first conductive type. Then, a preliminary metal pattern is formed on the transparent conductive layer by performing an ink jet process using glass frit-free nano metal ink. After forming a metal paste layer using a conductive paste through a screen printing process to cover the preliminary metal pattern, the preliminary metal pattern and the metal paste layer are fired to transform the preliminary metal pattern and the metal paste layer into a first and a second metal pattern to define a metal electrode formed on the transparent metal layer.

Abstract: In a method of forming an electrode structure for a photovoltaic cell, a transparent conductive layer is formed on a semiconductor layer of amorphous silicon material doped with dopants of a first conductive type. Then, a first metal pattern is formed on the transparent conductive layer by performing an ink jet process using metal nano ink. After forming a metal paste layer using a conductive paste through a screen printing process to cover the first metal pattern, the metal paste layer is fired to transform the metal paste layer into a second metal pattern such that the first and the second metal patterns are formed on the transparent metal layer to define a metal electrode.

Abstract: The present invention relates to a liquid additive for etching silicon nitride and silicon oxide layers, a metal ink including the same for forming silicon solar cell electrodes and a method for manufacturing silicon solar cell electrodes. More particularly, it relates to a liquid additive including metal nitrate, metal acetate, or hydrates thereof and a metal ink for forming silicon solar cell electrodes, mixed with the liquid additive and a metal. Further, it relates to a method for manufacturing silicon solar cell electrodes comprising a one-step non-contact printing for etching of a silicon nitride layer or silicon oxide layer and forming electrodes.

Abstract: The present invention relates to a liquid additive for etching silicon nitride and silicon oxide layers, a metal ink including the same for forming silicon solar cell electrodes and a method for manufacturing silicon solar cell electrodes. More particularly, it relates to a liquid additive including metal nitrate, metal acetate, or hydrates thereof and a metal ink for forming silicon solar cell electrodes, mixed with the liquid additive and a metal. Further, it relates to a method for manufacturing silicon solar cell electrodes comprising a one-step non-contact printing for etching of a silicon nitride layer or silicon oxide layer and forming electrodes.