Patents by Inventor Joo-Yun JUNG
Joo-Yun JUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12327661Abstract: A transparent conductor according to an exemplary embodiment of the present invention includes a transparent substrate, and a transparent conductive pattern formed on the transparent substrate, and the transparent conductor includes a nanostructure on an upper surface of at least one of the transparent substrate and the transparent conductive pattern.Type: GrantFiled: March 17, 2021Date of Patent: June 10, 2025Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Dae-Guen Choi, Hyuk Jun Kang, Ji Hye Lee, Junhyuk Choi, Won Seok Chang, Joo Yun Jung, Jun-ho Jeong
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Publication number: 20240145118Abstract: A transparent conductor according to an exemplary embodiment of the present invention includes a transparent substrate, and a transparent conductive pattern formed on the transparent substrate, and the transparent conductor includes a nanostructure on an upper surface of at least one of the transparent substrate and the transparent conductive pattern.Type: ApplicationFiled: March 17, 2021Publication date: May 2, 2024Inventors: Dae-Guen CHOI, Hyuk Jun KANG, Ji Hye LEE, Junhyuk CHOI, Won Seok CHANG, Joo Yun JUNG, Jun-ho JEONG
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Publication number: 20220083206Abstract: A method of creating an interactive emoticon includes receiving a selected basic emoticon, receiving input user text, displaying a preview of an interactive emoticon to be transmitted based on the selected basic emoticon and the input user text, and forming the interactive emoticon based on the selected basic emoticon and the input user text, wherein the displaying of a preview of an interactive emoticon includes performing a font size change or a line break based on a number of characters of the input user text.Type: ApplicationFiled: February 10, 2021Publication date: March 17, 2022Applicant: BEMILY, INC.Inventors: Sung Chan PARK, Yang Woo LEE, Hyung Min SHIN, Kil Sang YU, Joo Yun JUNG, Yun Dong PARK, Won SEO, Do Hoon KIM, Jin Woo KIM, Myeong Yun SEONG, Byeong Joo KIM, Dong Wook MIN, Min Jae KIM
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Publication number: 20210268111Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.Type: ApplicationFiled: May 18, 2021Publication date: September 2, 2021Applicant: ADMBIOSCIENCE INC.Inventors: Jun-ho JEONG, Yun Woo LEE, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG
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Patent number: 11040103Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.Type: GrantFiled: April 14, 2017Date of Patent: June 22, 2021Assignee: ADMBIOSCIENCE INC.Inventors: Jun-ho Jeong, Yun Woo Lee, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung
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Patent number: 10730233Abstract: A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.Type: GrantFiled: April 14, 2017Date of Patent: August 4, 2020Assignee: ADMBIOSCIENCE INC.Inventors: Jun-ho Jeong, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung, Eung-Sug Lee
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Publication number: 20190125876Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.Type: ApplicationFiled: April 14, 2017Publication date: May 2, 2019Applicant: ADMBIOSCIENCE INC.Inventors: Jun-ho JEONG, Yun Woo LEE, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG
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Publication number: 20190070775Abstract: A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.Type: ApplicationFiled: April 14, 2017Publication date: March 7, 2019Applicant: ADMBIOSCIENCE INC.Inventors: Jun-ho JEONG, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG, Eung-Sug LEE
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Patent number: 9791601Abstract: In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.Type: GrantFiled: February 28, 2014Date of Patent: October 17, 2017Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Hyuk Choi, Eung-Sug Lee, Ji-Hye Lee, Jun-ho Jeong, Joo-Yun Jung, Dae-Guen Choi, Cheol-Hyeon Kim
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Patent number: 9638851Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.Type: GrantFiled: December 4, 2015Date of Patent: May 2, 2017Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Ho Jeong, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
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Publication number: 20170075051Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.Type: ApplicationFiled: December 4, 2015Publication date: March 16, 2017Inventors: Jun-Ho JEONG, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
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Patent number: 9581746Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.Type: GrantFiled: December 4, 2015Date of Patent: February 28, 2017Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Ho Jeong, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
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Patent number: 9028639Abstract: There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.Type: GrantFiled: December 26, 2012Date of Patent: May 12, 2015Assignee: Korea Institute of Machinery & MaterialsInventors: Eung-Sug Lee, Joo Yun Jung, Jun Hyuk Choi, Jae Won Hahn
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Publication number: 20140311662Abstract: In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.Type: ApplicationFiled: February 28, 2014Publication date: October 23, 2014Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Hyuk CHOI, Eung-Sug LEE, Ji-Hye LEE, Jun-ho JEONG, Joo-Yun JUNG, Dae-Guen CHOI, Cheol-Hyeon KIM