Patents by Inventor Joohwan Chung

Joohwan Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thin film etchant composition and method of forming metal pattern by using the same
    Patent number: 11225721
    Abstract: A thin film etchant composition for preventing re-adsorption of an etched metal and uniformly etching a thin film is provided. The thin film etchant composition includes about 43 wt % to about 46 wt % of phosphoric acid, about 5 wt % to about 8 wt % of nitric acid, about 10 wt % to about 17 wt % of acetic acid, about 1 wt % to about 3 wt % of iron nitrate, about 0.7 wt % to about 1.5 wt % of phosphate, and deionized water as a remaining amount based on a total weight of the thin film etchant composition.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: January 18, 2022
    Assignees: SAMSUNG DISPLAY CO., LTD., DONGWOO FINE-CHEM CO., LTD.
    Inventors: Jinhyung Kim, Joohwan Chung, Jinsook Kim, Haccheol Kim, Byungsu Lee, Changsoo Kim, Jungseek Jung, Dongki Kim, Sangtae Kim, Giyong Nam, Youngchul Park, Kyungbo Shim, Daesung Lim, Sanghoon Jang
  • THIN FILM ETCHANT COMPOSITION AND METHOD OF FORMING METAL PATTERN BY USING THE SAME
    Publication number: 20190368053
    Abstract: A thin film etchant composition for preventing re-adsorption of an etched metal and uniformly etching a thin film is provided. The thin film etchant composition includes about 43 wt % to about 46 wt % of phosphoric acid, about 5 wt % to about 8 wt % of nitric acid, about 10 wt % to about 17 wt % of acetic acid, about 1 wt % to about 3 wt % of iron nitrate, about 0.7 wt % to about 1.5 wt % of phosphate, and deionized water as a remaining amount based on a total weight of the thin film etchant composition.
    Type: Application
    Filed: February 25, 2019
    Publication date: December 5, 2019
    Inventors: Jinhyung Kim, Joohwan Chung, Jinsook Kim, Haccheol Kim, Byungsu Lee, Changsoo Kim, Jungseek Jung, Dongki Kim, Sangtae Kim, Giyong Nam, Youngchul Park, Kyungbo Shim, Daesung Lim, Sanghoon Jang