Abstract: The present invention provides a substrate treatment method. The substrate treatment method may include washing a drying chamber including: wetting a dummy substrate with a chemical in a liquid treatment chamber; washing a treatment space of the drying chamber by loading the dummy substrate wet with the chemical into the drying chamber and then supplying supercritical fluid to the drying chamber; and performing bake treatment to reuse the dummy substrate used to wash the drying chamber.

Abstract: Disclosed is a method of treating a substrate, the method including: a substrate treating operation of treating a substrate with a component for treatment while moving an arm mounted with the component for treatment on the substrate rotating in accordance with a treatment recipe relative to the substrate; and a validating operation of validating an initial recipe received for use in the substrate treating operation prior to the substrate treating operation, in which the validating operation includes: a checking operation of partitioning a region on the substrate into a plurality of unit regions, and checking a treatment time during which each of the plurality of unit regions is directly treated by the component for treatment for a set time; and a determining operation of determining whether the treatment time in each of the plurality of unit regions checked in the checking operation is appropriate.

Abstract: Disclosed is an apparatus for processing a substrate, the apparatus including: a chamber providing a processing space; an electrode unit for generating first plasma in the processing space and having opposing electrodes; a coil unit located in an upper side of the processing space, and for generating second plasma supplied into the processing space; and a remote plasma unit for supplying radicals to the processing space.

Abstract: Disclosed is an apparatus for processing a substrate, the apparatus including: a chamber for forming a processing space in which a processing process for a substrate is performed therein by a combination of a first body and a second body; and a driver for moving any one of the first body or the second body relative to the other such that a relative position between the first body and the second body is changeable between a sealed position at which the processing space is sealed from the outside and an open position at which the processing space is opened, in which the first body is formed with a first protrusion on a face that is in contact with the second body, the second body is formed with a first receiving portion, and the first protrusion is provided to be inserted into the first receiving portion when the first body and the second body are at the sealed position.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space therein; a supply line having a first open/close valve installed thereon and configured to supply a treating fluid to the treating space; a heater installed on the supply line and configured to heat the treating fluid; an exhaust line having a second open/close valve installed thereon and configured to exhaust the treating space; and, a controller configured to control the first open/close value and the second open/close valve such that the treating fluid heated is supplied to and exhausted from the treating space before a treating process is performed on a substrate in the treating space.

Abstract: An apparatus and method for treating a substrate are provided. The apparatus includes at least one first process chamber configured to supply a developer onto the substrate; at least one second process chamber configured to treat the substrate using a supercritical fluid; a transfer chamber configured to transfer the substrate from the at least one first process chamber to the at least one second process chamber, while the developer supplied in the at least one first process chamber remains on the substrate; and a temperature and humidity control system configured to manage temperature and humidity of the transfer chamber by supplying a first gas of constant temperature and humidity into the transfer chamber.

Abstract: There are provided an apparatus and a method for providing a substrate, which can suppress any additional reaction between a developing solution and a photoresist (PR) film and prevent any PR remnants from being generated from such additional reaction. The method includes: supplying an organic developing solution onto a substrate while rotating the substrate at a first revolutions per minute (rpm); substituting the organic developing solution with a nonpolar rinse solution by supplying the nonpolar rinse solution onto the substrate while rotating the substrate at a second rpm, which is lower than the first rpm; continuing to supply the nonpolar rinse solution while rotating the substrate at a third rpm, which is higher than the second rpm; and continuing to supply the nonpolar rinse solution while rotating the substrate at a fourth rpm, which is between the second rpm and the third rpm.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space therein; a supply line having a first open/close valve installed thereon and configured to supply a treating fluid to the treating space; a heater installed on the supply line and configured to heat the treating fluid; an exhaust line having a second open/close valve installed thereon and configured to exhaust the treating space; and, a controller configured to control the first open/close value and the second open/close valve such that the treating fluid heated is supplied to and exhausted from the treating space before a treating process is performed on a substrate in the treating space.

Abstract: An apparatus and method for treating a substrate are provided. The apparatus includes at least one first process chamber configured to supply a developer onto the substrate; at least one second process chamber configured to treat the substrate using a supercritical fluid; a transfer chamber configured to transfer the substrate from the at least one first process chamber to the at least one second process chamber, while the developer supplied in the at least one first process chamber remains on the substrate; and a temperature and humidity control system configured to manage temperature and humidity of the transfer chamber by supplying a first gas of constant temperature and humidity into the transfer chamber.

Abstract: A substrate processing apparatus and a substrate processing method are provided, in which a flow rate of CO2 injected into a supercritical drying vessel is controlled through multi-level pressure control. The substrate processing method includes disposing a substrate coated with a chemical liquid in a process chamber, that includes a space in which the substrate is processed; drying the substrate by using a supercritical fluid; and taking the substrate out of the process chamber when the substrate is dried.

Abstract: The present disclosure relates to a flow resistance generating unit that generates a flow resistance in a pipe to solve a flow imbalance problem due to a bent pipe and stabilizes an internal airflow, and a substrate treating apparatus including the same. The substrate treating apparatus comprises a fluid supply unit for supplying fluid for treating a substrate and including an upper fluid supply module for supplying the fluid to an upper portion of the substrate, a lower fluid supply module for supplying the fluid to a lower portion of the substrate, and a supply pipe connected to at least one of the upper fluid supply module and the lower fluid supply module, and a flow resistance generating unit installed in the supply pipe and for generating a flow resistance with respect to the fluid passing through the supply pipe.

Abstract: The inventive concept provides a method for treating a substrate. The method for treating a substrate comprises: a pressurization step for increasing a pressure of an inner space of a chamber by supplying a treating fluid to the inner space, after taking the substrate into the inner space; a flow step for generating a flow of the treating fluid by combination of supplying and discharging the treating fluid to and from the inner space; and a depressurization step of decreasing the pressure of the inner space by discharging the treating fluid from the inner space, and wherein the pressurization step comprises: a bottom side supply process for increasing the pressure of the inner space by supplying the treating fluid to a backside of the substrate taken into the inner space; and a top side supply process of increasing the pressure of the inner space by supplying the treating fluid to a top side of the substrate taken into the inner space.

Abstract: The present disclosure relates to a substrate processing apparatus and a substrate processing method. The substrate processing apparatus according to the exemplary embodiment of the present disclosure may include: a processing liquid supply tube; a nozzle unit which is supplied with a processing liquid from the processing liquid supply tube and discharges the processing liquid to the substrate; and a light source unit which is provided to irradiate the processing liquid discharged from the nozzle unit with ultraviolet rays. According to the present disclosure, the processing liquid, which is electrified while passing the processing liquid supply tube, is irradiated with ultraviolet rays, such that electricity is eliminated from the electrified processing liquid, and as a result, it is possible to minimize a problem that the substrate is contaminated by peripheral particles or arcing occurs on the substrate.

Abstract: The present disclosure relates to a substrate processing apparatus and a substrate processing method. The substrate processing apparatus according to the exemplary embodiment of the present disclosure may include: a processing liquid supply tube; a nozzle unit which is supplied with a processing liquid from the processing liquid supply tube and discharges the processing liquid to the substrate; and a light source unit which is provided to irradiate the processing liquid discharged from the nozzle unit with ultraviolet rays. According to the present disclosure, the processing liquid, which is electrified while passing the processing liquid supply tube, is irradiated with ultraviolet rays, such that electricity is eliminated from the electrified processing liquid, and as a result, it is possible to minimize a problem that the substrate is contaminated by peripheral particles or arcing occurs on the substrate.

Abstract: A character input apparatus to input a character using a touch and drag method, the character input apparatus including: an interface to display a character on a touched location, if a touch is detected on the interface; a control unit to control the interface to change the displayed character and a location of the displayed character according to a dragging trace, if the touched location is dragged; and an input unit to input the displayed character displayed when the touch is completed. Accordingly, characters may be conveniently input on a narrow screen.

Abstract: A multimedia apparatus and a method for controlling operations thereof are provided. The multimedia apparatus includes an input unit for receiving a selection signal, a sensing unit for sensing disposition of the multimedia apparatus, and a controller for, if the selection signal is input, performing different operations depending on the disposition. Accordingly, various operations of the multimedia apparatus may be controlled by simple manipulation.

Abstract: A content searching method for enabling a user to directly search for desired contents is provided. The content searching method includes displaying a location of a cell including a content being executed in a distribution map, which displays a plurality of cells divided according to a distribution axis, and when a search button is input, redistributing and displaying a location of the cell including the content being executed in a distribution map, which displays a plurality of cells in a changed skin screen depending on a distribution axis having a changed keyword.

Abstract: A character input apparatus to input a character using a touch and drag method, the character input apparatus including: an interface to display a character on a touched location, if a touch is detected on the interface; a control unit to control the interface to change the displayed character and a location of the displayed character according to a dragging trace, if the touched location is dragged; and an input unit to input the displayed character displayed when the touch is completed. Accordingly, characters may be conveniently input on a narrow screen.

Abstract: A character input apparatus to input a character using a touch and drag method, the character input apparatus including: an interface to display a character on a touched location, if a touch is detected on the interface; a control unit to control the interface to change the displayed character and a location of the displayed character according to a dragging trace, if the touched location is dragged; and an input unit to input the displayed character displayed when the touch is completed. Accordingly, characters may be conveniently input on a narrow screen.

Abstract: Content reproducing apparatus and method of a mobile terminal are disclosed. During the reproduction of content, vibration pattern corresponding to content is detect or generated. The vibration pattern is synchronized with an audio signal during the reproduction of content.