Patents by Inventor Joon K. Kim

Joon K. Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10690475
    Abstract: Disclosed is a probe including a housing; a plurality of axially stacked caps disposed within the housing, the plurality of stacked caps including an inner cap and an outer cap, a probe sensor fixedly disposed between the inner cap and an axial bottom of the housing, and an electronic lead connected to the probe sensor and axially extending through the plurality of caps to an exterior of the probe.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: June 23, 2020
    Assignee: RAYTHEON TECHNOLOGIES CORPORATION
    Inventors: Eli Cole Warren, Joon K. Kim
  • Publication number: 20180238673
    Abstract: Disclosed is a probe including a housing; a plurality of axially stacked caps disposed within the housing, the plurality of stacked caps including an inner cap and an outer cap, a probe sensor fixedly disposed between the inner cap and an axial bottom of the housing, and an electronic lead connected to the probe sensor and axially extending through the plurality of caps to an exterior of the probe.
    Type: Application
    Filed: February 23, 2017
    Publication date: August 23, 2018
    Inventors: Eli Cole Warren, Joon K. Kim
  • Patent number: 5637966
    Abstract: The invention provides a method and apparatus for generating large amplitude nonlinear plasma waves, driven by an optimized train of independently adjustable, intense laser pulses. In the method, optimal pulse widths, interpulse spacing, and intensity profiles of each pulse are determined for each pulse in a series of pulses. A resonant region of the plasma wave phase space is found where the plasma wave is driven most efficiently by the laser pulses. The accelerator system of the invention comprises several parts: the laser system, with its pulse-shaping subsystem; the electron gun system, also called beam source, which preferably comprises photo cathode electron source and RF-LINAC accelerator; electron photo-cathode triggering system; the electron diagnostics; and the feedback system between the electron diagnostics and the laser system. The system also includes plasma source including vacuum chamber, magnetic lens, and magnetic field means.
    Type: Grant
    Filed: February 6, 1995
    Date of Patent: June 10, 1997
    Assignee: The Regents of the University of Michigan
    Inventors: Donald Umstadter, Eric Esarey, Joon K. Kim