Patents by Inventor Joon Lyou

Joon Lyou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate measurement apparatus with electron distortion unit
    Patent number: 9009861
    Abstract: Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.
    Type: Grant
    Filed: June 24, 2011
    Date of Patent: April 14, 2015
    Assignee: Korea Research Institute of Standards and Science
    Inventors: Byong Chon Park, Ju Youb Lee, Woon Song, Jin Ho Choi, Sang Jung Ahn, Joon Lyou, Won Young Song, Jae Wan Hong, Seung Hun Baek
  • FUSION MEASUREMENT APPARATUS
    Publication number: 20140130212
    Abstract: Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.
    Type: Application
    Filed: June 24, 2011
    Publication date: May 8, 2014
    Inventors: Byong Chon Park, Ju Youb Lee, Woon Song, Jin Ho Choi, Sang Jung Ahn, Joon Lyou, Won Young Song, Jae Wan Hong, Seung Hun Baek
  • Apparatus and method for repairing photo mask
    Patent number: 8153338
    Abstract: An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.
    Type: Grant
    Filed: July 29, 2010
    Date of Patent: April 10, 2012
    Assignees: Nanofocus Inc., Korea Research Institute of Standards and Science
    Inventors: Byong Chon Park, Sang Jung Ahn, Jin Ho Choi, Joon Lyou, Jae Wan Hong, Won Young Song, Ki Young Jung
  • Apparatus and method for repairing photo mask
    Publication number: 20110027698
    Abstract: An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.
    Type: Application
    Filed: July 29, 2010
    Publication date: February 3, 2011
    Inventors: Byong Chon Park, Sang Jung Ahn, Jin Ho Choi, Joon Lyou, Jae Wan Hong, Won Young Song, Ki-Young Jung