Abstract: Provided is an extreme ultra-violet (EUV) beam generation apparatus using multi-gas cell modules in which a gas is prevented from directly flowing into a vacuum chamber by adding an auxiliary gas cell serving as a buffer chamber to a main gas cell, a diffusion rate of the gas is decreased, a high vacuum state is maintained, and a higher power EUV beam is continuously generated.

Abstract: Provided is a single pulse laser apparatus. The apparatus including a resonator having a first mirror, a second mirror, a gain medium, and electro-optic modulators (EOMs) which perform each mode-locking and Q-switching, the apparatus includes a photodiode which measures laser light that oscillates from the resonator, a synchronizer which converts an electrical signal generated by measuring the laser light into a transistor-transistor logic (TTL) signal, a delay unit which sets a latency determined in order to synchronize a mode-locked pulse with a Q-switched pulse to the TTL signal, and outputs a trigger TTL signal according to the latency, and a Q-driver which inputs the trigger TTL signal to the EOM which performs Q-switching, and causes the EOM to operates.

Abstract: Disclosed herein is a single pulse laser apparatus that includes: a resonator having a first mirror, a second mirror, a gain medium, an electro-optic modulator (EOM) configured to perform single pulse switching, and an acousto-optic modulator (AOM) configured to perform mode-locking; a photodiode configured to measure a laser beam oscillated in the resonator; a synchronizer configured to convert an electrical signal, which is generated by measuring the laser beam, into a transistor-transistor logic (TTL) signal; a delay unit configured to set a delay time for the TTL signal to synchronize the EOM and the AOM and output a trigger TTL signal according to the delay time; an AOM driver configured to input the trigger TTL signal to the AOM that performs mode-locking and drive the AOM; and an EOM driver configured to input the trigger TTL signal to the EOM that performs single pulse switching and drive the EOM.

Abstract: Disclosed herein is a single pulse laser apparatus that includes: a resonator having a first mirror, a second mirror, a gain medium, an electro-optic modulator (EOM) configured to perform single pulse switching, and an acousto-optic modulator (AOM) configured to perform mode-locking; a photodiode configured to measure a laser beam oscillated in the resonator; a synchronizer configured to convert an electrical signal, which is generated by measuring the laser beam, into a transistor-transistor logic (TTL) signal; a delay unit configured to set a delay time for the TTL signal to synchronize the EOM and the AOM and output a trigger TTL signal according to the delay time; an AOM driver configured to input the trigger TTL signal to the AOM that performs mode-locking and drive the AOM; and an EOM driver configured to input the trigger TTL signal to the EOM that performs single pulse switching and drive the EOM.

Abstract: Provided is a single pulse laser apparatus. The apparatus including a resonator having a first mirror, a second mirror, a gain medium, and electro-optic modulators (EOMs) which perform each mode-locking and Q-switching, the apparatus includes a photodiode which measures laser light that oscillates from the resonator, a synchronizer which converts an electrical signal generated by measuring the laser light into a transistor-transistor logic (TTL) signal, a delay unit which sets a latency determined in order to synchronize a mode-locked pulse with a Q-switched pulse to the TTL signal, and outputs a trigger TTL signal according to the latency, and a Q-driver which inputs the trigger TTL signal to the EOM which performs Q-switching, and causes the EOM to operates.

Abstract: Provided is an extreme ultra-violet (EUV) beam generation apparatus using multi-gas cell modules in which a gas is prevented from directly flowing into a vacuum chamber by adding an auxiliary gas cell serving as a buffer chamber to a main gas cell, a diffusion rate of the gas is decreased, a high vacuum state is maintained, and a higher power EUV beam is continuously generated.

Abstract: Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.

Abstract: Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.

Abstract: Provided is a pulse laser apparatus for generating laser light. The apparatus includes a first mirror and a second mirror which are disposed at both ends of a resonator and configured to reflect the laser light, a gain medium disposed between the first and second mirrors and configured to amplify and output light incident from an outside, an etalon configured to adjust a pulse width of the laser light, and an acousto-optic modulator disposed between the first and second mirrors and configured to form a mode-locked and Q-switched signal from the laser light, in which some of the laser light is output through either the first or second mirror to outside the resonator.

Abstract: Provided is a pulse laser apparatus for generating laser light. The apparatus includes a first mirror and a second mirror which are disposed at both ends of a resonator and configured to reflect the laser light, a gain medium disposed between the first and second mirrors and configured to amplify and output light incident from an outside, an etalon configured to adjust a pulse width of the laser light, and an acousto-optic modulator disposed between the first and second mirrors and configured to form a mode-locked and Q-switched signal from the laser light, in which some of the laser light is output through either the first or second mirror to outside the resonator.