Abstract: Provided is a substrate cleaning apparatus of cleaning a substrate. The substrate cleaning apparatus includes a cleaning chamber, a first cleaning nozzle, a cover member, an air flow generation unit, and an exhaust unit. The main cleaning chamber has a cleaning space in which the substrate is cleaned and includes a sidewall in which a first vent hole is defined. The first cleaning nozzle is disposed in the main cleaning chamber to spray a first cleaning solution. The cover member covers the main cleaning chamber and has one side in which a second vent hole is defined. The air flow generation unit supplies air into the cleaning space through the first vent hole. The exhaust unit is coupled to the one side of the cover member to suck and exhaust the air supplied into the cleaning space through the second vent hole.

Abstract: Disclosed is a coupling for a faucet capable of keeping watertight even when high hydraulic pressure is generated at a connection between a faucet and a tube. The coupling faucet includes a male coupler 10 installed to an outer periphery of a discharge pipe of a faucet, and having a closed cylindrical upper portion, an opened cylindrical bottom, and an opening 12 formed at a side wall for receiving the discharge pipe of the faucet; a connector 20 interposed between the discharge pipe and the male coupler, and having an opened cylindrical upper portion, a slot 22 formed at an upper portion thereof corresponding to the opening 12 of the male coupler 10 for receiving the discharge pipe, and a fitting portion 24 formed at a lower portion of the connector to be coupled to a tube; and a cylindrical female coupler 30 provided on an inner periphery thereof with a threaded portion 32 which is engaged to a threaded portion 14 of the male coupler 10, and having a circular rim 34 formed at a lower inside.