Patents by Inventor Joon-Seo SONG

Joon-Seo SONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11017525
    Abstract: A semiconductor pattern detecting apparatus is provided.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: May 25, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jae Hyung Ahn, Souk Kim, Joon Seo Song, Young Hoon Sohn, Yu Sin Yang
  • Publication number: 20200184618
    Abstract: A semiconductor pattern detecting apparatus is provided.
    Type: Application
    Filed: August 15, 2019
    Publication date: June 11, 2020
    Inventors: Jae Hyung AHN, Souk KIM, Joon Seo SONG, Young Hoon SOHN, Yu Sin YANG
  • Patent number: 10593032
    Abstract: In a defect inspection method, first and second inspection conditions having a first sensitivity of detection signal and having a second sensitivity of a detection signal for a defect of interest (DOI), respectively, are determined. The first and second sensitivities are different. First and second images of the same detection region on a substrate surface under the first and second inspection conditions respectively, are obtained. The first and second images are matched to detect a defect in the detection region.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: March 17, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Yoon Ryu, Joon-Seo Song, Yu-Sin Yang, Chung-Sam Jun, Yun-Jung Jee
  • Publication number: 20180053295
    Abstract: In a defect inspection method, first and second inspection conditions having a first sensitivity of detection signal and having a second sensitivity of a detection signal for a defect of interest (DOI), respectively, are determined. The first and second sensitivities are different. First and second images of the same detection region on a substrate surface under the first and second inspection conditions respectively, are obtained. The first and second images are matched to detect a defect in the detection region.
    Type: Application
    Filed: January 27, 2017
    Publication date: February 22, 2018
    Inventors: Sung-Yoon Ryu, Joon-Seo Song, Yu-Sin Yang, Chung-Sam Jun, Yun-Jung Jee
  • Patent number: 9678020
    Abstract: Example embodiments relate to an apparatus and method for inspecting a substrate defect. The substrate defect inspecting apparatus includes a substrate, a light source emitting an infrared beam to the substrate, a detector detecting the infrared beam reflected from the substrate, and a defect analyzer receiving first information and second information from the detector and analyzing defects existing in the substrate. According to at least one example embodiment, the second information is acquired during a later process than the first information.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: June 13, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joon-Seo Song, Woo-seok Ko, Ji-Young Shin, Seong-Jin Yun, Yu-Sin Yang, Sang-Kil Lee, Chung-Sam Jun
  • Publication number: 20160025654
    Abstract: Example embodiments relate to an apparatus and method for inspecting a substrate defect. The substrate defect inspecting apparatus includes a substrate, a light source emitting an infrared beam to the substrate, a detector detecting the infrared beam reflected from the substrate, and a defect analyzer receiving first information and second information from the detector and analyzing defects existing in the substrate. According to at least one example embodiment, the second information is acquired during a later process than the first information.
    Type: Application
    Filed: July 9, 2015
    Publication date: January 28, 2016
    Inventors: Joon-Seo SONG, Woo-seok KO, Ji-Young SHIN, Seong-Jin YUN, Yu-Sin YANG, Sang-Kil LEE, Chung-Sam JUN