Patents by Inventor Joon Seong HAHN

Joon Seong HAHN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Metrology apparatus for a semiconductor pattern, metrology system including the same and metrology method using the same
    Patent number: 9863752
    Abstract: A metrology method includes obtaining a pattern reflection light reflected from an object by irradiating a first divided light, which is generated by reflecting a polarized light, to the object; obtaining a phase-controlled mirror reflection light reflected from a reflector by irradiating a second divided light, which is generated by transmitting the polarized light, to the reflector; and obtaining a pattern of the object based on an interference signal between the pattern reflection light and the mirror reflection light.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: January 9, 2018
    Assignee: SK Hynix Inc.
    Inventors: Yoon Shik Kang, Seong Min Ma, Joon Seong Hahn
  • METROLOGY APPARATUS FOR A SEMICONDUCTOR PATTERN, METROLOGY SYSTEM INCLUDING THE SAME AND METROLOGY METHOD USING THE SAME
    Publication number: 20170038194
    Abstract: A metrology method includes obtaining a pattern reflection light reflected from an object by irradiating a first divided light, which is generated by reflecting a polarized light, to the object; obtaining a phase-controlled mirror reflection light reflected from a reflector by irradiating a second divided light, which is generated by transmitting the polarized light, to the reflector; and obtaining a pattern of the object based on an interference signal between the pattern reflection light and the mirror reflection light.
    Type: Application
    Filed: November 24, 2015
    Publication date: February 9, 2017
    Inventors: Yoon Shik KANG, Seong Min MA, Joon Seong HAHN