Patents by Inventor Joon-Suh PARK

Joon-Suh PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230021549
    Abstract: Disclosed is a method of generating a functional singularity at a point or collection of points. The method may include determining a relationship between one or more parameters associated with a physical structure and a spatial gradient of field values of at least one of electromagnetic energy, sound energy, particle beam, or water waves manipulated by the physical structure, configuring, according to the relationship, the spatial gradient of field values to represent a functional singularity at a point, performing backpropagation using the spatial gradient of field values to obtain design parameters corresponding to values for the one or more parameters that achieve the functional singularity at the point, and producing a physical structure having the design parameters.
    Type: Application
    Filed: January 19, 2022
    Publication date: January 26, 2023
    Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE
    Inventors: Soon Wei Daniel LIM, Joon-Suh PARK, Maryna Leonidivna MERETSKA, Federico CAPASSO, Ahmed Hassen Dorrah
  • Publication number: 20220404525
    Abstract: An optical metasurface film includes a flexible polymeric film having a first major surface, a patterned polymer layer having a first surface proximate to the first major surface of the flexible polymeric film and having a second nanostructured surface opposite the first surface, and a refractive index contrast layer adjacent to the nanostructured surface of the patterned polymer layer forming a nanostructured bilayer with a nanostructured interface. The nanostructured bilayer acts locally on amplitude, phase, or polarization of light, or a combination thereof and imparts a light phase shift that varies as a function of position of the nano structured bilayer on the flexible polymeric film. The light phase shift of the nanostructured bilayer defines a predetermined operative phase profile of the optical metasurface film.
    Type: Application
    Filed: December 1, 2020
    Publication date: December 22, 2022
    Inventors: Martin B. Wolk, Robert L. Brott, Karl K. Stensvad, James M. Nelson, Federico Capasso, Xinghui Yin, Joon-Suh Park
  • Patent number: 10811552
    Abstract: The present invention relates to a solar cell having a wavelength converting layer formed of a polysilazane and a manufacturing method thereof to allow for low temperature sintering, to protect a wavelength converter from oxidation, degradation, and whitening, and thereby improve efficiency of the solar cell. The present invention provides for the solar cell including the wavelength converting layer which is formed by applying a coating solution containing a solvent, a polysilazane, and a wavelength converter onto a cell and an outer surface or inside of the cell, and then curing, and a manufacturing method of.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: October 20, 2020
    Assignee: Korea Institute of Science and Technology
    Inventors: So Hye Cho, Il Ki Han, Doo Hyun Ko, Joon Soo Han, Bok Ryul Yoo, Seung Yong Lee, Hyungduk Ko, Joon-Suh Park
  • Patent number: 9818943
    Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, the forming of a first quantum dot layer on the activated substrate includes: coating a polymer with a polarity opposite to a surface charge of the activated substrate or coating quantum dots having a functional group charged with a polarity opposite to a surface charge of the activated substrate onto the substrate; washing the substrate with water having pH 6 to pH 8; drying the substrate with flow of nitrogen, argon or air; coating quantum dots having a functional group charged with a polarity opposite to the polymer or the quantum dots charge coated on the substrate, or coating a polymer with a polarity opposite to the quantum dots charge coated on the substrate; washing the substrate with water having pH 6 to pH 8; and drying the substrate with flow of nitrogen, argon or air.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: November 14, 2017
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Joon-Suh Park, Il Ki Han, Ji Hoon Kyhm
  • Publication number: 20170229650
    Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, the forming of a first quantum dot layer on the activated substrate includes: coating a polymer with a polarity opposite to a surface charge of the activated substrate or coating quantum dots having a functional group charged with a polarity opposite to a surface charge of the activated substrate onto the substrate; washing the substrate with water having pH 6 to pH 8; drying the substrate with flow of nitrogen, argon or air; coating quantum dots having a functional group charged with a polarity opposite to the polymer or the quantum dots charge coated on the substrate, or coating a polymer with a polarity opposite to the quantum dots charge coated on the substrate; washing the substrate with water having pH 6 to pH 8; and drying the substrate with flow of nitrogen, argon or air.
    Type: Application
    Filed: April 24, 2017
    Publication date: August 10, 2017
    Inventors: Joon-Suh PARK, Il Ki HAN, Ji Hoon KYHM
  • Patent number: 9666821
    Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, which includes: forming a first photoresist pattern on a substrate; activating a surface of the substrate having the first photoresist pattern formed thereon; forming a first quantum dot layer on the activated substrate; generating a first quantum dot pattern by removing the first photoresist pattern; and generating a second quantum dot pattern on the same layer as the first quantum dot pattern generated on the substrate. Accordingly, various kinds of quantum dots may be easily implemented at a single substrate.
    Type: Grant
    Filed: June 30, 2015
    Date of Patent: May 30, 2017
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Joon-Suh Park, Il Ki Han, Ji Hoon Kyhm
  • Publication number: 20160351842
    Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, which includes: forming a first photoresist pattern on a substrate; activating a surface of the substrate having the first photoresist pattern formed thereon; forming a first quantum dot layer on the activated substrate; generating a first quantum dot pattern by removing the first photoresist pattern; and generating a second quantum dot pattern on the same layer as the first quantum dot pattern generated on the substrate. Accordingly, various kinds of quantum dots may be easily implemented at a single substrate.
    Type: Application
    Filed: June 30, 2015
    Publication date: December 1, 2016
    Inventors: Joon-Suh PARK, Il Ki HAN, Ji Hoon KYHM
  • Publication number: 20150364632
    Abstract: The present invention relates to a solar cell having a wavelength converting layer formed of a polysilazane and a manufacturing method thereof to allow for low temperature sintering, to protect a wavelength converter from oxidation, degradation, and whitening, and thereby improve efficiency of the solar cell. The present invention provides for the solar cell including the wavelength converting layer which is formed by applying a coating solution containing a solvent, a polysilazane, and a wavelength converter onto a cell and an outer surface or inside of the cell, and then curing, and a manufacturing method of.
    Type: Application
    Filed: January 28, 2015
    Publication date: December 17, 2015
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: So Hye CHO, Il Ki HAN, Doo Hyun KO, Joon Soo HAN, Bok Ryul YOO, Seung Yong LEE, Hyungduk KO, Joon-Suh PARK