Patents by Inventor Joon-Yong Kim

Joon-Yong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240358827
    Abstract: Disclosed is a stable liquid formulation, comprising an antibody or antigen-binding portion thereof, an acetate buffer, glycine, and a surfactant, wherein the stable liquid formulation does not comprise at least one of sugar, a sugar alcohol and a metal salt, and the stable liquid formulation is still stable even upon high antibody content, and is superior in osmolality and viscosity, and subcutaneous administration thereof is possible.
    Type: Application
    Filed: April 17, 2024
    Publication date: October 31, 2024
    Applicant: CELLTRION INC.
    Inventors: Joon Won LEE, Yeon Kyeong SHIN, Hye Young KANG, Kwang Woo KIM, So Young KIM, Su Jung KIM, Jun Seok OH, Won Yong HAN
  • Patent number: 12065482
    Abstract: A stable liquid pharmaceutical preparation of an anti-influenza virus antibody and, more specifically, a stable liquid pharmaceutical preparation that comprises: (A) an anti-influenza virus antibody or a mixture of two or more different types of anti-influenza virus antibodies; (B) a surfactant; (C) a sugar or a sugar derivative; and (D) an amino acid. The stable liquid pharmaceutical preparation for an anti-influenza virus antibody disclosed herein has excellent storage stability at low temperature (5° C.), room temperature (25° C.), and high temperature (40° C.) and excellent long-term (12 months) storage stability, and may be administered intravenously, intramuscularly, transdermally, subcutaneously, intraperitoneally, topically, or in combinations thereof.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: August 20, 2024
    Assignee: Celltrion Inc.
    Inventors: Joon Won Lee, Won Yong Han, Su Jung Kim, Jun Seok Oh, So Young Kim, Kwang Woo Kim, Yeon Kyeong Shin
  • Publication number: 20240269069
    Abstract: The present invention provides a stable liquid pharmaceutical formulation containing: an antibody or its antigen-binding fragment; a surfactant; a sugar or its derivative; and a buffer. The stable liquid pharmaceutical formulation according to the present invention has low viscosity while containing a high content of the antibody, has excellent long-term storage stability based on excellent stability under accelerated conditions and severe conditions, and may be administered subcutaneously.
    Type: Application
    Filed: February 6, 2024
    Publication date: August 15, 2024
    Inventors: Joon Won Lee, Won Yong Han, Su Jung Kim, Jun Seok Oh, So Young Kim, Su Hyeon Hong, Yeon Kyeong Shin
  • Publication number: 20240269071
    Abstract: The present invention provides a stable liquid pharmaceutical formulation containing: an antibody or its antigen-binding fragment; a surfactant; a sugar or its derivative; and a buffer. The stable liquid pharmaceutical formulation according to the present invention has low viscosity while containing a high content of the antibody, has excellent long-term storage stability based on excellent stability under accelerated conditions and severe conditions, and may be administered subcutaneously.
    Type: Application
    Filed: March 1, 2024
    Publication date: August 15, 2024
    Inventors: Joon Won Lee, Won Yong Han, Su Jung Kim, Jun Seok Oh, So Young Kim, Su Hyeon Hong, Yeon Kyeong Shin
  • Publication number: 20240260360
    Abstract: A display device includes: a pixel circuit layer including a base layer, a pixel circuit, and a passivation layer including a well area and a protrusion area; and a light-emitting-element layer disposed on the pixel circuit layer, and including a light emitting element, and a connecting electrode, the light emitting element including a first electrode, a second electrode, and an emission part. The connecting electrode is disposed in the protrusion area, and at least a portion of the connecting electrode overlaps the well area and does not contact the passivation layer. The emission part includes a hole layer, an electron layer, and an emission layer. The hole layer connects the first electrode and the emission layer. The electron layer connects the second electrode and the emission layer. Each of the hole layer and the second electrode has an end portion on the connecting electrode.
    Type: Application
    Filed: November 28, 2023
    Publication date: August 1, 2024
    Applicant: Samsung Display Co., LTD.
    Inventors: Duck Jung LEE, Hye Jin GWARK, Jae Ik KIM, Hwi KIM, Jung Sun PARK, Seung Yong SONG, Yeon Hwa LEE, Joon Gu LEE
  • Patent number: 12038593
    Abstract: Provided is a near-infrared ray absorbing article. A near-infrared ray absorbing article of the present invention is capable of preventing a decrease in visible transmittance and near-infrared absorption due to the interaction between a plurality of organic materials forming light-absorbing layers. In addition, the near-infrared ray absorbing article of the present invention has the advantage of being able to be thinner. In addition, the near-infrared ray absorbing article of the present invention has the advantage of excellent mechanical properties such as strength and heat resistance.
    Type: Grant
    Filed: December 1, 2020
    Date of Patent: July 16, 2024
    Assignee: LMS CO., LTD.
    Inventors: Sung Hwan Moon, Seon Ho Yang, Choon Woo Ji, Nam Woo Kang, Joon Ho Jung, Bo Chul Kang, Hee Kyeong Kim, Jeong Og Choi, Seong Yong Yoon
  • Patent number: 12037477
    Abstract: Provided is a near-infrared ray absorbing article. A near-infrared ray absorbing article of the present invention is capable of preventing a decrease in visible transmittance and near-infrared absorption due to the interaction between a plurality of organic materials forming light-absorbing layers. In addition, the near-infrared ray absorbing article of the present invention has the advantage of being able to be thinner. In addition, the near-infrared ray absorbing article of the present invention has the advantage of excellent mechanical properties such as strength and heat resistance.
    Type: Grant
    Filed: December 1, 2020
    Date of Patent: July 16, 2024
    Assignee: LMS CO., LTD.
    Inventors: Sung Hwan Moon, Seung Man Han, Seon Ho Yang, Tae Kwang Park, Joon Ho Jung, Bo Chul Kang, Hee Kyeong Kim, Seong Don Hwang, Seong Yong Yoon, Ho Seong Na, Ji Tae Kim
  • Patent number: 9532866
    Abstract: An acellular dermal graft is provided. The acellular dermal graft may be useful in minimizing side effects caused after transplantation since an environment favorable for formation of new blood vessels and proliferation of autologous tissues is provided by forming a multi-penetration structure in an acellular dermal tissue, removing a basement membrane layer and/or subjecting corners to slope cutting, and transplantation is stably performed within a short transplantation time due to improved extensibility and flexibility of tissues. The acellular dermal graft may be useful in reducing a time required to recover tissues after transplantation since the transplantation is stably performed due to improved grafting reaction with a host tissue by enhancing uptake of fibroblasts and promoting angiogenic activities.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: January 3, 2017
    Assignee: L&C BIO CO., LTD.
    Inventors: Joon Yong Kim, Byung Moo Kim, Yong Sup Hwang, Whan Chul Lee, Soo Jeong Seo, Ju Hee Lee, Hyung Gu Kim
  • Patent number: 9461637
    Abstract: According to example embodiments, a method for controlling a gate voltage applied to a gate electrode of a high electron mobility transistor (HEMT) may include measuring a voltage between a drain electrode and a source electrode of the HEMT, and adjusting a level of the gate voltage applied to the gate electrode of the HEMT according to the measured voltage. The level of the gate electrode may be adjusted if the voltage between the drain electrode and the source electrode is different than a set value.
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: October 4, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sun-kyu Hwang, Woo-chul Jeon, Joon-yong Kim, Ki-yeol Park, Young-hwan Park, Jai-kwang Shin, Jae-joon Oh, Jong-bong Ha
  • Patent number: 9231093
    Abstract: A high electron mobility transistor (HEMT) according to example embodiments includes a channel layer, a channel supply layer on the channel layer, a source electrode and a drain electrode on at least one of the channel layer and the channel supply layer, a gate electrode between the source electrode and the drain electrode, and a Schottky electrode forming a Schottky contact with the channel supply layer. An upper surface of the channel supply layer may define a Schottky electrode accommodation unit. At least part of the Schottky electrode may be in the Schottky electrode accommodation unit. The Schottky electrode is electrically connected to the source electrode.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: January 5, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woo-chul Jeon, Kyoung-yeon Kim, Jong-seob Kim, Joon-yong Kim, Ki-yeol Park, Young-hwan Park, Jai-kwang Shin, Jae-joon Oh, Hyuk-soon Choi, Jong-bong Ha, Sun-kyu Hwang, In-jun Hwang
  • Patent number: 9117890
    Abstract: According to example embodiments, a HEMT includes a channel supply layer on a channel layer, a p-type semiconductor structure on the channel supply layer, a gate electrode on the p-type semiconductor structure, and source and drain electrodes spaced apart from two sides of the gate electrode respectively. The channel supply layer may have a higher energy bandgap than the channel layer. The p-type semiconductor structure may have an energy bandgap that is different than the channel supply layer. The p-type semiconductor structure may include a hole injection layer (HIL) on the channel supply layer and be configured to inject holes into at least one of the channel layer and the channel supply in an on state. The p-type semiconductor structure may include a depletion forming layer on part of the HIL. The depletion forming layer may have a dopant concentration that is different than the dopant concentration of the HIL.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: August 25, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-seob Kim, Kyoung-yeon Kim, Joon-yong Kim, Jai-kwang Shin, Jae-joon Oh, Hyuk-soon Choi, Jong-bong Ha, Sun-kyu Hwang, In-jun Hwang
  • Publication number: 20150057751
    Abstract: An acellular dermal graft is provided. The acellular dermal graft may be useful in minimizing side effects caused after transplantation since an environment favorable for formation of new blood vessels and proliferation of autologous tissues is provided by forming a multi-penetration structure in an acellular dermal tissue, removing a basement membrane layer and/or subjecting corners to slope cutting, and transplantation is stably performed within a short transplantation time due to improved extensibility and flexibility of tissues. The acellular dermal graft may be useful in reducing a time required to recover tissues after transplantation since the transplantation is stably performed due to improved grafting reaction with a host tissue by enhancing uptake of fibroblasts and promoting angiogenic activities.
    Type: Application
    Filed: September 11, 2014
    Publication date: February 26, 2015
    Inventors: Joon Yong KIM, Byung Moo KIM, Yong Sup HWANG, Whan Chul LEE, Soo Jeong SEO, Ju Hee LEE, Hyung Gu KIM
  • Patent number: 8890212
    Abstract: According to example embodiments, a normally-off high electron mobility transistor (HEMT) includes: a channel layer having a first nitride semiconductor, a channel supply layer on the channel layer, a source electrode and a drain electrode at sides of the channel supply layer, a depletion-forming layer on the channel supply layer, a gate insulating layer on the depletion-forming layer, and a gate electrode on the gate insulation layer. The channel supply layer includes a second nitride semiconductor and is configured to induce a two-dimensional electron gas (2DEG) in the channel layer. The depletion-forming layer is configured has at least two thicknesses and is configured to form a depletion region in at least a partial region of the 2DEG. The gate electrode contacts the depletion-forming layer.
    Type: Grant
    Filed: May 1, 2013
    Date of Patent: November 18, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woo-chul Jeon, Young-hwan Park, Jae-joon Oh, Kyoung-yeon Kim, Joon-yong Kim, Ki-yeol Park, Jai-kwang Shin, Sun-kyu Hwang
  • Publication number: 20140240026
    Abstract: According to example embodiments, a method for controlling a gate voltage applied to a gate electrode of a high electron mobility transistor (HEMT) may include measuring a voltage between a drain electrode and a source electrode of the HEMT, and adjusting a level of the gate voltage applied to the gate electrode of the HEMT according to the measured voltage. The level of the gate electrode may be adjusted if the voltage between the drain electrode and the source electrode is different than a set value.
    Type: Application
    Filed: December 16, 2013
    Publication date: August 28, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sun-kyu HWANG, Woo-chul JEON, Joon-yong KIM, Ki-yeol PARK, Young-hwan PARK, Jai-kwang SHIN, Jae-joon OH, Jong-bong HA
  • Patent number: 8715162
    Abstract: Disclosed is a method for complex phalloplasty for widening a penis, using a circumcised foreskin as an autologous graft. In the method, a foreskin cut off by circumcision, conventionally discarded as waste, is implanted as an autograft in phalloplasty, whereby the penis can be widened.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: May 6, 2014
    Inventor: Joon-Yong Kim
  • Publication number: 20140097470
    Abstract: According to example embodiments, a HEMT includes a channel supply layer on a channel layer, a p-type semiconductor structure on the channel supply layer, a gate electrode on the p-type semiconductor structure, and source and drain electrodes spaced apart from two sides of the gate electrode respectively. The channel supply layer may have a higher energy bandgap than the channel layer. The p-type semiconductor structure may have an energy bandgap that is different than the channel supply layer. The p-type semiconductor structure may include a hole injection layer (HIL) on the channel supply layer and be configured to inject holes into at least one of the channel layer and the channel supply in an on state. The p-type semiconductor structure may include a depletion forming layer on part of the HIL. The depletion forming layer may have a dopant concentration that is different than the dopant concentration of the HIL.
    Type: Application
    Filed: June 5, 2013
    Publication date: April 10, 2014
    Inventors: Jong-seob KIM, Kyoung-yeon KIM, Joon-yong KIM, Jai-kwang SHIN, Jae-joon OH, Hyuk-soon CHOI, Jong-bong HA, Sun-kyu HWANG, In-jun HWANG
  • Publication number: 20140091363
    Abstract: According to example embodiments, a normally-off high electron mobility transistor (HEMT) includes: a channel layer having a first nitride semiconductor, a channel supply layer on the channel layer, a source electrode and a drain electrode at sides of the channel supply layer, a depletion-forming layer on the channel supply layer, a gate insulating layer on the depletion-forming layer, and a gate electrode on the gate insulation layer. The channel supply layer includes a second nitride semiconductor and is configured to induce a two-dimensional electron gas (2DEG) in the channel layer. The depletion-forming layer is configured has at least two thicknesses and is configured to form a depletion region in at least a partial region of the 2DEG. The gate electrode contacts the depletion-forming layer.
    Type: Application
    Filed: May 1, 2013
    Publication date: April 3, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Woo-chul JEON, Young-hwan PARK, Jae-joon OH, Kyoung-yeon KIM, Joon-yong KIM, Ki-yeol PARK, Jai-kwang SHIN, Sun-kyu HWANG
  • Publication number: 20140024888
    Abstract: Disclosed is a method for complex phalloplasty for widening a penis, using a circumcised foreskin as an autologous graft. In the method, a foreskin cut off by circumcision, conventionally discarded as waste, is implanted as an autograft in phalloplasty, whereby the penis can be widened.
    Type: Application
    Filed: July 18, 2012
    Publication date: January 23, 2014
    Inventor: Joon-Yong KIM
  • Publication number: 20140021511
    Abstract: A high electron mobility transistor (HEMT) according to example embodiments includes a channel layer, a channel supply layer on the channel layer, a source electrode and a drain electrode on at least one of the channel layer and the channel supply layer, a gate electrode between the source electrode and the drain electrode, and a Schottky electrode forming a Schottky contact with the channel supply layer. An upper surface of the channel supply layer may define a Schottky electrode accommodation unit. At least part of the Schottky electrode may be in the Schottky electrode accommodation unit. The Schottky electrode is electrically connected to the source electrode.
    Type: Application
    Filed: March 14, 2013
    Publication date: January 23, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Woo-chul JEON, Kyoung-yeon KIM, Jong-seob KIM, Joon-yong KIM, Ki-yeol PARK, Young-hwan PARK, Jai-kwang SHIN, Jae-joon OH, Hyuk-soon CHOI, Jong-bong HA, Sun-kyu HWANG, In-jun HWANG
  • Patent number: 7806821
    Abstract: Disclosed herein is a method of phalloplasty for girth enhancement. It comprises incising minimally the outer skin of a penis; separating the skin and the hypoderm from a part immediately above Buck's fascia and peeling off the skin and the hypoderm in a region ranging from a part proximal to a glans to prepubic junction; forming a mesh structure of multiple slits in a penile implant; and fixing the penile implant to the penis by suture. The formation of a mesh structure of multiple slits or the use of an implant in multiple pieces makes it possible to cope with complications, thereby significantly reducing complications. Also, the multiple slits or multiple pieces form spaces therebetween, which lead to an increase in flexibility between the implant tissues, thereby enjoying the advantages of minimizing discomfort upon erection and reducing the occurrence of penis curvature. The delicate irregularities of the penis may serve as a factor promoting sexual stimulation upon sexual intercourse.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: October 5, 2010
    Inventor: Joon-Yong Kim