Abstract: An exposure apparatus includes a frame member with a first stage having a substrate disposed thereon provided in a lower portion of the frame member. A leveling mechanism is provided for adjusting an orientation of the first stage. The exposure apparatus further includes a second stage positioned over the first stage and fixed to the frame member. A reticle is positioned on the second stage. An exposure area limiting mechanism is provided in the exposure apparatus and positioned over the second stage. The exposure area limiting mechanism defines an opening through which light is capable of passing during exposure for limiting an exposure area of the second stage. The exposure apparatus also includes an illumination system to irradiate light to the exposure area limiting means.