Patents by Inventor Joon Sang Park

Joon Sang Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12617361
    Abstract: To robustly estimate three-dimensional behaviors of an occupant by fusing, through a particle filter, information obtained through vehicle indoor cameras and through vehicle internal information sensors, an occupant behavior estimation system includes: a camera configured to obtain images of the at least one occupant within the vehicle; sensors configured to obtain information on the vehicle; an image processing device configured to process images obtained from the camera and to obtain key point information of the at least one occupant and object tracking information that is provided by tracking the at least one occupant; and a vehicle safety controller configured to estimate the behaviors of the occupant by using a particle filter based on the information on the vehicle obtained through the sensors, the key point information and the object tracking information, which are obtained from the image processing device.
    Type: Grant
    Filed: March 15, 2023
    Date of Patent: May 5, 2026
    Assignees: HYUNDAI MOTOR COMPANY, Kia Corporation
    Inventor: Joon Sang Park
  • Publication number: 20230406250
    Abstract: A vehicle for protecting an occupant includes: a plurality of safe devices provided in the vehicle for protecting the occupant; first sensors configured to obtain information on a seat or the occupant within the vehicle; second sensors configured to detect a collision with other objects; and a processor which is operatively connected to the safe devices, the first sensors, and the second sensors. The processor is configured to obtain state information on at least one of the seat or the occupant based on the information obtained from the first sensors, to determine at least one safe device to be operated among the plurality of safe devices based on the state information on the at least one of the seat or the occupant, and to operate the determined at least one safe device when at least one of the second sensors detects a collision satisfying a predetermined condition.
    Type: Application
    Filed: May 19, 2023
    Publication date: December 21, 2023
    Applicants: HYUNDAI MOTOR COMPANY, Kia Corporation
    Inventors: Hyung Wook PARK, Joon Sang PARK, Sung Wook LEE
  • Publication number: 20230294628
    Abstract: To robustly estimate three-dimensional behaviors of an occupant by fusing, through a particle filter, information obtained through vehicle indoor cameras and through vehicle internal information sensors, an occupant behavior estimation system includes: a camera configured to obtain images of the at least one occupant within the vehicle; sensors configured to obtain information on the vehicle; an image processing device configured to process images obtained from the camera and to obtain key point information of the at least one occupant and object tracking information that is provided by tracking the at least one occupant; and a vehicle safety controller configured to estimate the behaviors of the occupant by using a particle filter based on the information on the vehicle obtained through the sensors, the key point information and the object tracking information, which are obtained from the image processing device.
    Type: Application
    Filed: March 15, 2023
    Publication date: September 21, 2023
    Applicants: HYUNDAI MOTOR COMPANY, Kia Corporation
    Inventor: Joon Sang PARK
  • Patent number: 11327079
    Abstract: The present invention relates to a method of directly detecting, using a mass-spectrometry method, whether a microorganism contained in a sample is resistant to antibiotics, and a kit for detection used therewith. More particularly, the present invention relates to a method and kit for directly detecting an antibiotic hydrolase secreted by a microorganism resistant to antibiotics, thereby directly determining whether the microorganism is resistant to antibiotics. According to the present invention, it is possible to very simply and immediately confirm whether a specific strain is resistant to antibiotics in the field. In particular, a complicated pretreatment process such as proteolysis is not performed, and a complicated identification process of calibrating and then combining the obtained results is not performed.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: May 10, 2022
    Assignee: DK HOLDINGS COMPANY, LTD
    Inventors: Kye Shin Park, Joon Sang Park, Eun Hee Lee, Dong Hwi Hwang, In Jung Ji, Jae Woo Roh, Jin Sung Ahn, Eun-Jeong Yoon, Ji Hye Ko
  • Publication number: 20210318332
    Abstract: The present invention relates to a method of directly detecting, using a mass-spectrometry method, whether a microorganism contained in a sample is resistant to antibiotics, and a kit for detection used therewith. More particularly, the present invention relates to a method and kit for directly detecting an antibiotic hydrolase secreted by a microorganism resistant to antibiotics, thereby directly determining whether the microorganism is resistant to antibiotics. According to the present invention, it is possible to very simply and immediately confirm whether a specific strain is resistant to antibiotics in the field. In particular, a complicated pretreatment process such as proteolysis is not performed, and a complicated identification process of calibrating and then combining the obtained results is not performed.
    Type: Application
    Filed: December 12, 2018
    Publication date: October 14, 2021
    Inventors: Kye Shin PARK, Joon Sang PARK, Eun Hee LEE, Dong Hwi HWANG, In Jung JI, Jae WOO ROH, Jin Sung AHN, Eun-Jeong YOON, Ji Hye KO
  • Patent number: 6930054
    Abstract: Disclosed herein are slurry compositions for use in CMP(chemical mechanical polishing) process of metal wiring in manufacturing semiconductor devices, comprising a peroxide, an inorganic acid, a propylenediaminetetraacetate(PDTA)-metal complex, a carboxylic acid, a metal oxide powder, and de-ionized water, wherein the PDTA-metal complex plays a major role in improving overall polishing performance and reproducibility thereof by preventing abraded tungsten oxide from readhesion onto the polished surface, as well as in improving the dispersion stability of the slurry composition.
    Type: Grant
    Filed: August 6, 2002
    Date of Patent: August 16, 2005
    Assignees: Cheil Industries, Inc., Samsung Electronics Co., Ltd.
    Inventors: Jae Seok Lee, Won Joong Do, Hyun Soo Roh, Kil Sung Lee, Jong Won Lee, Bo Un Yoon, Sang Rok Hah, Joon Sang Park, Chang Ki Hong
  • Publication number: 20040244911
    Abstract: Disclosed herein are slurry compositions for use in CMP (chemical mechanical polishing) process of metal wiring in manufacturing semiconductor devices, comprising a peroxide, an inorganic acid, a propylenediaminetetraacetate (PDTA)-metal complex, a carboxylic acid, a metal oxide powder, and de-ionized water, wherein the PDTA-metal complex plays a major role in improving overall polishing performance and reproducibility thereof by preventing abraded tungsten oxide from readhesion onto the polished surface, as well as in improving the dispersion stability of the slurry composition.
    Type: Application
    Filed: July 1, 2004
    Publication date: December 9, 2004
    Inventors: Jae Seok Lee, Won Joong Do, Hyun Soo Roh, Kil Sung Lee, Jon Won Lee, Bo Un Yoon, Sang Rok Hah, Joon Sang Park, Chang Ki Hong