Abstract: Provided is a stripper composition and a method for forming a pattern using the same. The stripper composition includes, in set content ranges, an amine compound, a glycol compound, an aprotic polar solvent excluding N-methyl-2-pyrrolidone and N-methylformamide, and a first corrosion inhibitor represented by Formula 1. The stripper composition according to an embodiment may be used in a process of removing a photoresist pattern formed on a lower film, and may supply characteristics of an excellent stripping power for photoresist and prevention or reduction of damage of the lower film.