Patents by Inventor Joost Anne Veerman
Joost Anne Veerman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190037704Abstract: A maintenance unit for an inkjet system with a print head assembly having at least one print head being an integral unit configured to eject droplets of ink fluid from nozzles arranged in a surface of the at least one print head towards a substrate includes a wiper to wipe along the surface of the at least one print head; a force actuator to apply a force to the wiper in a direction perpendicular to the surface of the at least one print head; a force measuring unit configured to determine a wiping force with which the wiper is pressed against the surface of the at least one print head; and a controller configured to control the force applied by the force actuator in dependency of an output of the force measuring unit in order to press the wiper against the surface of a print head with a predetermined wiping force.Type: ApplicationFiled: October 4, 2018Publication date: January 31, 2019Applicant: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
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Patent number: 10123427Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.Type: GrantFiled: August 15, 2017Date of Patent: November 6, 2018Assignee: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
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Publication number: 20170347461Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.Type: ApplicationFiled: August 15, 2017Publication date: November 30, 2017Applicant: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
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Patent number: 9769932Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalize the substrate. In case of a rejection, the substrate including print defects can be recycled.Type: GrantFiled: May 6, 2016Date of Patent: September 19, 2017Assignee: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
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Publication number: 20160255727Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.Type: ApplicationFiled: May 6, 2016Publication date: September 1, 2016Applicant: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
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Patent number: 9363899Abstract: A printing process for printing (P) an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout (R). The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image (rii) for allocating dot positions of the ink pattern is generated. The printing process comprises a step of comparing a scan (S) image (rsi) with the input image to carry out a quality inspection (Q) to detect any print defects in the printed ink pattern. The printing process comprises a step of providing a decision (os) on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station (E) to finalize the substrate. In case of a rejection, the substrate including print defects can be recycled (D).Type: GrantFiled: December 28, 2012Date of Patent: June 7, 2016Assignee: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
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Publication number: 20140374375Abstract: A printing process for printing (P) an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout (R). The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image (rii) for allocating dot positions of the ink pattern is generated. The printing process comprises a step of comparing a scan (S) image (rsi) with the input image to carry out a quality inspection (Q) to detect any print defects in the printed ink pattern. The printing process comprises a step of providing a decision (os) on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station (E) to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled (D).Type: ApplicationFiled: December 28, 2012Publication date: December 25, 2014Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman