Patents by Inventor Joost Cyrillus Lambert Hageman

Joost Cyrillus Lambert Hageman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method
    Patent number: 8610878
    Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: December 17, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Francis Fahrni, Gerardus Johannes Joseph Keijsers, Heine Melle Mulder, Willem Richard Pongers, Joost Cyrillus Lambert Hageman, Mattheus Johannes Van Bruggen, Johannes Franciscus Roosekrans, David James Butler, Patrick Marcel Maria Thomassen, Gabriela Vesselinova Paeva
  • Lithographic apparatus and method
    Patent number: 8194231
    Abstract: A lithographic apparatus includes an illumination system configured to condition a beam of radiation, a support structure configured to hold a reticle, a substrate table configured to hold a substrate, and a projection system configured to project a beam onto the substrate table. The numerical aperture of the illumination system is larger than the numerical aperture of the projection system. The apparatus also includes a radiation redirection device configured to re-direct ?>1 components of the beam of radiation to within the numerical aperture of the projection system.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: June 5, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Heine Melle Mulder, Joost Cyrillus Lambert Hageman, Roland Johannes Wilhelmus Stas
  • Lithographic Apparatus and Method
    Publication number: 20110216297
    Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.
    Type: Application
    Filed: December 13, 2010
    Publication date: September 8, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus BASELMANS, Francis Fahrni, Gerardus Johannes Joseph Keijsers, Heine Melle Mulder, Willem Richard Pongers, Joost Cyrillus Lambert Hageman, Mattheus Johannes Van Bruggen, Johannes Franciscus Roosekrans, David James Butler, Patrick Marcel Maria Thomassen, Gabriela Vesselinova Paeva
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20090109415
    Abstract: A lithographic apparatus includes an illumination system configured to condition a beam of radiation, a support structure configured to hold a reticle, a substrate table configured to hold a substrate, and a projection system configured to project a beam onto the substrate table. The numerical aperture of the illumination system is larger than the numerical aperture of the projection system. The apparatus also includes a radiation redirection device configured to re-direct ?>1 components of the beam of radiation to within the numerical aperture of the projection system.
    Type: Application
    Filed: September 30, 2008
    Publication date: April 30, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Heine Melle MULDER, Joost Cyrillus Lambert Hageman, Roland Johannes Wilhelmus Stas