Patents by Inventor Joost Kos

Joost Kos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100178612
    Abstract: A lithographic apparatus includes a support constructed to support a patterning device for imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. The patterning device includes one or more alignment patterns, the lithographic apparatus including a secondary illumination system effective to illuminate each alignment pattern with radiation separate from said radiation beam, the projection system projecting an image of each alignment pattern onto the substrate table. The substrate table includes a number of sensor arrangements, each sensitive to the projected image of one of said alignment patterns.
    Type: Application
    Filed: December 18, 2009
    Publication date: July 15, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes ONVLEE, Jan Jaap Kuit, Joost Kos