Patents by Inventor Joost Sytsma

Joost Sytsma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7428040
    Abstract: Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
    Type: Grant
    Filed: March 13, 2007
    Date of Patent: September 23, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Cheng-Qun Gui, Arno Jan Bleeker, Pieter Willem Herman De Jager, Joost Sytsma
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070206172
    Abstract: Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
    Type: Application
    Filed: March 13, 2007
    Publication date: September 6, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Cheng-Qun Gui, Arno Bleeker, Pieter De Jager, Joost Sytsma
  • Lithographic apparatus and device manufacturing method
    Patent number: 7190434
    Abstract: Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: March 13, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Cheng-Qun Gui, Arno Jan Bleeker, Pieter Willem Herman De Jager, Joost Sytsma
  • Lithographic apparatus and device manufacturing method
    Patent number: 7061586
    Abstract: A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.
    Type: Grant
    Filed: March 2, 2004
    Date of Patent: June 13, 2006
    Assignee: ASML Netherlands BV
    Inventors: Joost Sytsma, Pieter Willem Herman de Jager
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050195380
    Abstract: A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.
    Type: Application
    Filed: March 2, 2004
    Publication date: September 8, 2005
    Inventors: Joost Sytsma, Pieter de Jager
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050179884
    Abstract: Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
    Type: Application
    Filed: February 18, 2004
    Publication date: August 18, 2005
    Inventors: Cheng-Qun Gui, Arno Bleeker, Pieter De Jager, Joost Sytsma
  • Lithography apparatus with filters for optimizing uniformity of an image
    Patent number: 6404499
    Abstract: A lithographic projection apparatus has a correction device for lithographic projection. The lithographic projection apparatus has a projection system that projects a beam of radiation onto a mask. The correction device has a filter unit placed in the path of the beam for varying the spatial intensity of the beam along at least one direction of its cross-section so that the integrated intensity of radiation of mask level is substantially uniform across the entire length or the cross-section.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: June 11, 2002
    Assignee: ASML Netherlands B.V.
    Inventors: Judocus M. D. Stoeldraijer, Jan W. R. Ten Cate, Franciscus H. A. G. Fey, Joost Sytsma