Patents by Inventor Joost Wilhelmus Maria FRENKEN

Joost Wilhelmus Maria FRENKEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF CARBON, METHOD OF FORMING A PATTERNED LAYER OF MATERIAL
    Publication number: 20240011150
    Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
    Type: Application
    Filed: September 26, 2023
    Publication date: January 11, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Sonia CASTELLANOS ORTEGA, Jan VERHOEVEN, Joost Wilhelmus Maria FRENKEN, Pavlo ANTONOV, Nicolaas TEN KATE, Olivier Christian Maurice LUGIER
  • Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material
    Patent number: 11807937
    Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: November 7, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Sonia Castellanos Ortega, Jan Verhoeven, Joost Wilhelmus Maria Frenken, Pavlo Antonov, Nicolaas Ten Kate, Olivier Christian Maurice Lugier
  • Method and Apparatus for Forming a Patterned Layer of Carbon, Method of Forming a Patterned Layer of Material
    Publication number: 20210032743
    Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
    Type: Application
    Filed: February 26, 2019
    Publication date: February 4, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Sonia CASTELLANOS ORTEGA, Jan VERHOEVEN, Joost Wilhelmus Maria FRENKEN, Pavlo ANTONOV, Nicolaas TEN KATE, Olivier Christian Maurice LUGIER
  • Substrate holder and a method of manufacturing a substrate holder
    Patent number: 10719019
    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: July 21, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Satish Achanta, Mehmet Ali Akbas, Pavlo Antonov, Jeroen Bouwknegt, Joost Wilhelmus Maria Frenken, Evelyn Wallis Pacitti, Nicolaas Ten Kate, Bruce Tirri, Jan Verhoeven
  • A SUBSTRATE HOLDER AND A METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20190332015
    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.
    Type: Application
    Filed: July 6, 2017
    Publication date: October 31, 2019
    Inventors: Thomas POIESZ, Satish ACHANTA, Mehmet Ali AKBAS, Pavlo ANTONOV, Jeroen BOUWKNEGT, Joost Wilhelmus Maria FRENKEN, Evelyn Wallis PACITTI, Nicolaas TEN KATE, Bruce TIRRI, Jan VERHOEVEN