Patents by Inventor Jordan B. Tye

Jordan B. Tye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220080504
    Abstract: Provided herein are approaches for forming a conduit embedded within a component of a semiconductor manufacturing device (e.g., an ion implanter) using an additive manufacturing process (e.g., 3-D printing), wherein the conduit is configured to deliver a fluid throughout the component to provide heating, cooling, and gas distribution thereof. In one approach, the conduit includes a set of raised surface features formed on an inner surface of the conduit for varying fluid flow characteristics within the conduit. In another approach, the conduit may be formed in a helical configuration. In another approach, the conduit is formed with a polygonal cross section. In another approach, the component of the ion implanter includes at least one of an ion source, a plasma flood gun, a cooling plate, a platen, and/or an arc chamber base.
    Type: Application
    Filed: November 30, 2021
    Publication date: March 17, 2022
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Joshua M. Abeshaus, Jordan B. Tye
  • Patent number: 11239040
    Abstract: An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: February 1, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Adam M. McLaughlin, Craig R. Chaney, Jordan B. Tye
  • Patent number: 11213891
    Abstract: Provided herein are approaches for forming a conduit embedded within a component of a semiconductor manufacturing device (e.g., an ion implanter) using an additive manufacturing process (e.g., 3-D printing), wherein the conduit is configured to deliver a fluid throughout the component to provide heating, cooling, and gas distribution thereof. In one approach, the conduit includes a set of raised surface features formed on an inner surface of the conduit for varying fluid flow characteristics within the conduit. In another approach, the conduit may be formed in a helical configuration. In another approach, the conduit is formed with a polygonal cross section. In another approach, the component of the ion implanter includes at least one of an ion source, a plasma flood gun, a cooling plate, a platen, and/or an arc chamber base.
    Type: Grant
    Filed: August 14, 2019
    Date of Patent: January 4, 2022
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Joshua M. Abeshaus, Jordan B. Tye
  • Publication number: 20210384004
    Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.
    Type: Application
    Filed: August 24, 2021
    Publication date: December 9, 2021
    Inventors: Adam M. McLaughlin, Jordan B. Tye
  • Publication number: 20210296146
    Abstract: A cassette with embedded temperature sensors that is disposed within a load lock is disclosed. The temperature sensors may be disposed in a plurality of shelves of the load lock cassette to monitor the temperature of each of a plurality of workpieces disposed in the load lock. The output of these temperature sensors may be provided to a controller, which controls when the load lock is opened. The load lock cassette may also include cooling channels to accelerate the cooling of the workpieces to improve throughput. The cooling may be controlled using closed loop control, where a controller monitors the temperature of the workpieces during the cooling operation.
    Type: Application
    Filed: March 23, 2020
    Publication date: September 23, 2021
    Inventors: Michael Blanchard, Steven M. Anella, Brant S. Binns, Jordan B. Tye, D. Jeffrey Lischer
  • Publication number: 20210296077
    Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.
    Type: Application
    Filed: March 23, 2020
    Publication date: September 23, 2021
    Inventors: Adam M. McLaughlin, Jordan B. Tye
  • Patent number: 11127558
    Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: September 21, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Adam M. McLaughlin, Jordan B. Tye
  • Publication number: 20210074503
    Abstract: An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.
    Type: Application
    Filed: October 23, 2020
    Publication date: March 11, 2021
    Inventors: Adam M. McLaughlin, Craig R. Chaney, Jordan B. Tye
  • Patent number: 10854416
    Abstract: An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.
    Type: Grant
    Filed: September 10, 2019
    Date of Patent: December 1, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Adam M. McLaughlin, Craig R. Chaney, Jordan B. Tye
  • Publication number: 20190366436
    Abstract: Provided herein are approaches for forming a conduit embedded within a component of a semiconductor manufacturing device (e.g., an ion implanter) using an additive manufacturing process (e.g., 3-D printing), wherein the conduit is configured to deliver a fluid throughout the component to provide heating, cooling, and gas distribution thereof. In one approach, the conduit includes a set of raised surface features formed on an inner surface of the conduit for varying fluid flow characteristics within the conduit. In another approach, the conduit may be formed in a helical configuration. In another approach, the conduit is formed with a polygonal cross section. In another approach, the component of the ion implanter includes at least one of an ion source, a plasma flood gun, a cooling plate, a platen, and/or an arc chamber base.
    Type: Application
    Filed: August 14, 2019
    Publication date: December 5, 2019
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Joshua M. Abeshaus, Jordan B. Tye
  • Patent number: 10486232
    Abstract: Provided herein are approaches for forming a conduit embedded within a component of a semiconductor manufacturing device (e.g., an ion implanter) using an additive manufacturing process (e.g., 3-D printing), wherein the conduit is configured to deliver a fluid throughout the component to provide heating, cooling, and gas distribution thereof. In one approach, the conduit includes a set of raised surface features formed on an inner surface of the conduit for varying fluid flow characteristics within the conduit. In another approach, the conduit may be formed in a helical configuration. In another approach, the conduit is formed with a polygonal cross section. In another approach, the component of the ion implanter includes at least one of an ion source, a plasma flood gun, a cooling plate, a platen, and/or an arc chamber base.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: November 26, 2019
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Joshua M. Abeshaus, Jordan B. Tye
  • Patent number: 10427217
    Abstract: Provided herein are approaches for forming a conduit embedded within a component of a semiconductor manufacturing device (e.g., an ion implanter) using an additive manufacturing process (e.g., 3-D printing), wherein the conduit is configured to deliver a fluid throughout the component to provide heating, cooling, and gas distribution thereof. In one approach, the conduit includes a set of raised surface features formed on an inner surface of the conduit for varying fluid flow characteristics within the conduit. In another approach, the conduit may be formed in a helical configuration. In another approach, the conduit is formed with a polygonal cross section. In another approach, the component of the ion implanter includes at least one of an ion source, a plasma flood gun, a cooling plate, a platen, and/or an arc chamber base.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: October 1, 2019
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Joshua M. Abeshaus, Jordan B. Tye
  • Publication number: 20170140956
    Abstract: A single piece ceramic platen is disclosed. This platen may be manufactured using additive manufacturing. The single piece ceramic platen may be manufactured using additive manufacturing processes. As such, the single piece ceramic platen may include a plurality of embedded features. Electrodes, cooling channels, heating elements, temperature sensors, strain gauges and back side gas channels may each be embedded in the electrode. Incorporation of cooling channels and heating elements allows the platen to operate over a wider range of temperatures. Further, these features may be disposed on a plurality of different depths following a planar or non-planar pathway. For example, the heating elements may be configured such that heating element in one region of the platen, such as an outer edge, are disposed closer to the top surface of the platen.
    Type: Application
    Filed: November 13, 2015
    Publication date: May 18, 2017
    Inventors: Adam M. McLaughlin, Jordan B. Tye
  • Patent number: 9583309
    Abstract: Apparatus and methods for the selective implanting of the outer portion of a workpiece are disclosed. A mask is disposed between the ion beam and the workpiece, having an aperture through which the ion beam passes. The aperture may have a concave first edge, forming using a radius equal to the inner radius of the outer portion of the workpiece. Further, the mask is affixed to a roplat such that the platen is free to rotate between a load/unload position and an operational position without moving the mask. In certain embodiments, the mask is affixed to the base of the roplat and has a first portion with an aperture that extends vertically upward from the base, and a second portion that is shaped so as not to interfere with the rotation of the platen. In other embodiments, the mask may be affixed to the arms of the roplat.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: February 28, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Jordan B. Tye, Mark R. Amato
  • Publication number: 20160311020
    Abstract: Provided herein are approaches for forming a conduit embedded within a component of a semiconductor manufacturing device (e.g., an ion implanter) using an additive manufacturing process (e.g., 3-D printing), wherein the conduit is configured to deliver a fluid throughout the component to provide heating, cooling, and gas distribution thereof. In one approach, the conduit includes a set of raised surface features formed on an inner surface of the conduit for varying fluid flow characteristics within the conduit. In another approach, the conduit may be formed in a helical configuration. In another approach, the conduit is formed with a polygonal cross section. In another approach, the component of the ion implanter includes at least one of an ion source, a plasma flood gun, a cooling plate, a platen, and/or an arc chamber base.
    Type: Application
    Filed: April 21, 2015
    Publication date: October 27, 2016
    Inventors: Joshua M. Abeshaus, Jordan B. Tye
  • Patent number: 9214314
    Abstract: An ion beam manipulator including a suppression electrode, a ground electrode connected to the suppression electrode in a parallel, spaced-apart relationship therewith by three electrically insulating connectors, the connectors being spaced 120 degrees apart from one another around a circumference of the suppression electrode and the ground electrode, a plurality of linkages extending from the electrically insulating connectors, at least one of the linkages including a pair of parallel support arms connected at a first end to a corresponding one of the electrically insulating connecters by a first pair of universal joints and connected at a second end to a bracket by a second pair of universal joints, and a drive shaft extending from the bracket, the drive shaft coupled to an actuator configured to extend and retract the drive shaft along a longitudinal axis of the drive shaft.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: December 15, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Jordan B. Tye, Jeffrey D. Susser, Sergio Alonso Gonzalez-Palavicini