Patents by Inventor Jordan Gergov

Jordan Gergov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8214775
    Abstract: During a method for generating a mask pattern for a photo-mask, a target pattern is partitioned into subsets of the target pattern. The subsets of the target pattern may be selected so that at least some of the subsets are approximately identical, thereby dividing the subsets into a degenerate group and a non-degenerate group. A group of the subsets may include multiple shapes, and a given target pattern may be significantly larger than a pre-determined length scale and a given shape in the multiple shapes is smaller than the pre-determined length scale. The non-degenerate group of subsets of the target pattern may be distributed to multiple processors. These processors may be used to determine subsets of the mask pattern based on the non-degenerate group of subsets of the target pattern. The subsets of the mask pattern may be combined to generate the mask pattern.
    Type: Grant
    Filed: September 10, 2008
    Date of Patent: July 3, 2012
    Assignee: Luminescent Technologies, Inc.
    Inventors: Jordan Gergov, Allen Baisuck
  • Publication number: 20090077527
    Abstract: During a method for generating a mask pattern for a photo-mask, a target pattern is partitioned into subsets of the target pattern. The subsets of the target pattern may be selected so that at least some of the subsets are approximately identical, thereby dividing the subsets into a degenerate group and a non-degenerate group. A group of the subsets may include multiple shapes, and a given target pattern may be significantly larger than a pre-determined length scale and a given shape in the multiple shapes is smaller than the pre-determined length scale. The non-degenerate group of subsets of the target pattern may be distributed to multiple processors. These processors may be used to determine subsets of the mask pattern based on the non-degenerate group of subsets of the target pattern. The subsets of the mask pattern may be combined to generate the mask pattern.
    Type: Application
    Filed: September 10, 2008
    Publication date: March 19, 2009
    Inventors: Jordan Gergov, Allen Baisuck