Abstract: Humidification systems and methods to introduce water vapor to a laser-ablated sample prior to introduction to an ICP torch are described. A system embodiment includes, but is not limited to, a water vapor generator configured to control production of a water vapor stream and to transfer the water vapor stream to at least one of a sample chamber of a laser ablation device or a mixing chamber in fluid communication with the laser ablation device, wherein the mixing chamber is configured to receive a laser-ablated sample from the laser ablation device and direct the laser-ablated sample to an inductively coupled plasma torch.

Abstract: Humidification systems and methods to introduce water vapor to a laser-ablated sample prior to introduction to an ICP torch are described. A system embodiment includes, but is not limited to, a water vapor generator configured to control production of a water vapor stream and to transfer the water vapor stream to at least one of a sample chamber of a laser ablation device or a mixing chamber in fluid communication with the laser ablation device, wherein the mixing chamber is configured to receive a laser-ablated sample from the laser ablation device and direct the laser-ablated sample to an inductively coupled plasma torch.

Abstract: Humidification systems and methods to introduce water vapor to a laser-ablated sample prior to introduction to an ICP torch are described. A system embodiment includes, but is not limited to, a water vapor generator configured to control production of a water vapor stream and to transfer the water vapor stream to at least one of a sample chamber of a laser ablation device or a mixing chamber in fluid communication with the laser ablation device, wherein the mixing chamber is configured to receive a laser-ablated sample from the laser ablation device and direct the laser-ablated sample to an inductively coupled plasma torch.

Abstract: Humidification systems and methods to introduce water vapor to a laser-ablated sample prior to introduction to an ICP torch are described. A system embodiment includes, but is not limited to, a water vapor generator configured to control production of a water vapor stream and to transfer the water vapor stream to at least one of a sample chamber of a laser ablation device or a mixing chamber in fluid communication with the laser ablation device, wherein the mixing chamber is configured to receive a laser-ablated sample from the laser ablation device and direct the laser-ablated sample to an inductively coupled plasma torch.

Abstract: Systems and methods for measuring analytes (e.g., potassium) under hot plasma conditions of ICP analysis systems (e.g., ICP-MS, ICP-AES, etc.) are described, where a membrane desolvation unit and nitrogen flow gas are included to reduce Argon interferences. A system embodiment includes a heated spray chamber configured to receive a liquid sample and a sample gas to aerosolize the liquid sample; a first condenser coupled to the heated spray chamber; a second condenser coupled to the first condenser; a heated membrane coupled to the second condenser; and a gas introduction component coupled to the heated membrane to receive a flow of gas and to combine the flow of gas with a dried sample aerosol leaving the heated membrane, wherein the flow of gas is introduced at a rate of approximately 2.67 percent to approximately 20 percent of a flow rate of the sample gas.