Abstract: A method for treating materials with plasma-inducing high-energy radiation, especially laser radiation, where an area of vapor capillaries (13) of a work piece (10) is observed with a depth definition detecting device over the entire thickness of the work piece and time-dependent measurement of plasma radiation intensity is carried out. In order to accurately monitor the quality of material treatment, the method is implemented in such a way that the momentary plasma intensities are measured at no less than two measurement points which are parallel to an axis (11) of inducing radiation (12). Predetermined capillary parameters are assigned to the measured plasma intensities and control of the material treatment is conducted depending on the capillary geometric parameters.

Abstract: A process for material working with plasma induced by high-energy radiati especially laser radiation, in which the radiation originating from the region of the workpiece is observed along the axis of the laser radiation focused along the axis on the workpiece as a function of the time. To obtain a measure of the penetration depth of the vapor capillary in the workpiece the process is so carried out that exclusively the cross section of the vapor capillary is observed with a depth of field encompassing the entire workpiece thickness, and that the mean value of the intensity of the plasma radiation is used as a measure of the penetration depth.