Patents by Inventor Jorg Haussmann

Jorg Haussmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor
    Patent number: 6824949
    Abstract: There are disclosed polybenzoxazole precursors which can be processed by centrifugal techniques, which can be cyclized to polybenzoxazoles on substrates without difficulty, and which after cyclization to polybenzoxazoles exhibit a high temperature stability. In particular, these precursors and the polybenzoxazoles prepared from them possess high resistance against the diffusion of metals.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: November 30, 2004
    Assignee: Infineon Technologies AG
    Inventors: Jörg Haussmann, Gerhard Maier, Günter Schmid, Recai Sezi
  • Bis-o-aminophenols and o-aminophenolcarboxylic acids and process for preparing the same
    Patent number: 6531632
    Abstract: Bis-o-aminophenols and o-aminophenolcarboxylic acids have the following structures: A1 to A7 are, independently of each other, H, F, CH3, CF3, OCH3 or OCF3. T is an aromatic or heterocyclic residue. A method for preparing bis-o-aminophenols and o-aminophenolcarboxylic acids is also provided.
    Type: Grant
    Filed: March 12, 2001
    Date of Patent: March 11, 2003
    Assignee: Infineon Technologies AG
    Inventors: Jörg Haussmann, Gerhard Maier, Recai Sezi
  • Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor
    Publication number: 20020086968
    Abstract: There are disclosed polybenzoxazole precursors which can be processed by centrifugal techniques, which can be cyclized to polybenzoxazoles on substrates without difficulty, and which after cyclization to polybenzoxazoles exhibit a high temperature stability. In particular, these precursors and the polybenzoxazoles prepared from them possess high resistance against the diffusion of metals.
    Type: Application
    Filed: November 13, 2001
    Publication date: July 4, 2002
    Inventors: Jorg Haussmann, Gerhard Maier, Gunter Schmid, Recai Sezi