Abstract: An embodiment of the invention relates to the use of electromagnetic fields for influencing combustion processes. According to an embodiment of the invention, the flame is controlled by the coupling of repeated, inductive, pulsed energy. The associated device uses at least one induction coil that at least partially surrounds the flame and the device is equipped with a controllable switch or a high frequency generator.

Abstract: For a low-pressure gas discharge switch, at least two main electrodes are arranged at least a distance d from each other, the electrodes in an arcing chamber forming a cathode and an anode of a discharge path for the low-pressure gas discharge. The gas discharge is triggered by increasing the electron density in a cathode cavity, at least the cathode in its disk-shaped area having at least one aperture, the cathode and anode apertures preferably being opposite and aligned with each other, for triggering the discharge. An arrangement generating a magnetic field superimposed on the discharge between the main electrodes (1, 1a, 2, 2a) are assigned to the main electrodes (1, 1a, 2, 2a), with which either a predominantly parallel magnetic field is generated or a predominantly perpendicular one, with regard to the direction of current in the discharge.

Abstract: In switchgear with superordinate power circuit-breakers and a plurality of subordinate power circuit-breakers, the superordinate power circuit-breaker must be triggered in the event of failure of the subordinate power circuit-breakers. This is accomplished as follows: electrical post-arc currents are detected after current zero, the electrical post-arc currents are compared with a predetermined limit value, and if the limit value is exceeded, a signal is effected for triggering the superordinate power circuit-breaker in the switchgear. This method can advantageously be implemented in particular in the case of vacuum circuit-breakers with at least one vacuum interrupter. The associated arrangement has a device which monitors the subordinate power circuit-breakers and, if appropriate, triggers the superordinate power circuit-breaker.

Abstract: In particular for exhaust-gas purification, different processes have been proposed. According to the invention, the polluted exhaust gas flows through a reactor volume to which non-thermal gas discharges are applied, while being brought into contact with a solid reducing agent at least once, and preferably several times. The reducing agent can, in particular, consist of carbon fibers. A suitable device for combining dielectric barrier discharges with the reduction has means for field enhancement substantially periodically spaced in the reactor.

Abstract: Such switches have current connections for contacts. One contact may be a fixed contact and the other contact may be a mobile contact. A drive opens the mobile contact when a predetermined electric current intensity is exceeded. The electric drive is a thermoelectric drive. For that purpose, the contacts (2,3) are arranged in a closed housing (1) made of an insulating material and a disk-shaped resistive member (4) is arranged between the contacts (2,3). A switch of this type may also be advantageously designed as a bistable limiter.

Abstract: A switching device including a measuring means for monitoring contact erosion, which is provided between a contact element and an associated contact support. The switching device includes an electrically insulated signal line, which is usable in individual and/or multiple contacts, is used as the measuring means, the signal line being integrated into a single monitoring circuit. In the switching device, there is arranged, between at least one of the contact elements and the associated contact support or in the contact material, an electrical conductor with insulator as the signal line, damage to or destruction of the insulator and/or the conductor being utilized to generate an external signal as an indication of the end of the service life of the contact element.

Abstract: In automobiles, for example, the exhaust fumes must pass through a plasma reactor operating by the principle of dielectrically inhibited ("silent") discharge, consisting of an arrangement of flat plates with alternating metallic and dielectric layers, whereby a plurality of adjacent discharge paths in parallel in the flow direction are formed. According to the invention, the discharge paths border on a single metallic electrode surface or layer (62, 72) and the electric power is supplied (58, 59) from two different sides with the metallic layers (62, 72) having alternating polarities.

Abstract: Switching components with contact parts that are mounted on a contact carrier in a switch housing may include devices for monitoring the contact erosion. The contact carrier may be split (sub-divided) and contact parts can be slotted at the rear and mounted on the sub-divided contact carrier. Thus, the oscillation response (vibration response) of the contact carrier in particular can be used as a measure of the erosion of the contact parts.

Abstract: A variable high-current resistor, especially for use as a protective element in power switching technology has already been proposed, which contains carbon as a resistance material, at least one boundary layer with a transition zone to another electric conductor being provided. By applying a contact pressure, the resistance in the transition zone can be kept low. Under the prior art, the resistance is converted into a highly resistive state by means of Joulean heat. In accordance with the invention, the contact pressure of the variable high-current resistor is able to be selectively influenced, the carbon- and/or carbon-black-containing layer being pressed by the surface pressure with a preset first value against the other conductor to adjust the low-resistance state of the resistor, and that, in the event of a short-circuit, this contact pressure being able to be reduced in a short enough time to a second value, at which the resistance in the transition zone goes up by at least two orders of magnitude.

Abstract: The invention relates to an apparatus for producing a plasma and treating substrates therein. The plasma produced by means of microwaves serves to coat a substrate which is situated in a chamber (5) having metal walls (6,7,12,13). The microwaves are repeatedly reflected at the metal walls (6,7,12,13), so that the chamber (5) has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber (5) or outside the chamber (5) in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber (5) an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

Abstract: Cathode sputtering apparatus having a hollow cathode on the magnetron principle with a cathode base (5) in which a hollow target (9) with a cylindrical sputtering surface (10) and a cylindrical outer surface is disposed. The cathode base (5) has a cooling passage (6). The target is externally surrounded by a magnet system (18) with magnet poles for the production of a rotationally symmetrical tunnel of magnetic lines of force closed on the circumference and over the sputtering surface. Outside of the space surrounded by the sputtering surface (10) there is disposed at least one anode (3, 4). A transport path for a substrate to be coated passes through the target (9) and the at least one anode.The cooling passage (6) is sealed off from the target (9) by a wall (7). Due to a narrow clearance, as soon as the target (9) reaches its operating temperature it comes in thermal contact with the wall (7).

Abstract: The plasma produced by means of microwaves in the presence of a magnetic field and a gas serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected at the metal walls, so that the chamber has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

Abstract: A sputtering cathode for the coating of substrates. The cathode has a base, a target of nonmagnetic material, and a magnet system having exposed pole faces for the production of a tunnel of magnetic lines of force overarching the sputtering surface. The target is provided with at least two continuous projections lying one inside the other, which contain at least one sputtering surface between them, and have confronting wall surfaces. The pole faces are located on both sides of the projections and sputtering surface between them such that magnetic lines of force issue perpendicularly from the one wall surface and, after crossing the sputtering surface, re-enter perpendicularly the opposite wall surface.

Abstract: A microwave apparatus injects microwave energy into a receptacle that is at least partially transparent to microwave energy. The receptacle has a window of microwave transparent material. The apparatus includes at least one microwave transmitter and one open microwave guide which is connected to the microwave transmitter and which is situated in the immediate vicinity of the receptacle. The open microwave guide has a plurality of parallel rungs and forming a slow - wave structure of the strapped bar type. The microwave guide is of a symmetrical V-shape, and at the apex of the V it is at a smaller distance from the window than at its feed point. A microwave feeder is disposed at at least both ends of the open microwave guide.

Abstract: Device for the plasma treatment of substrates (7) in a high frequency-excited plasma discharge between two electrodes (3, 8), supplied by a high-frequency source (6). The first electrode is constructed as a hollow anode (3) and the second electrode (8), which carries the substrate (7), is deposited in front of the hollow space (10) of the hollow anode or can be passed by this. Moreover, the hollow anode (3) has an edge (9), which is drawn out in the direction of the second electrode (8) and which, relative to the second electrode, forms a gap s.sub.1 all around that does not exceed 10 mm in width. In order to form the electrode so that the gap width is not a critical feature, projections (12) are disposed in the hollow space (10) of the hollow anode (3), said projections increasing the internal surface area (11) of the hollow anode (3). Preferably, these projections (12) are constructed as rib structures, which may also assume a honeycomb form.

Abstract: A method for producing amorphous carbon coatings on substrates by degrading a gaseous hydrocarbon compound in an ionized gas atmosphere within a reaction chamber. An electromagnetic alternating field is used for the excitation of the plasma. To achieve the object of increasing the deposition rate and permitting substrates even of great surface area to be uniformly coated, the frequency of the electromagnetic alternating field is selected in the microwave region (915 to 2,540 MHz). Furthermore, the microwave energy is put into the gaseous atmosphere by means of at least one ladder-type waveguide situated outside of the reaction chamber. The invention also relates to a substance provided with an amorphous carbon coating, in which an adhesion-mediating coating consisting of a polymer from the group of the siloxanes or silazanes is provided between the substrate and the amorphous carbon coating.

Abstract: Apparatus for coating substrates by means of a reaction for depositing atoms or molecules which is initiated by a plasma. A reaction chamber (1) is equipped with at least one window (22, 23), penetrable by microwaves, with at least one wave-guide structure (16, 17), arranged outside the chamber (1) and in front of the window (22, 23), and with a distributing means (25) discharging into the chamber.According to the invention and for the purpose of achieving the object of facilitating inspection and repairs, the window (22, 23) penetrable by microwaves, the one or more wave-guide structures (16, 17) and the distributing means (25) are all secured in or on a support frame (10), which can be removed, or swung away, from the reaction chamber (1) as a single unit.

Abstract: A magnetron cathode for sputtering ferromagnetic targets. The magnet system consists of magnet poles of opposite polarity lying one within the other disposed on a basic cathode body. Between the target and the pole shoes, which consist of target material, two circumferential air gaps in the direction of the depth of the system are formed. The surfaces of projection of the magnet poles and target do not overlap. For the purpose of making the target ablation uniform while simultaneously achieving high sputtering rates, the pole shoes are separated, in accordance with the invention, each by a distance S from the magnet poles. The magnet poles lie in an area which runs from a plane passing through the sputtering surface in the direction of the depth of the system. Between the pole shoes and the target, on the one hand, and the magnet poles on the other, there is disposed a thermally conductive metal body which is in communication with at least one coolant passage and consists of a nonferromagnetic material.

Abstract: A method for producing amorphous carbon coatings on substrates by degrading a gaseous hydrocarbon compound in an ionized gas atomsphere within a reaction chamber. An electromagnetic alternating field is used for the excitation of the plasma. To achieve the object of increasing the deposition rate and permitting substrates even of great surface area to be uniformly coated, the frequency of the electromagnetic alternating field is selected in the microwave region (915 to 2,540 MHz). Furthermore, the microwave energy is put into the gaseous atmosphere by means of at least one ladder-type waveguide situated outside of the reaction chamber. The invention also relates to a substrate provided with an amorphous carbon coating, in which an adhesion-mediating coating consisting of a polymer from the group of the siloxanes or silazanes is provided between the substrate and the amorphous carbon coating.

Abstract: The invention relates to apparatus for producing a microwave plasma for the treatment of substrates, and in particular for the plasma polymerization of monomers for coating substrates. The apparatus consists of a reaction chamber with a carrier for conveying the substrates and a way for maintaining an atmosphere of ionizable gases and monomers. The apparatus also has a first and at least one second wave-guide structure which are arranged at opposite acute setting angles to the surface of the substrate carrier and are each connected at one end to a microwave transmitter by way of a hollow conductor. Thus, the treatment intensities, i.e. the rates of deposition, are superposed, and this leads to greater uniformity in the properties of the product. The apparatus may also include angling the wave-guide structures toward each other and staggering crossbar structures in the wave-guides for further improvement.