Patents by Inventor Jorg Krempel-Hesse
Jorg Krempel-Hesse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8715471Abstract: To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).Type: GrantFiled: November 21, 2005Date of Patent: May 6, 2014Assignee: Applied Materials GmbH & Co KGInventors: Jörg Krempel-Hesse, Andreas Jischke, Uwe Schüssler, Hans Wolf
-
Patent number: 7972486Abstract: A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.Type: GrantFiled: April 7, 2006Date of Patent: July 5, 2011Assignee: Applied Materials GmbH & Co. KGInventors: Hans Buchberger, Andreas Geiss, Jörg Krempel-Hesse, Dieter Haas
-
Patent number: 7959776Abstract: Claimed is a sputtering target system comprising a plurality of backing plates to be individually cooled. Each backing plate is provided on its back side with a meandering groove that is closed off by a sealing plate. The sealing plate is welded around its circumference to the backing plate and at the same time is welded to at least one ridge located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate.Type: GrantFiled: November 25, 2008Date of Patent: June 14, 2011Assignee: Applied Films GmbH & Co.Inventors: Jörg Krempel-Hesse, Andreas Jischke, Uwe Schüβler, Hans Wolf
-
Patent number: 7575662Abstract: The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.Type: GrantFiled: June 29, 2005Date of Patent: August 18, 2009Assignee: Applied Materials GmbH & Co. KGInventors: Stefan Bangert, Wolfgang Buschbeck, Markus Hanika, Karl-Albert Keim, Michael Konig, Jorg Krempel-Hesse, Andreas Lopp, Harald Rost, Jurgen Schroeder, Tobias Stolley
-
Publication number: 20090134019Abstract: Claimed is a sputtering target system comprising a plurality of backing plates to be individually cooled. Each backing plate is provided on its back side with a meandering groove that is closed off by a sealing plate. The sealing plate is welded around its circumference to the backing plate and at the same time is welded to at least one ridge located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate.Type: ApplicationFiled: November 25, 2008Publication date: May 28, 2009Inventors: Jorg KREMPEL-HESSE, Andreas JISCHKE, Uwe SCHUSSLER, Hans WOLF
-
Publication number: 20060254905Abstract: The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.Type: ApplicationFiled: June 29, 2005Publication date: November 16, 2006Inventors: Stefan Bangert, Wolfgang Buschbeck, Markus Hanika, Karl-Albert Keim, Michael Konig, Jorg Krempel-Hesse, Andreas Lopp, Harald Rost, Jurgen Schroeder, Tobias Stolley
-
Publication number: 20060226004Abstract: A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.Type: ApplicationFiled: April 7, 2006Publication date: October 12, 2006Applicant: APPLIED FILMS GMBH & CO. KGInventors: HANS BUCHBERGER, ANDREAS GEISS, JORG KREMPEL-HESSE, DIETER HAAS
-
Publication number: 20060118412Abstract: To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).Type: ApplicationFiled: November 21, 2005Publication date: June 8, 2006Inventors: Jorg Krempel-Hesse, Andreas Jischke, Uwe Schussler, Hans Wolf
-
Publication number: 20060108217Abstract: Claimed is a sputtering target system comprising a plurality of backing plates (2, 3, 4) to be individually cooled. Each backing plate (2, 3, 4) is provided on its back side with a meandering groove (5) that is closed off by a sealing plate. The sealing plate (9) is welded around its circumference to the backing plate (2), and at the same time is welded to at least one ridge (7), located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate (3) not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate (20).Type: ApplicationFiled: February 28, 2005Publication date: May 25, 2006Inventors: Jorg Krempel-Hesse, Andreas Jischke, Uwe Schussler, Hans Wolf
-
Publication number: 20050178660Abstract: The invention relates to a sputter arrangement with a magnetron and a target, with the magnetron and the target being movable relative to one another. The magnetron comprises a magnet system, which forms a quasi-rectangular plasma tube, whose two longitudinal sides have a distance C from one another. If target and magnet system are moved relative to one another by a path corresponding approximately to the distance C, the magnet system is laid out such that the width at the end of the plasma tube is smaller or equal to the diameter of the plasma tube. However, if the path of the relative movement is less than C, the magnet system is laid out such that the width d of the ends of the plasma tube is less or equal to twice the diameter of the plasma tube.Type: ApplicationFiled: March 10, 2004Publication date: August 18, 2005Inventors: Andreas Lopp, Andreas Jischke, Michael Geisler, Herbert Pfeiffer, Jorg Krempel-Hesse
-
Publication number: 20040091650Abstract: A coating for a synthetic material substrate having at least one layer of a material, in which the absorption of light in the visible range is negligible, wherein the synthetic material substrate is a three-dimensional hollow body and the layer of the material has a thickness a wherein 0.5 a<a<b applies and b is the thickness of a layer of the same material at which the transmission of white light is 0.1% to 0.2%, wherein the coating provides a barrier against gases or vapors.Type: ApplicationFiled: November 22, 2002Publication date: May 13, 2004Inventors: Jorg Krempel-Hesse, Volker Hacker, Anton Zmelty, Helmut Grimm
-
Publication number: 20030000826Abstract: The invention relates to a method for the production on a substrate of gas- and liquid-impermeable layers, which have a relatively high elasticity. This elasticity is attained through the inclusion of carbon in a layer comprised of a metal or semiconductor oxide. In order to attain such an inclusion, a metal or semiconductor is ionized by means of an arc discharge. Subsequently, a reactive gas, for example O2, is introduced, with which the ionized metal or the ionized semiconductor forms an oxide. In addition, a carbon-containing gas is added, which releases its carbon such that on the substrate an oxide layer is formed, in which carbon is included.Type: ApplicationFiled: June 25, 2002Publication date: January 2, 2003Inventors: Jorg Krempel-Hesse, Michael Liehr, Volker Hacker, Elisabeth Budke, Helmut Grimm
-
Publication number: 20010008698Abstract: In a process for producing a brass-colored coating for fixtures, hardware, and articles in daily use, application of an intermediate layer to the substrate or to a base coating on the substrate is made by spraying, for which purpose a magnetron source with a zirconium target is situated in the process chamber in the proximity to the substrate and a mixture of argon and nitrogen serves as process gas, and the application of the top layer by spraying is done using a zirconium target in a mixture of argon and oxygen as process gas wherein the top layer is modified by bombardment with low-energy ions in a mixture of argon as carrier gas and a reactive gas, for example oxygen or hydrogen.Type: ApplicationFiled: March 5, 1999Publication date: July 19, 2001Inventors: ELISABETH BUDKE, JORG KREMPEL-HESSE, HANS SCHUSSLER, HANS MAIDHOF
-
Patent number: 6207028Abstract: In a sputtering device with magnetic amplification, a magnetic field is generated by means of a permanent magnet system, whose lines of force run above and penetrate the sputtering surface, whereby the permanent magnet system is formed of two dosed, coaxial circular or oval rows (7, 8) of individual magnets (5, 5′ . . . , 6, 6′ . . . ) that are connected via a yoke (15), whereby the surface of the target (3) that faces away from the rows of permanent magnets (7, 8) is formed of two partial surfaces (3a, 3b) that form an angle to each other and whereby the edge (3c) that is formed by the two partial surfaces (3a, 3b) runs parallel to the two rows (7, 8) of permanent magnets (5, 5′ . . , 6, 6′ . . . ) and whereby an insert (14) made of ferromagnetic material is inserted between the magnetic yoke (15) and the surface of the target (3) that faces the magnetic yoke (15).Type: GrantFiled: August 10, 1999Date of Patent: March 27, 2001Assignee: Leybold Systems GmbHInventors: Dieter Haas, Wolfgang Buschbeck, Jörg Krempel-Hesse
-
Patent number: 6187160Abstract: An apparatus is disclosed for the coating of substrates (10) with thin films, having a vacuum chamber (1), a target (6) to be atomized, situated opposite the substrate (10) in the vacuum chamber (1), with magnets (19, 19′, 19″; 20, 20′, 20″) to produce a magnetic tunnel in front of the area of the target (6) to be atomized, an inlet (8) for a process gas into the process space (11), an anode (12), which is electrically insulated with respect to the vacuum chamber (1), and a current-voltage supply to produce a plasma in front of the target (6). The target (6) is shaped as a rotation-symmetrical body, which provides a ring-shaped enclosure around the substrate (10), wherein the magnets (19,19′, . . . ; 20,20′, . . . ) are supported on the side of the hollow cylindrical target (6), facing away from the substrate (10), and can move around the rotational axis (R) of the target (6).Type: GrantFiled: June 17, 1999Date of Patent: February 13, 2001Assignee: Leybold Systems GmbHInventors: Alfred Rick, Helmut Eberhardt, Klaus Michael, Jörg Krempel-Hesse
-
Patent number: 6183612Abstract: A sputtering cathode with a flat plate-shaped target (8) and a tub-shaped yoke (3) arranged behind the target (8), with center ridge (5) and with magnets (7,7′) for generating an enclosed tunnel of arc-shaped curved field lines (15,15′) in front of the target surface, as well as with three sheet metal cutouts (9,10,11) or groups of partial cutouts inserted into the plane between the target (8) and the end faces (12) of the tub rim of the yoke (3) facing the target (8), all the sheet metal cutouts (9,10,11) together form two gaps (a,b) extending roughly parallel to the end faces (12,13), wherein the magnets (7,7′) are each incorporated or inserted into the yoke bottom and the side surfaces of the magnets (7,7′) facing towards and away from the target (8) run flush with the yoke bottom.Type: GrantFiled: October 27, 1998Date of Patent: February 6, 2001Assignee: Leybold Systems GmbHInventors: Rolf Adam, Jörg Krempel-Hesse, Martin Bähr
-
Patent number: 6139706Abstract: In a sputter cathode with a plate-shaped target (8) and with a trough-shaped yoke (3), arranged behind the target (8), with middle web (5) and with magnets (7, 7', . . . ) for producing a closed tunnel of field lines (15, 15', . . . ) curved in an arc in front of the target surface as well as with three sheet-metal blanks (9, 10, 11) consisting of one layer of a compound plate e.g. of an aluminum/iron compound plate, which blanks are placed into the plane between the target (8) and the front surfaces (12, 13) of the trough edge of the yoke (3), which front surfaces face the target (8), all sheet-metal blanks (9, 10, 11) of magnetically conductive material together form gaps (a, a') extending approximately parallel to the front surfaces (12, 13), which gaps (a, a') are filled out between the sheet-metal blanks (9, 10, 11) by the other layer (21) of the compound plate.Type: GrantFiled: December 8, 1998Date of Patent: October 31, 2000Assignee: Leybold Systems GmbHInventors: Rolf Adam, Jorg Krempel-Hesse, Martin Bahr
-
Patent number: 6077407Abstract: A sputtering cathode based on the magnetron principle, with a target of the material to be sputtered having a minimum of one component, with a magnetic system located beneath the target and having magnetic sources of different polarization which form a minimum of one self-enclosed tunnel of arcuate magnetic lines of force, having the poles of the sources facing away from the target connected to each other via a magnetic yoke made of a material of low retentivity, the bodies forming the sources of the magnetic fields being right prisms, and preferably right parallelepipeds, the base edges of which run parallel to the target plane, with the magnetic lines of force of the sources running at inclined angles relative to the base surfaces of the bodies.Type: GrantFiled: April 29, 1999Date of Patent: June 20, 2000Assignee: Leybold Systems GmbHInventors: Michael Liehr, Jorg Krempel-Hesse, Rolf Adam