Patents by Inventor Jorg Lorberth

Jorg Lorberth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4942252
    Abstract: Method for synthesizing alkyl halides of phosphorus, arsenic, or antimony from the corresponding phosphorus, arsenic, or antimony alkyl and phosphorus, arsenic, or antimony halide. An improved synthesis of alkyl phosphorus or arsenic hydrides from the corresponding alkyl phosphorus, arsenic, or antimony halides is also disclosed.
    Type: Grant
    Filed: August 16, 1988
    Date of Patent: July 17, 1990
    Assignee: CVD Incorporated
    Inventors: Benjamin C. Hui, Jorg Lorberth
  • Patent number: 4900855
    Abstract: A method is provided for highly pure mono- and dialkylarsines, particularly removing substantially all silicon-containing impurities. A mono- or dialkylarsine is reacted with either an alkali metal or an alkali metal hydrocarbyl, thereby producing an alkali metal alkylarsenide. Silicon, germanium, zinc and other metallic impurities are removed from the alkali alkylarsenide. Mono- and dialkylarsine is then regenerated by reaction of the alkali metal alkylarsenide with a proton donor.
    Type: Grant
    Filed: December 14, 1988
    Date of Patent: February 13, 1990
    Assignee: CVD Incorporated
    Inventors: Benjamin C. Hui, Ravindra K. Kanjolia, Jorg Lorberth
  • Patent number: 4734514
    Abstract: Organometallic compounds having the formulas: ##STR1## wherein N is selected from phosphorus and arsenic, H is hydride, and X and Y are independently selected from hydride, lower alkyl cyclopentadienyl, and phenyl, except that Y cannot be hydrogen; andMR.sub.xwherein x is an integer from 2 to 4 inclusive, each said R substituent is independently selected from hydride, lower alkyl, phenyl, alkyl-substituted phenyl, cyclopentadienyl, and alkyl-substituted cyclopentadienyl, and M is selected from elements of Groups 2B, 2A, 3A, 5A, and 6A of the Periodic Table, except carbon, nitrogen, oxygen, and sulfur. The use of these compounds in chemical vapor deposition processes and methods for synthesizing these compounds are also disclosed.
    Type: Grant
    Filed: February 10, 1986
    Date of Patent: March 29, 1988
    Assignee: Morton Thiokol, Inc.
    Inventors: Andreas A. Melas, Benjamin C. Hui, Jorg Lorberth
  • Patent number: 4720560
    Abstract: Compounds having the molecular formula:MR.sub.xwherein x is an integer from 2 to 4 inclusive, each said R substituent is independently selected from hydride, lower alkyl, phenyl, alkyl-substituted phenyl, cyclopentadienyl, and alkyl substituted cyclopentadienyl, at least two of said R substituents are different, and M is an element selected from Groups 2B or 3A of the Periodic Table, Bismuth, Selenium, Tellurium, Beryllium, and Magnesium, but excluding Aluminum, Bismuth, Selenium, and Tellurium if any R is hydride. The hybrid compound is used for metal organic chemical vapor deposition. The invention also includes a metal organic chemical vapor deposition process employing a hybrid of first and second compounds having the above formula, but wherein the R substituents of each compound can be like or unlike and M is selected from Groups 2B, 2A, 3A, 5A, and 6A of the Periodic Table except for Carbon, Nitrogen, Oxygen, and Sulfur.
    Type: Grant
    Filed: October 25, 1984
    Date of Patent: January 19, 1988
    Assignee: Morton Thiokol, Inc.
    Inventors: Benjamin C. Hui, Jorg Lorberth, Andreas A. Melas