Patents by Inventor Jorg Maser

Jorg Maser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9082522
    Abstract: A multilayer Laue Lens includes a compensation layer formed in between a first multilayer section and a second multilayer section. Each of the first and second multilayer sections includes a plurality of alternating layers made of a pair of different materials. Also, the thickness of layers of the first multilayer section is monotonically increased so that a layer adjacent the substrate has a minimum thickness, and the thickness of layers of the second multilayer section is monotonically decreased so that a layer adjacent the compensation layer has a maximum thickness. In particular, the compensation layer of the multilayer Laue lens has an in-plane thickness gradient laterally offset by 90° as compared to other layers in the first and second multilayer sections, thereby eliminating the strict requirement of the placement error.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: July 14, 2015
    Assignee: Brookhaven Science Associates, LLC
    Inventors: Raymond P. Conley, Chian Qian Liu, Albert T. Macrander, Hanfei Yan, Jorg Maser, Hyon Chol Kang, Gregory Brian Stephenson
  • Publication number: 20140072106
    Abstract: A multilayer Laue Lens includes a compensation layer formed in between a first multilayer section and a second multilayer section. Each of the first and second multilayer sections includes a plurality of alternating layers made of a pair of different materials. Also, the thickness of layers of the first multilayer section is monotonically increased so that a layer adjacent the substrate has a minimum thickness, and the thickness of layers of the second multilayer section is monotonically decreased so that a layer adjacent the compensation layer has a maximum thickness. In particular, the compensation layer of the multilayer Laue lens has an in-plane thickness gradient laterally offset by 90° as compared to other layers in the first and second multilayer sections, thereby eliminating the strict requirement of the placement error.
    Type: Application
    Filed: December 13, 2010
    Publication date: March 13, 2014
    Applicant: BROOKHAVEN SCIENCE ASSOCIATES
    Inventors: Raymond P. Conley, Chian Qian Liu, Albert T. Macrander, Hanfei Yan, Jorg Maser, Hyon Chol Kang, Gregory Brian Stephenson
  • Patent number: 7440546
    Abstract: A zone plate multilayer structure includes a substrate carrying a plurality of alternating layers respectively formed of tungsten silicide (WSi2) and silicon (Si). The alternating layers are sequentially deposited precisely controlling a thickness of each layer from a minimum thickness of a first deposited layer adjacent the substrate to a maximum thickness of a last deposited layer. The first minimum thickness layer has a selected thickness of less than or equal to 5 nm with the thickness of the alternating layers monotonically increasing to provide a zone plate multilayer structure having a thickness of greater than 12 ?m (microns). The x-rays are diffracted in Laue transmission geometry by the specific arrangement of silicon and tungsten silicide.
    Type: Grant
    Filed: December 6, 2006
    Date of Patent: October 21, 2008
    Assignee: UChicago Argonne, LLC
    Inventors: Chian Q. Liu, Raymond P. Conley, Albert T. Macrander, Hyon Chol Kang, G. Brian Stephenson, Jorg Maser
  • Publication number: 20080137810
    Abstract: A zone plate multilayer structure includes a substrate carrying a plurality of alternating layers respectively formed of tungsten silicide (WSi2) and silicon (Si). The alternating layers are sequentially deposited precisely controlling a thickness of each layer from a minimum thickness of a first deposited layer adjacent the substrate to a maximum thickness of a last deposited layer. The first minimum thickness layer has a selected thickness of less than or equal to 5 nm with the thickness of the alternating layers monotonically increasing to provide a zone plate multilayer structure having a thickness of greater than 12 ?m (microns). The x-rays are diffracted in Laue transmission geometry by the specific arrangement of silicon and tungsten silicide.
    Type: Application
    Filed: December 6, 2006
    Publication date: June 12, 2008
    Inventors: Chian Q. Liu, Raymond P. Conley, Albert T. Macrander, Hyon Chol Kang, G. Brian Stephenson, Jorg Maser
  • Publication number: 20070071164
    Abstract: A multifunctional hard x-ray nanoprobe instrument for characterization of nanoscale materials and devices includes a scanning probe mode with a full field transmission mode. The scanning probe mode provides fluorescence spectroscopy and diffraction contrast imaging. The full field transmission mode allows two-dimensional (2-D) imaging and tomography. The nanoprobe instrument includes zone plate optics for focusing and imaging. The nanoprobe instrument includes a stage group for positioning the zone plate optics. The nanoprobe instrument includes a specimen stage group for positioning the specimen. An enhanced laser Doppler displacement meter (LDDM) system provides two-dimensional differential displacement measurement in a range of nanometer resolution between the zone-plate optics and the sample holder. A digital signal processor (DSP) implements a real-time closed-loop feedback technique for providing differential vibration control between the zone-plate optics and the sample holder.
    Type: Application
    Filed: September 29, 2005
    Publication date: March 29, 2007
    Inventors: Deming Shu, Jorg Maser, Barry Lai, Franz Vogt, Martin Holt, Curt Preissner, Robert Winarski, Gregory Stephenson