Abstract: A method for the maskless exposure of light-sensitive layers of an object for the micropatterning thereof, is disclosed. In one embodiment, at least one surface light modulator with an associated optical arrangement is irradiated by means of a light source and image fields. Individual structural elements, groups of structural elements or parts thereof are imaged with a predetermined exposure dose on the light-sensitive layer in accordance with the respective driving state of the at least one surface light modulator, the predetermined exposure dose being divided between a plurality of exposure operations. The exposure dose for the individual exposure operations is chosen in such a way that, proceeding from a predetermined minimum exposure dose, the exposure dose is increased for each exposure operation compared with the respective preceding exposure operation. The exposure dose for the last exposure operation is more than 50% of the predetermined exposure dose.

Abstract: The invention relates to a method for exposure without a mask for structuring light-sensitive layers on an object. According to the invention, structural elements are configured on the light-sensitive layer using a light source by irradiating a variable image-forming element with a corresponding lens system to a predetermined exposure dose (nominal exposure dose.), said image-forming element functioning as a surface light modulator. Individual structural elements, groups of structural elements or parts thereof are reproduced on the light-sensitive layer according to the image fields generated by the image-forming element as a result of its respective control state, the nominal exposure dose being divided between several exposure operations and the exposure dose for the individual exposure operations being chosen in such a way that starting from a predetermined minimum exposure dose, the exposure dose is increased for each exposure operation compared to the one before.

Abstract: In a method for structuring a photolithographic layer a first pattern is ated on a first plane light modulator. The first plane light modulator comprises a plurality of picture elements, and the first pattern is defined by a prescribed number of addressed picture elements. Then a second pattern is created on a second plane light modulator. The second plane light modulator comprises a plurality of picture elements, and the second pattern has a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to this a second region of addressed picture elements. Finally the first and the second pattern are imaged onto a region to be exposed of the layer to be structured.