Patents by Inventor Jorg-Thomas Zettler

Jorg-Thomas Zettler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for real-time determination of spherical and non-spherical curvature of a surface
    Patent number: 8810798
    Abstract: The present invention provides for an apparatus for measuring a curvature of a surface of a wafer in a multi-wafer epitaxial reactor.
    Type: Grant
    Filed: July 9, 2012
    Date of Patent: August 19, 2014
    Assignee: Laytec AG
    Inventors: Jorg-Thomas Zettler, Christian Kaspari
  • Method and apparatus for real-time determination of spherical and non-spherical curvature of a surface
    Publication number: 20130021610
    Abstract: The present invention provides for an apparatus for measuring a curvature of a surface of a wafer in a multi-wafer epitaxial reactor.
    Type: Application
    Filed: July 9, 2012
    Publication date: January 24, 2013
    Inventors: Jörg-Thomas Zettler, Christian Kaspari
  • Method and apparatus for the determination of characteristic layer parameters at high temperatures
    Patent number: 7283218
    Abstract: A method for the determination of characteristic layer parameters by means of spectral-optical measurements, that allow for precise measurements of the sample temperature even under the conditions of industrial growth processes and furthermore avoids the detection of thermal radiation and reflected radiation by means of twofold phase sensitive frequency modulation by using so called chopper and lock-in amplifier respectively. The wobbling and/or rotating of the sample to be measured is compensated and/or the pyrometer optical path and the optical path of the spectral-optical system are guided separately of each other and/or a separation of the radiation signal for the temperature measurement and the radiation signal for the spectral-optical measurement is implemented by blanking of the irradiated light.
    Type: Grant
    Filed: December 12, 2003
    Date of Patent: October 16, 2007
    Assignee: Laytec Gesellschaft Für In-Situ und Nano-Sensorik mbH
    Inventor: Jörg-Thomas Zettler
  • Method and apparatus for the determination of characteristic layer parameters at high temperatures
    Publication number: 20040263867
    Abstract: It is the object of the invention to provide a method for the determination of characteristic layer parameters by means of spectral-optical measurements, that allow for precise measurements of the sample temperature even under the conditions of industrial growth processes, i.e. wobbling samples and/or fast changes between sample carrier and sample and furthermore avoids the detection of thermal radiation and reflected radiation by means of twofold phase sensitive frequency modulation by using so called chopper and lock-in amplifier respectively several pyrometer.
    Type: Application
    Filed: December 12, 2003
    Publication date: December 30, 2004
    Inventor: Jorg-Thomas Zettler
  • Method for measuring characteristics, especially the temperature of a multi-layer material while the layers are being built up
    Publication number: 20020113971
    Abstract: The invention relates to a method for measuring characteristics, especially the temperature of a multi-layer material during the build-up of the layers, especially of a stratified semiconductor system during epitaxy under constant process conditions.
    Type: Application
    Filed: November 30, 2001
    Publication date: August 22, 2002
    Applicant: LayTec Gesellschaft fur in-situ und nano-Sensork mbH
    Inventors: Jorg-Thomas Zettler, Kolja Haberland