Patents by Inventor Joris Johan Verstraete

Joris Johan Verstraete has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20090073395
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
    Type: Application
    Filed: September 13, 2007
    Publication date: March 19, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Spruytenburg, Joris Johan Verstraete