Patent number: 9029483
Abstract: Polyhedral oligomeric silsesquioxanes (POSS) linked ligand of the general formula (I) L[(R1a)n-1(SiO1,5)nR2a]k[(R1b)n-1SiO1,5)nR2b]l[(R1c)n-1SiO1,5)nR2c]m??(I) in which (R1a,b,c)n-1(SiO1,5)n is a polyhedral oligomeric silsesquioxanes (POSS) with n=4, 6, 8, 10, 12, 14, 16 or 18 and R1a, R1b, R1c is each independently selected from the group consisting of same or different branched or linear C1-C20 alkyl chains, cyclo alkyl, C1-C20 alkoxy, aryl, aryloxy, heteroaryl and arylalkyl groups, k, l, m is 0 or 1 provided that k+l+m?1, R2a, R2b, R2c is a spacer that binds the polyhedral oligomeric silsesquioxane (POSS) to the ligand L and ligand L is an uncharged electron donor.
Type:
Grant
Filed:
February 28, 2011
Date of Patent:
May 12, 2015
Assignee:
Evonik Degussa GmbH
Inventors:
Cengiz Azap, Dorit Wolf, Hendrikus Cornelis Louis Abbenhuis, Gijsbert Gerritsen, Karol Grela, Jos B. M. Wilting, Kinga Leszczynska, Justyna Czaban, Anna Wojtasiewicz
Publication number: 20130131284
Abstract: Polyhedral oligomeric silsesquioxanes (POSS) linked ligand of the general formula (I) L[(R1a)n-1(SiO1,5)nR2a]k[(R1b)n-1SiO1,5)nR2b]l[(R1c)n-1SiO1,5)nR2c]m??(I) in which (R1a,b,c)n-1(SiO1,5)n is a polyhedral oligomeric silsesquioxanes (POSS) with n=4, 6, 8, 10, 12, 14, 16 or 18 and R1a, R1b, R1c is each independently selected from the group consisting of same or different branched or linear C1-C20 alkyl chains, cyclo alkyl, C1-C20 alkoxy, aryl, aryloxy, heteroaryl and arylalkyl groups, k, l, m is 0 or 1 provided that k+l+m?1, R2a, R2b, R2c is a spacer that binds the polyhedral oligomeric silsesquioxane (POSS) to the ligand L and ligand L is an uncharged electron donor.
Type:
Application
Filed:
February 28, 2011
Publication date:
May 23, 2013
Applicant:
Evonik Degussa GmbH
Inventors:
Cengiz Azap, Dorit Wolf, Hendrikus Cornelis Louis Abbenhuis, Gijsbert Gerritsen, Karol Grela, Jos B.M. Wilting, Kinga Leszczynska, Justyna Czaban, Anna Wojtasiewicz
