Abstract: The present invention provides a fluid purging system (100) for an optical element (120), comprising a fluid guiding unit arranged to guide a fluid, provided by a fluid supply system, over at least a curved portion of an optical surface (122) of the optical element. The fluid guiding unit comprises a fluid inlet and a first nozzle unit (110) for providing a fluid to the optical surface. The fluid guiding unit being formed by at least a first wall portion (102) and at least a second wall portion (104), wherein the second wall portion being configured to face the optical surface and to follow a contour of the optical surface. The second wall portion comprises a second nozzle unit (112).

Abstract: The present invention provides a fluid purging system (100) for an optical element (30), comprising a ring and a fluid supply system (40). The ring being formed of a body entirely surrounding the optical element, the ring defining a space (5) radially inwards thereof and adjacent to the optical element. The ring is formed by at least one first wall portion (10) and at least one second wall portion (20A;20B), wherein an average height of the first wall portion is greater than an average height of the second wall portion. The fluid supply system is positioned radially outwards of the ring and configured to supply fluid to pass over the at least one second wall portion to the space.

Abstract: A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.

Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Abstract: The present invention refers to an acoustic filter for reciprocating compressor and, in special, a suction acoustic filter containing at least one inlet pipeline (21), at least one outlet pipeline (22), and at least one intermediate pipeline (42). Said acoustic filter (1) comprises at least two horizontal chambers (5, 6), wherein said chambers are interconnected by an intermediate pipeline (42), which has a superior portion (421) with a length that is equivalent to approximately 75% to 98% of the height of the first horizontal chamber (5) and an inferior portion (422) with a length that is equivalent to approximately 45% to 80% of the height of the second horizontal chamber (6).

Abstract: The present invention refers to an acoustic filter for reciprocating compressor and, in special, a suction acoustic filter containing at least one inlet pipeline (21), at least one outlet pipeline (22), and at least one intermediate pipeline (42). Said acoustic filter (1) comprises at least two horizontal chambers (5, 6), wherein said chambers are interconnected by an intermediate pipeline (42), which has a superior portion (421) with a length that is equivalent to approximately 75% to 98% of the height of the first horizontal chamber (5) and an inferior portion (422) with a length that is equivalent to approximately 45% to 80% of the height of the second horizontal chamber (6).