Abstract: Embodiments herein relate to systems, apparatuses, or processes directed to facilitating increased clock speeds on a substrate by lowering the impedance of traces that provide clock signals to components such as DRAM. For example, embodiments may include a substrate with a first layer and a second layer parallel to the first layer with a first trace coupled with the first layer in a routing configuration and a second trace coupled with the second layer in the routing configuration, where the routing configuration of the first trace and the second trace substantially overlap each other with respect to an axis perpendicular to the first layer and the second layer, and where the first trace and the second trace are electrically coupled by a first and a second electrical coupling perpendicular to the first layer and the second layer.

Abstract: Embodiments herein relate to systems, apparatuses, or processes directed to facilitating increased clock speeds on a substrate by lowering the impedance of traces that provide clock signals to components such as DRAM. For example, embodiments may include a substrate with a first layer and a second layer parallel to the first layer with a first trace coupled with the first layer in a routing configuration and a second trace coupled with the second layer in the routing configuration, where the routing configuration of the first trace and the second trace substantially overlap each other with respect to an axis perpendicular to the first layer and the second layer, and where the first trace and the second trace are electrically coupled by a first and a second electrical coupling perpendicular to the first layer and the second layer.