Abstract: A system and method for creating layout for semiconductor chips are described. In various implementations, an integrated circuit includes at least a first functional block and a second functional block. The first functional block includes circuitry that has a first set of parameters of a first process corner. The second functional block includes circuitry that has a second set of parameters of a second process corner different from the first set of parameters of the first process corner. For a same set of operating conditions, the second functional block has device characteristics different from device characteristics of the first functional block based on the first process corner and the second process corner being different from one another. The integrated circuit is fabricated with a process corner mask that indicates which areas of the die use the first process corner and which areas use the second process corner.