Patents by Inventor Josef Heindel

Josef Heindel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PROCESS FOR PREPARING A TUBULAR ARTICLE
    Publication number: 20210071293
    Abstract: The present invention relates to a process for preparing a tubular article, comprising (a) providing a carrier tube, (b) providing a metal coating on the carrier tube by applying a liquid metal phase onto the carrier tube and solidifying the liquid metal phase, (c) applying a contact pressure to the metal coating by at least one densification tool, and moving the densification tool and the metal coating relative to each other.
    Type: Application
    Filed: September 11, 2020
    Publication date: March 11, 2021
    Applicant: MATERION ADVANCED MATERIALS GERMANY GMBH
    Inventors: Christoph Simons, Martin Schlott, Josef Heindel, Carl Christoph Stahr
  • PROCESS FOR PREPARING A TUBULAR ARTICLE
    Publication number: 20180105925
    Abstract: The present invention relates to a process for preparing a tubular article, comprising (a) providing a carrier tube, (b) providing a metal coating on the carrier tube by applying a liquid metal phase onto the carrier tube and solidifying the liquid metal phase, (c) applying a contact pressure to the metal coating by at least one densification tool, and moving the densification tool and the metal coating relative to each other.
    Type: Application
    Filed: April 8, 2016
    Publication date: April 19, 2018
    Inventors: Christoph Simons, Martin Schlott, Josef Heindel, Carl Christoph Stahr
  • Tube-shaped sputtering target
    Patent number: 9334564
    Abstract: A tube-shaped sputtering target is provided having a carrier tube and an indium-based sputtering material arranged on the carrier tube. The sputtering material has a microstructure having a mean grain size of less than 1 mm, measured as the mean diameter of the grains on the sputtering-roughened surface of the sputtering material.
    Type: Grant
    Filed: February 3, 2012
    Date of Patent: May 10, 2016
    Assignee: Heraeus Deutschland GmbH & Co. KG
    Inventors: Christoph Simons, Martin Schlott, Josef Heindel, Christoph Stahr
  • TUBE-SHAPED SPUTTERING TARGET
    Publication number: 20120213917
    Abstract: A tube-shaped sputtering target is provided having a carrier tube and an indium-based sputtering material arranged on the carrier tube. The sputtering material has a microstructure having a mean grain size of less than 1 mm, measured as the mean diameter of the grains on the sputtering-roughened surface of the sputtering material.
    Type: Application
    Filed: February 3, 2012
    Publication date: August 23, 2012
    Applicant: HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
    Inventors: Christoph SIMONS, Martin SCHLOTT, Josef HEINDEL, Christoph STAHR
  • Magnetic shunts in tubular targets
    Patent number: 8137518
    Abstract: A sputter target has a carrier body and a target material arranged on the carrier body, wherein the carrier body has a rear surface facing away from the target material and the target material has a front surface facing away from the carrier body. A ferromagnetic material is arranged between the front surface and the rear surface.
    Type: Grant
    Filed: November 25, 2008
    Date of Patent: March 20, 2012
    Assignee: W.C. Heraeus GmbH
    Inventors: Hans-Joachim Pavel, Josef Heindel
  • Powder-Fiber Adhesive
    Publication number: 20100038240
    Abstract: An adhesive is provided, in particular for the adhesion of conductive materials, having at least one binder component and fillers, wherein the fillers contain fibers or a fiber-powder mixture and the fibers and/or powder contain an electrically conductive material. Further, an assembly is provided made of a sputtering target material and a carrier material with an adhesive.
    Type: Application
    Filed: June 13, 2006
    Publication date: February 18, 2010
    Applicant: W. C. HERAEUS GMBH
    Inventors: Christoph Simons, Martin Schlott, Peter Preissler, Josef Heindel Josef Heindel
  • MAGNETIC SHUNTS IN TUBULAR TARGETS
    Publication number: 20090139861
    Abstract: A sputter target has a carrier body and a target material arranged on the carrier body, wherein the carrier body has a rear surface facing away from the target material and the target material has a front surface facing away from the carrier body. A ferromagnetic material is arranged between the front surface and the rear surface.
    Type: Application
    Filed: November 25, 2008
    Publication date: June 4, 2009
    Applicant: W.C. HERAEUS GMBH
    Inventors: Hans-Joachim PAVEL, Josef HEINDEL
  • Processes for producing a sputtering target from a silicon-based alloy, a sputtering target
    Publication number: 20060207740
    Abstract: A sputtering target and a process for producing a sputtering target from a silicon-based alloy with an aluminum content of more than 6 wt. % up to 50 wt. %. Preferably, the aluminum content of the alloy is at least 8 wt. %, but no more than 30 wt. %. The target material is produced by a casting technique in which the material is melted and vacuum-cast, such that the casting is carried out in a hollow cylindrical casting mold.
    Type: Application
    Filed: February 17, 2006
    Publication date: September 21, 2006
    Inventors: Martin Weigert, Josef Heindel, Uwe Konietzka
  • Processes for producing a sputtering target from a silicon-based alloy, a sputtering target
    Publication number: 20050092455
    Abstract: A process for producing a sputtering target from a silicon-based alloy with an aluminum content of 5-50 wt. %. The target material is produced by a casting technique in which the material is melted and vacuum-cast, such that the casting is carried out in a hollow cylindrical casting mold.
    Type: Application
    Filed: December 15, 2004
    Publication date: May 5, 2005
    Inventors: Martin Weigert, Josef Heindel, Uwe Konietzka
  • Processes for producing a sputtering target from a silicon-based alloy, a sputtering target
    Publication number: 20040094283
    Abstract: A process for producing a sputtering target from a silicon-based alloy with an aluminum content of 5-50 wt. %. The target material is produced by a casting technique in which the material is melted and vacuum-cast, such that the casting is carried out in a hollow cylindrical casting mold.
    Type: Application
    Filed: September 3, 2003
    Publication date: May 20, 2004
    Applicant: W.C. Heraeus GmbH & Co. KG
    Inventors: Martin Weigert, Josef Heindel, Uwe Konietzka
  • Metal or metal alloy based sputter target and method for the production thereof
    Publication number: 20030168333
    Abstract: The invention concerns a sputter target on a metal or metal alloy base with a melting point of not more than 750° C., especially tellurium alloy, with a microstructure of powder particles compacted by means of powder metallurgy, where the primary microstructure of the powder particles is very fine as compared with their size and where the particle size is clearly greater than the grain size of the primary microstructure.
    Type: Application
    Filed: May 8, 2003
    Publication date: September 11, 2003
    Inventors: Martin Schlott, Josef Heindel
  • Sputter target made of a silicon alloy and process for producing a sputter target
    Publication number: 20030103857
    Abstract: A sputter target produced from an alloy powder, the individual particles of which are composed of an Si—Al alloy. It is found that a high degree of homogeneity of the sputter target can be achieved in this way.
    Type: Application
    Filed: August 19, 2002
    Publication date: June 5, 2003
    Applicant: W.C. Heraeus GmbH & Co. KG
    Inventors: Josef Heindel, Christoph Simons, Martin Weigert
  • Cobalt base alloy sputtering target with high magnetic field penetration
    Patent number: 6372104
    Abstract: A cobalt based alloy having a chromium content in the range of 18-21% permits a high degree of magnetic field penetration which is comparable to non-ferromagnetic alloys. The alloy preferably contains 8-18% Pt and optionally may contain small amounts of Mo, Pd, Ni, Ti, V, Ta, W, and B.
    Type: Grant
    Filed: December 15, 1995
    Date of Patent: April 16, 2002
    Assignee: Leybold Materials GmbH
    Inventors: Martin Schlott, Josef Heindel