Abstract: An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

Abstract: An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

Abstract: An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

Abstract: An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

Abstract: An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

Abstract: An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

Abstract: The invention relates to a device for supplying casting installations with molten metal. Said device comprises a crucible into the melt of which a dosing pump dips and supplies a discharge tube (12) communicating therewith with melt. The discharge tube (12) and the pump tube (11) are interlinked via a U-shaped connecting tube (15) to give a one-piece crucible insert. The discharge neck (13) of the discharge tube (12) is mounted so as to be swivelable about the axis (30) of the discharge tube. The inventive design allows for a simple maintenance and production of the dosing device. Moreover, the crucible position no longer has to be adapted to the position of the casting installation.

Abstract: The invention relates to a device for supplying casting installations with molten metal. Said device comprises a crucible into the melt of which a dosing pump dips and supplies a discharge tube (12) communicating therewith with melt. The discharge tube (12) and the pump tube (11) are interlinked via a U-shaped connecting tube (15) to give a one-piece crucible insert. The discharge neck (13) of the discharge tube (12) is mounted so as to be swivelable about the axis (30) of the discharge tube. The inventive design allows for a simple maintenance and production of the dosing device. Moreover, the crucible position no longer has to be adapted to the position of the casting installation.

Abstract: A worm pump for delivering a metal melt comprises a mounting flange, and a tubular pump housing mounted on, and suspended from, the mounting flange, the pump housing defining a lower inlet for receiving the metal melt and an upper outlet for delivering the metal melt. A drive motor is mounted on the mounting flange, the drive motor having a pump shaft extending into the tubular pump housing and comprising a conveyor screw between the inlet and outlet. A guide supports the pump shaft at a lower end thereof, and a universal joint is provided at an upper end of the pump shaft above the upper outlet, the universal joint permitting the pump shaft to pivot and the guide being arranged to support the pump shaft during a pivoting motion.

Abstract: A two-chamber furnace for delivering a melt to a casting machine comprises a storage chamber having an inlet device for material to be melted, a removal chamber having an outlet device for removing the melted material, and an intermediate chamber arranged between the storage chamber and the removal chamber, the intermediate chamber communicating with the removal chamber through a balancing port and with the storage chamber by an overflow. A control device controls the level of the melted material in the removal chamber, the control device including a pump for moving the melted material from the storage chamber to the intermediate chamber.