Abstract: Apparatus and methods of forming a battery-active material are described. An apparatus includes a first processing section that raises the temperature of a precursor material to a reaction threshold temperature, a second processing section that converts the precursor material to a battery-active material, and a third processing section that cools the resulting battery-active material. Each of the processing sections may be a continuous flow tubular component. The first and third processing sections may be metal, and the second processing section may be a refractory material for high temperature service. The battery-active material is collected using a solids collector.

Abstract: Apparatus and methods of forming a battery-active material are described. An apparatus includes a first processing section that raises the temperature of a precursor material to a reaction threshold temperature, a second processing section that converts the precursor material to a battery-active material, and a third processing section that cools the resulting battery-active material. Each of the processing sections may be a continuous flow tubular component. The first and third processing sections may be metal, and the second processing section may be a refractory material for high temperature service. The battery-active material is collected using a solids collector.

Abstract: An apparatus comprising a first plate having a plurality of v-shaped grooves to hold a set of optical fibers and a second plate having a v-shaped groove to hold a secondary optical fiber is disclosed. In one embodiment, the second plate being movable relative to the first plate, so that the secondary optical fiber can be selectively coupled to one of the optical fibers of the first set of optical fibers.

Abstract: Mechanisms for supporting, rotating, cooling and energizing a cylindrical target structure in a magnetron through supports at each end of the target structure. Two specific configurations are described. Particular arrangements of magnets are provided within the target cylinder. Two adjacent rotating target cylinders may optionally be employed in order to increase the rate of depositing sputtered material on a substrate. The various features of this invention are particularly adapted for a large-scale cylindrical magnetron used for sputtering coatings on architectural glass panels, automobile windshields and the like, but are also advantageous for use in coating very small substrates.

Abstract: In apparatus for transporting semiconductor wafers, a spatula contains a single major recess for receiving a wafer. Adjacent one edge of the recess is a shoulder for locating the wafer in the sequence of operations for loading the spatula. As a result of the sequence, the center of the wafer is held at a predetermined, known location.

Abstract: In apparatus for transporting semiconductor wafers, a spatula contains a single major recess for receiving a wafer. Adjacent one edge of the recess is a shoulder for locating the wafer in the sequence of operations for loading the spatula. As a result of the sequence, the center of the wafer is held at a predetermined, known location.

Abstract: An improved plasma reaction chamber is described in which the interior electrode is readily removed. The interior electrode may comprise a variety of materials, including metallized plastic, thus enabling a disposable electrode and a greater variety of plasmas to be used.

Abstract: A plasma reactor apparatus providing improved uniformity of etching and having a totally active reaction volume. The reactor apparatus is comprised of two electrically separated electrodes which bound a reaction volume. The topmost electrode functions as both a gas distribution manifold for uniformly injecting reactant gases into the reaction volume and as an exhaust manifold for uniformly withdrawing reaction products from the reaction volume. The two electrodes are so configured that the plasma reaction takes place only between the electrodes; there is no inactive space surrounding the electrodes to fill with plasma. The configuration is thus conservative of both reactants and energy. The bottommost plate which serves as a workpiece holder is movable with respect to the upper plate to permit loading and unloading of workpieces. The uppermost plate is the active RF electrode while the workpiece holder is maintained at a RF ground potential.