Patents by Inventor Joseph Cramer
Joseph Cramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230141495Abstract: Disclosed is a method of determining a sampling scheme. The method comprises obtaining a parallel sensor description and identifying a plurality of candidate acquisition configurations based on said parallel sensor description and potential metrology locations. Each of said candidate acquisition configurations is evaluated in terms of an evaluation metric and a candidate acquisition configuration is selected based on said evaluation. The corresponding metrology locations for the selected acquisition configuration is added to the sampling scheme.Type: ApplicationFiled: March 10, 2021Publication date: May 11, 2023Applicant: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph CRAMER, Patricius Aloysius Jacobus TINNEMANS, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Jochem Sebastiaan WILDENBERG
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Publication number: 20230064193Abstract: Disclosed is a method of measuring a periodic structure on a substrate with illumination radiation having at least one wavelength, the periodic structure having at least one pitch. The method comprises configuring, based on a ratio of said pitch and said wavelength, one or more of: an illumination aperture profile comprising one or more illumination regions in Fourier space; an orientation of the periodic structure for a measurement; and a detection aperture profile comprising one or more separated detection regions in Fourier space. This configuration is such that: i) diffracted radiation of at least a pair of complementary diffraction orders is captured within the detection aperture profile, and ii) said diffracted radiation fills at least 80% of the one or more separated detection regions. The periodic structure is measured while applying the configured one or more of illumination aperture profile, detection aperture profile and orientation of the periodic structure.Type: ApplicationFiled: January 20, 2021Publication date: March 2, 2023Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Patrick WARNAAR, Vasco Tomas TENNER, Hugo Augustinus Joseph CRAMER, Bram Antonius Gerardus LOMANS, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Ahmet Burak CUNBUL, Alexander Prasetya KONIJNENBERG
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Publication number: 20230042759Abstract: A method including: computing a value of a first variable of a pattern of, or for, a substrate processed by a patterning process by combining a fingerprint of the first variable on the substrate and a certain value of the first variable; and determining a value of a second variable of the pattern based at least in part on the computed value of the first variable.Type: ApplicationFiled: October 18, 2022Publication date: February 9, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo Tel, Frank Staals, Mark John Maslow, Roy Anunciado, Marinus Jochemsen, Hugo Augustinus Joseph Cramer, Thomas Theeuwes, Paul Christiaan Hinnen
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Patent number: 11556060Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.Type: GrantFiled: August 30, 2019Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Seyed Iman Mossavat, Bastiaan Onne Fagginger Auer, Remco Dirks, Alexandru Onose, Hugo Augustinus Joseph Cramer
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Patent number: 11520239Abstract: A method including: computing a value of a first variable of a pattern of, or for, a substrate processed by a patterning process by combining a fingerprint of the first variable on the substrate and a certain value of the first variable; and determining a value of a second variable of the pattern based at least in part on the computed value of the first variable.Type: GrantFiled: February 17, 2017Date of Patent: December 6, 2022Assignee: ASML Netherlands B.V.Inventors: Wim Tjibbo Tel, Frank Staals, Mark John Maslow, Roy Anunciado, Marinus Jochemsen, Hugo Augustinus Joseph Cramer, Thomas Theeuwes, Paul Christiaan Hinnen
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Publication number: 20220350260Abstract: Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.Type: ApplicationFiled: September 3, 2020Publication date: November 3, 2022Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Armand Eugene Albert, Justin Lloyd KREUZER, Nikhil MEHTA, Patrick WARNAAR, Vasco Tomas TENNER, Patricius Aloysius Jacobus TINNEMANS, Hugo Augustinus Joseph CRAMER
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Publication number: 20220326625Abstract: A method of evaluating a patterning process, the method including: obtaining the result of a first measurement of a first metrology target; obtaining the result of a second measurement of a second metrology target, the second metrology target having a structural difference from the first metrology target that generates a sensitivity difference and/or an offset, of a process parameter of the patterning process between the first and second metrology targets; and determining a value pertaining to the patterning process based on the results of the first and second measurements.Type: ApplicationFiled: June 9, 2022Publication date: October 13, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Bert VERSTRAETEN, Hugo Augustinus Joseph CRAMER, Thomas THEEUWES
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Publication number: 20220260929Abstract: A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device includes target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The patterning device includes product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that the at least one target has at least one boundary which is neither parallel nor perpendicular with respect to the product structures on the substrate.Type: ApplicationFiled: July 6, 2020Publication date: August 18, 2022Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nikhil MEHTA, Maurits VAN DER SCHAAR, Markus Gerardus Martinus Maria VAN KRAAIJ, Hugo Augustinus Joseph CRAMER, Olger Victor ZWIER, Jeroen COTTAAR, Patrick WARNAAR
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Patent number: 11385551Abstract: A method of evaluating a patterning process, the method including: obtaining the result of a first measurement of a first metrology target; obtaining the result of a second measurement of a second metrology target, the second metrology target having a structural difference from the first metrology target that generates a sensitivity difference and/or an offset, of a process parameter of the patterning process between the first and second metrology targets; and determining a value pertaining to the patterning process based on the results of the first and second measurements.Type: GrantFiled: August 16, 2017Date of Patent: July 12, 2022Assignee: ASML Netherlands B.V.Inventors: Bert Verstraeten, Hugo Augustinus Joseph Cramer, Thomas Theeuwes
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Publication number: 20220121127Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: December 27, 2021Publication date: April 21, 2022Applicant: ASML Netherlands B.V.Inventors: Nitesh PANDEY, Arie Jeffrey DEN BOEF, Duygu AKBULUT, Marimus Johannes Maria VAN DAM, Hans BUTLER, Hugo Augustinus Joseph CRAMER, Engelbertus Antonius Franciscus VAN DER PASCH, Ferry ZIJP, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Marinus Petrus REIJNDERS
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Patent number: 11262661Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: June 5, 2019Date of Patent: March 1, 2022Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Publication number: 20210384086Abstract: A method of determining overlay of a patterning process, the method including: obtaining a detected representation of radiation redirected by one or more physical instances of a unit cell, wherein the unit cell has geometric symmetry at a nominal value of overlay and wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the one or more physical instances of the unit cell; and determining, from optical characteristic values from the detected radiation representation, a value of a first overlay for the unit cell separately from a second overlay for the unit cell that is also obtainable from the same optical characteristic values, wherein the first overlay is in a different direction than the second overlay or between a different combination of parts of the unit cell than the second overlay.Type: ApplicationFiled: August 20, 2021Publication date: December 9, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard MC NAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER
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Publication number: 20210335678Abstract: A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.Type: ApplicationFiled: July 9, 2021Publication date: October 28, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard Mc NAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER
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Publication number: 20210325174Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.Type: ApplicationFiled: May 7, 2021Publication date: October 21, 2021Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela, Martin Jacobus Johan Jak
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Patent number: 11145557Abstract: A method of configuring a parameter determination process, the method including: obtaining a mathematical model of a structure, the mathematical model configured to predict an optical response when illuminating the structure with a radiation beam and the structure having geometric symmetry at a nominal physical configuration; using, by a hardware computer system, the mathematical model to simulate a perturbation in the physical configuration of the structure of a certain amount to determine a corresponding change of the optical response in each of a plurality of pixels to obtain a plurality of pixel sensitivities; and based on the pixel sensitivities, determining a plurality of weights for combination with measured pixel optical characteristic values of the structure on a substrate to yield a value of a parameter associated with change in the physical configuration, each weight corresponding to a pixel.Type: GrantFiled: February 14, 2020Date of Patent: October 12, 2021Assignee: ASML Netherlands B.V.Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer
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Publication number: 20210302845Abstract: A method of evaluating a patterning process, the method including: obtaining the result of a first measurement of a first metrology target; obtaining the result of a second measurement of a second metrology target, the second metrology target having a structural difference from the first metrology target that generates a sensitivity difference and/or an offset, of a process parameter of the patterning process between the first and second metrology targets; and determining a value pertaining to the patterning process based on the results of the first and second measurements.Type: ApplicationFiled: August 16, 2017Publication date: September 30, 2021Inventors: Bert VERSTRAETEN, HUGO JOSEPH CRAMER AUGUSTINUS, THOMAS THEEUWES
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Publication number: 20210295991Abstract: Identification and monitoring of healthcare issues includes determining how to process input data based on at least one of identity of a user device that transmits the input data to the system and categorization of the input data. A new record is created in a database of healthcare issues in a healthcare facility where the user device is located when the input data is received. Anonymous reporting of issues is supported by storing an identifier of the user device that transmits the input data to the system, so that the anonymous reporter can be invited by a manager to join in an anonymous chat session. Recording of data during supervisor walkrounds is supported by setting up scheduled walkrounds with default labels to simplify input of identified healthcare issues, while allowing for custom labels to be entered when needed.Type: ApplicationFiled: April 7, 2021Publication date: September 23, 2021Applicant: SAFE & RELIABLE HEALTHCARE LLCInventors: Allan S. FRANKEL, Michael W. LEONARD, Terri CHRISTENSEN FRANKEL, Joshua PROULX, Daniel Joseph CRAMER, John D. DUCE, Jared GOODEY, Chad LANENGA
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Patent number: 11101185Abstract: A method of determining overlay of a patterning process, the method including: obtaining a detected representation of radiation redirected by one or more physical instances of a unit cell, wherein the unit cell has geometric symmetry at a nominal value of overlay and wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the one or more physical instances of the unit cell; and determining, from optical characteristic values from the detected radiation representation, a value of a first overlay for the unit cell separately from a second overlay for the unit cell that is also obtainable from the same optical characteristic values, wherein the first overlay is in a different direction than the second overlay or between a different combination of parts of the unit cell than the second overlay.Type: GrantFiled: December 19, 2019Date of Patent: August 24, 2021Assignee: ASML Netherlands B.V.Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer
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Patent number: 11101184Abstract: A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.Type: GrantFiled: September 17, 2019Date of Patent: August 24, 2021Assignee: ASML Netherlands B.V.Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer
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Patent number: 11099489Abstract: The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.Type: GrantFiled: December 12, 2019Date of Patent: August 24, 2021Assignee: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph Cramer, Hilko Dirk Bos, Erik Johan Koop, Armand Eugene Albert Koolen, Han-Kwang Nienhuys, Alessandro Polo, Jin Lian, Arie Jeffrey Den Boef