Patents by Inventor Joseph D. Lichtenhan
Joseph D. Lichtenhan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090176006Abstract: Nanostructured chemicals such as polyhedral oligomeric silsesquioxanes, polyhedral oligomeric silicates, and polyhedral oligomeric metallasesquioxanes are attached to living and nonliving systems as biomaterials to provide a nanoscopic topology that favors biomimetic function and cellular modulation. The resulting surface is nanoscopically thin, nanoscopically dispersed, provides systematic chemistry, surface area, surface volume, surface topology, and is essentially free of impurities, and has controllable properties through selection of composition, R groups, nanostructure size and topology. Highly shape specific and chemically tailorable nanostructured molecules are sized to biological material dimensions and are compatible with all sterilization methods.Type: ApplicationFiled: April 24, 2006Publication date: July 9, 2009Inventors: Jason T. Flodin, Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zhong An, Xuan Fu, Zachary Kemp
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Patent number: 7553904Abstract: A method of using olefin containing nanostructured chemicals and silanol containing nanostructured chemicals as high temperature resins is described. Vinyl containing nanostructured chemicals are particularity effective in thermosets as they control the motions of polymer chains, and segments, at the molecular level. Silanol containing nanostructured chemicals are particularity effective in thermosets containing polar groups as the silanol can enhance the reactivity of these groups. Because of their tailorable compatibility with fluorinated polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending and polymerization processes. The incorporation of a nanostructured chemical into a polymer favorably impacts a multitude of polymer physical properties. Properties most favorably improved are heat distortion and flammability characteristics, permeability, optical properties, texture, feel and durability.Type: GrantFiled: September 12, 2005Date of Patent: June 30, 2009Assignee: Hybrid Plastics, Inc.Inventors: Joseph D. Lichtenhan, Qibo Liu, Yan-Jyh Lee, Xuan Fu, Sukhendu Hait, Joseph J. Schwab, Rusty L. Blanski, Patrick N. Ruth
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Publication number: 20090085011Abstract: A composition for shielding living tissue from cosmic radiation exposure during air and space flights, using polyhedral oligomeric silsesquioxanes incorporating metals with high neutron capture cross-sections. Methods for incorporation of such compositions into textiles, garments, and skin lotions are described.Type: ApplicationFiled: September 29, 2008Publication date: April 2, 2009Inventors: Joseph D. Lichtenhan, Paul Wheeler, Xuan Fu
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Publication number: 20090082502Abstract: A method of using metallized polyhedral oligomeric silsesquioxanes as cure promoters and catalysts for polyurethanes.Type: ApplicationFiled: May 21, 2008Publication date: March 26, 2009Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Xuan Fu
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Publication number: 20080262162Abstract: Metallized nanostructured chemicals are incorporated at the molecular level as alloying agents for the reinforcement of polymer microstructures, including polymer coils, domains, chains, and segments. Direct blending processes are effective because of the tailorable compatibility of the metallized nanostructured chemicals with polymers.Type: ApplicationFiled: August 21, 2006Publication date: October 23, 2008Inventors: Joseph D. Lichtenhan, Xuan Fu, Joseph J. Schwab, Paul Wheeler, H.C.L. Abbenhuis
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Publication number: 20080249275Abstract: Nanoscopic metallized and nonmetallized nanoscopic silicon containing agents including polyhedral oligomeric silsesquioxane and polyhedral oligomeric silicate provide radiation absorption and in situ formation of nanoscopic glass layers on material surfaces. These property improvements are useful in space-survivable materials, microelectronic packaging, and radiation absorptive paints, coatings and molded articles.Type: ApplicationFiled: August 30, 2007Publication date: October 9, 2008Inventors: Joseph D. Lichtenhan, Xuan Fu, Paul Wheeler
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Publication number: 20080221262Abstract: A method of using fluorinated-nanostructured POSS chemicals as alloying agents for the reinforcement of polymer microstructures, including polymer coils, domains, chains, and segments, at the molecular level. Because of their tailorable compatibility with nonfluorinated polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending processes. The incorporation of a nanostructured chemical into a polymer favorably impacts a multitude of polymer physical properties. Properties most favorably improved are surface properties, such as lubricity, contact angle, water repellency, deicing, surface tension, and abrasion resistance. Improved surface properties may be useful for applications such as anti-icing surfaces, non-wetting surfaces, low friction surfaces, self cleaning. Other properties improved include time dependent mechanical and thermal properties such as heat distortion, creep, compression set, shrinkage, modulus, hardness and biological compatibility.Type: ApplicationFiled: March 19, 2007Publication date: September 11, 2008Inventors: Joseph M. Mabry, Timothy S. Haddad, Sarah Anne Mazzella, Sukhendu B. Hait, Joseph J. Schwab, Joseph D. Lichtenhan
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Patent number: 7265194Abstract: This invention teaches the preparation and compositions of POSS nanostructured chemicals bearing a variety of onium-type surfactants. The surfactants serve as low-cost compatibilizing groups for polyhedral oligomeric silsesquioxane and polyhedral oligomeric silicate nanostructures with man-made polymer and biological systems. Variations of the surfactants also provide reactivity for the nanostructured chemicals with man-made and biological materials. The surfactant bearing nanostructured chemicals are useful as alloying agents is for controlling the structure and bulk physical properties of materials from the nanoscopic length scale. Alternately, the surfactants can be eliminated from the nanostructures to render the formation of nanoscopically dispersed silica particles.Type: GrantFiled: October 18, 2004Date of Patent: September 4, 2007Assignee: Hybrid Plastics Inc.Inventors: Joseph D. Lichtenhan, Joseph J. Schwab
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Patent number: 7217683Abstract: Nanoscale chemicals based on polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) are taught as lubricants, mold release agents, and as additives to control the viscosity, lubrication, wear, and thermal properties of conventional lubricous materials. The precisely defined nanoscopic dimensions of POSS materials enable viscosity, miscibility, and thermal properties to be (increased) or reduced (decreased) as desired. A key feature to the successful tailoring of properties is the inherent thermal and chemical stability of the POSS/POS nanostructure and the ability to control its topology and chemical potential to match that of surfaces and other materials.Type: GrantFiled: September 5, 2002Date of Patent: May 15, 2007Inventors: Rusty L. Blanski, Shawn H. Phillips, Stephen L. Rodgers, Joseph D. Lichtenhan, Joseph J. Schwab
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Patent number: 7193015Abstract: A method of using nanostructured chemicals as alloying agents for the reinforcement of flouropolymer microstructures, including polymer coils, domains, chains, and segments, at the molecular level. Because of their tailorable compatibility with fluorinated polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending processes. Properties most favorably improved are time dependent mechanical and thermal properties such as heat distortion, creep, compression set, shrinkage, modulus, hardness and abrasion resistance. In addition to mechanical properties, other physical properties are favorably improved, including lower thermal conductivity, fire resistance, and improved oxygen permeability. These improved properties may be useful in a number of applications, including space-survivable materials and creep resistant seals and gaskets. Improved surface properties may be useful for applications such as anti-icing or non-wetting surfaces or as low friction surfaces.Type: GrantFiled: March 31, 2004Date of Patent: March 20, 2007Inventors: Joseph M. Mabry, Rene I. Gonzalez, Rusty L. Blanski, Patrick N. Ruth, Brent D. Viers, Joseph J. Schwab, Joseph D. Lichtenhan
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Patent number: 6972312Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]??, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]28 where ?=1-1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.Type: GrantFiled: August 4, 2000Date of Patent: December 6, 2005Assignee: Hybrid Plastics LLCInventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zong An, William Reinerth, Michael J. Carr, Frank J. Feher, Raquel Terroba, Qibo Liu
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Patent number: 6933345Abstract: The nanoscopic dimensions of polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) materials ranges from 0.7 nm to 5.0 nm and enables the thermomechanical and physical properties of polymeric materials to be improved by providing nanoscopic reinforcement of polymer chains at a length scale that is not possible by physically smaller aromatic chemical systems or larger fillers and fibers. A simple and cost effective method for incorporating POSS/POS nanoreinforcements onto polymers via the reactive grafting of suitably functionalized POSS/POS entities with polymeric systems amenable to such processes is described. The method teaches that the resulting POSS-grafted-polymers are particularly well suited for alloying agents by nongrafted POSS entitles such as molecular silicas. The successful alloying of POSS-polymers is aided because their interfacial tensions are reduced relative to non-POSS containing systems.Type: GrantFiled: January 23, 2003Date of Patent: August 23, 2005Assignee: Hybrid Plastics, LLPInventors: Joseph D. Lichtenhan, Frank J. Feher, Joseph J. Schwab, Sixun Zheng
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Patent number: 6927270Abstract: Efficient processes have been developed for the cost effective functionalization of polyhedral oligomeric silsesquioxane-silanols (POSS-Silanols) and for the manufacture of polyfunctional polyhedral oligomeric silsesquioxanes. The processes utilize the action of bases or acids on silane coupling agents. The preferred process utilizes base to promote the silylation of POSS-Silanols of the formula [(RSiO1.5)n(R(HO)SiO1.0)m]?# with silane coupling agents to form POSS species with functionalized incompletely condensed nanostructures [(RSiO1.5)n(R(YSiR2O)SiO1.0)m]?# or functionalized completely condensed nanostructures [(RSiO1.5)n(YSiO1.5)1]?#. The process can alternately be conducted with acids. A second process utilizes base to alkylate POSS-Silanols with functionalized alkyl halides. A third related process utilizes base to react with silane coupling agents to form polyfunctional, fully condensed POSS species of formula [(YSiO1.5)n]?#. This process can also alternately be conducted under acidic conditions.Type: GrantFiled: June 27, 2002Date of Patent: August 9, 2005Assignee: Hybrid Plastics LLPInventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zhong An, Qibo Liu, Timothy S. Haddad
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Patent number: 6911518Abstract: Processes have been developed for the manufacture of polyhedral oligomeric silsesquioxanes (POSS), polysilsesquioxanes, polyhedral oligomeric silicates (POS), and siloxane molecules bearing reactive ring-strained cyclic olefins (e.g. norbornenyl, cyclopentenyl, etc. functionalities). The preferred manufacturing processes employ the silation of siloxides (Si—OA, where A=H, alkaline or alkaline earth metals) with silane reagents that contain at least one reactive ring-strained cyclic olefin functionality [e.g., X3-ySi(CH3)y(CH2)2 where y=1-2 and X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO, and R]. Alternatively, similar products can be prepared through hydrosilation reactions between silanes containing at least one silicon-hydrogen bond (Si—H) with ring-strained cyclic olefin reagents [e.g., 5-vinyl, 2 norbornene CH2?CH, cyclopentadiene]. The two processes can be effectively practiced using polymeric silsesquioxanes [RSiO1.Type: GrantFiled: December 21, 2000Date of Patent: June 28, 2005Assignee: Hybrid Plastics, LLCInventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zong An, William Reinerth, Frank J. Feher
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Patent number: 6770724Abstract: Method is provided for selectively opening rings of polyhedral oligomeric silsesquioxane (POSS) compounds to from functionalized derivatives thereof or new POSS species. Per the inventive method, the POSS compound is reacted with an acid to selectively cleave bonds in the POSS rings to add functionalities thereto for grafting, polymerization or catalysis, to thus form new familes of POSS derived compounds. Also provided are the new compounds so formed. Method is also provided for expanding rings of POSS compounds. Per the inventive method, a POSS compound is reacted with silane reagents to obtain an expanded POSS framework with added Si ring substituends to form new families of POSS compounds. Also provided are the new compounds so formed.Type: GrantFiled: February 16, 2001Date of Patent: August 3, 2004Assignee: The United States of America as represented by the Secretary of the Air ForceInventors: Joseph D. Lichtenhan, Timothy S. Haddad, Frank J. Feher, Daravong Soulivong
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Patent number: 6767930Abstract: Performance additives in high performance polymers using polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) as nanoscopic reinforcements, porosity control agents, thermal and oxidative stability aids to improve the properties of the polymers.Type: GrantFiled: September 9, 2002Date of Patent: July 27, 2004Inventors: Steven A. Svejda, Shawn H. Phillips, Rene I. Gonzalez, Frank J. Feher, Joseph D. Lichtenhan, Joseph J. Schwab, William A. Reinerth
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Publication number: 20040068075Abstract: Processes have been developed for the manufacture of polyhedral oligomeric silsesquioxanes (POSS), polysilsesquioxanes, polyhedral oligomeric silicates (POS), and siloxane molecules bearing reactive ring-strained cyclic olefins (e.g. norbornenyl, cyclopentenyl, etc. functionalities). The preferred manufacturing processes employ the silation of siloxides (SiOA, where A=H, alkaline or alkaline earth metals) with silane reagents that contain at least one reactive ring-strained cyclic olefin functionality [e.g., X3-ySi(CH3)y(CH2)2 where y=1-2 and X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO, and R]. Alternatively, similar products can be prepared through hydrosilation reactions between silanes containing at least one silicon-hydrogen bond (Si—H) with ring-strained cyclic olefin reagents [e.g., 5-vinyl, 2 norbornene CH2═CH, cyclopentadiene].Type: ApplicationFiled: August 23, 2001Publication date: April 8, 2004Applicant: Hybrid PlasticsInventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zong An, William Reinerth, Frank J. Feher
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Patent number: 6716919Abstract: A method of using nanostructured chemicals as alloying agents for the reinforcement of polymer microstructures, including polymer coils, domains, chains, and segments, at the molecular level. Because of their tailorable compatibility with polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending processes. The incorporation of a nanostructured chemical into a polymer favorably impacts a multitude of polymer physical properties. Properties most favorably improved are time dependent mechanical and thermal properties such as heat distortion, creep, compression set, shrinkage, modulus, hardness and abrasion resistance. In addition to mechanical properties, other physical properties are favorably improved, including lower thermal conductivity, fire resistance, and improved oxygen permeability.Type: GrantFiled: March 26, 2001Date of Patent: April 6, 2004Assignee: Hybrid PlasticsInventors: Joseph D. Lichtenhan, Joseph J. Schwab, Andre Lee, Shawn Phillips
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Patent number: 6660823Abstract: Method is provided for controlling the stereo chemistry of functionalities or X groups to exo or endo positions on a polyhedral oligomeric silsesquioxane (POSS) compound by adding certain reagents to said X groups to change one or more positions thereof to endo or exo. Also provided are the POSS species formed by the above inventive method. Method is also provided for inserting a ring substituent into a POSS compound. Also provided are the POSS species formed by such inventive method.Type: GrantFiled: November 14, 2000Date of Patent: December 9, 2003Assignee: The United States of America as represented by the Secretary of the Air ForceInventors: Joseph D. Lichtenhan, Frank J. Feder, Daravong Soulivong
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Publication number: 20030055193Abstract: Efficient processes have been developed for the cost effective functionalization of polyhedral oligomeric silsesquioxane-silanols (POSS-Silanols) and for the manufacture of polyfunctional polyhedral oligomeric silsesquioxanes. The processes utilize the action of bases or acids on silane coupling agents. The preferred process utilizes base to promote the silylation of POSS-Silanols of the formula [(RSiO1 5)n(R(HO)SiO1 0)m]&Sgr;# with silane coupling agents to form POSS species with functionalized incompletely condensed nanostructures [(RSiO1 5)n(R(YSiR2O)SiO1 0)m]&Sgr;# or functionalized completely condensed nanostructures [(RSiO1 5)n(YSiO1 5)1]&Sgr;#. The process can alternately be conducted with acids. A second process utilizes base to alkylate POSS-Silanols with functionalized alkyl halides. A third related process utilizes base to react with silane coupling agents to form polyfunctional, fully condensed POSS species of formula [(YSiO1.5)n]&Sgr;#.Type: ApplicationFiled: June 27, 2002Publication date: March 20, 2003Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zhong An, Qibo Liu, Timothy S. Haddad