Abstract: The disclosure is directed to a coating consisting of a binary metal fluoride coating consisting a high refractive index metal fluoride layer on top of a substrate, a low refractive index metal fluoride layer on top of the high refractive index layer and layer of SiO2 or F—SiO2 containing 0.2 wt % to 4.5 (2000 ppm to 45,000 ppm) F on top of the low refractive index layer. In one embodiment the F content of F—SiO2 is in the range of 5000 ppm to 10,000 ppm F. The high index and low index materials are each deposited to a thickness of less than or equal to 0.9 quarter wave, and the capping material is deposited to a thickness in the range of 5 nm to 25 nm. The disclosure is also directed to optical elements having the foregoing coating and a method of making the coating.

Abstract: The disclosure is directed to a coating consisting of a binary metal fluoride coating consisting a high refractive index metal fluoride layer on top of a substrate, a low refractive index metal fluoride layer on top of the high refractive index layer and layer of SiO2 or F—SiO2 containing 0.2 wt % to 4.5 (2000 ppm to 45,000 ppm) F on top of the low refractive index layer. In one embodiment the F content of F—SiO2 is in the range of 5000 ppm to 10,000 ppm F. The high index and low index materials are each deposited to a thickness of less than or equal to 0.9 quarter wave, and the capping material is deposited to a thickness in the range of 5 nm to 25 nm. The disclosure is also directed to optical elements having the foregoing coating and a method of making the coating.

Abstract: The disclosure is directed to a coating consisting of a binary metal fluoride coating consisting a high refractive index metal fluoride layer on top of a substrate, a low refractive index metal fluoride layer on top of the high refractive index layer and layer of SiO2 or F—SiO2 containing 0.2 wt % to 4.5 (2000 ppm to 45,000 ppm) F on top of the low refractive index layer. In one embodiment the F content of F—SiO2 is in the range of 5000 ppm to 10,000 ppm F. The high index and low index materials are each deposited to a thickness of less than or equal to 0.9 quarter wave, and the capping material is deposited to a thickness in the range of 5 nm to 25 nm. The disclosure is also directed to optical elements having the foregoing coating and a method of making the coating.

Abstract: A flat glass sheet and a mold having a mold cavity defined by a shaping surface are provided. The shaping surface has a surface profile of a shaped glass article. At least one edge alignment pin is provided on the mold at an edge of the shaping surface. The glass sheet is leaned against the edge of the shaping surface such that an edge of the glass sheet abuts the edge alignment pin. The glass sheet is then heated. The glass sheet is sagged onto the shaping surface of the mold so that the glass assumes the surface profile of the shaped glass article and thereby form the shaped glass article. The edge alignment pin aligns the edge of the glass sheet with the mold cavity as the glass sheet sags onto the shaping of the mold. The shaped glass article is removed from the mold.

Abstract: A method for providing an actinic illumination energizes solid-state light sources in an array, wherein each solid-state light source emits actinic light of a predetermined wavelength, directs the emitted actinic light from the solid state light sources through one or more compound parabolic concentrators, and forms a field conjugate to an objective lens by directing the concentrated actinic light from each compound parabolic concentrator through one or more lens elements in a lens array. Emission of one or more of the solid state light sources is adjusted to obtain a predetermined illumination pupil envelope function.

Abstract: A telecentricity corrector is incorporated into a microlithographic projection system to achieve telecentricity targets at the output of the microlithographic projection system. The telecentricity corrector is located between an illuminator and a projection lens of the projection system, preferably just in advance of a reticle for controlling angular distributions of light illuminating the reticle.

Abstract: A flat glass sheet and a mold having a mold cavity defined by a shaping surface are provided. The shaping surface has a surface profile of a shaped glass article. At least one edge alignment pin is provided on the mold at an edge of the shaping surface. The glass sheet is leaned against the edge of the shaping surface such that an edge of the glass sheet abuts the edge alignment pin. The glass sheet is then heated. The glass sheet is sagged onto the shaping surface of the mold so that the glass assumes the surface profile of the shaped glass article and thereby form the shaped glass article. The edge alignment pin aligns the edge of the glass sheet with the mold cavity as the glass sheet sags onto the shaping of the mold. The shaped glass article is removed from the mold.

Abstract: A method for providing an actinic illumination energizes solid-state light sources in an array, wherein each solid-state light source emits actinic light of a predetermined wavelength, directs the emitted actinic light from the solid state light sources through one or more compound parabolic concentrators, and forms a field conjugate to an objective lens by directing the concentrated actinic light from each compound parabolic concentrator through one or more lens elements in a lens array. Emission of one or more of the solid state light sources is adjusted to obtain a predetermined illumination pupil envelope function.

Abstract: A telecentricity corrector is incorporated into a microlithographic projection system to achieve telecentricity targets at the output of the microlithographic projection system. The telecentricity corrector is located between an illuminator and a projection lens of the projection system, preferably just in advance of a reticle for controlling angular distributions of light illuminating the reticle.