Patents by Inventor Joseph D'Souza

Joseph D'Souza has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230376615
    Abstract: A method including receiving a request, via a network and from a remote user unauthorized to access a data package, for a quality score of the data package. A metric for evaluating the quality score is defined by the remote user. The method also includes receiving a rule. The rule is programmed to use, as input, the data package and generate, as output, the quality score. The rule is specified at least in part based on the metric. The method also includes generating the quality score by executing the rule on the data package. The method also includes transmitting, via the network, the quality score and a description of the data package while blocking access by the remote user to the data package.
    Type: Application
    Filed: May 18, 2022
    Publication date: November 23, 2023
    Inventors: Raaghav VERMA, Ravi SRIVASTAVA, Savio Joseph D'SOUZA
  • Patent number: 11782984
    Abstract: User experience parameters are applied in formatting results to a query for presentation. The user experience parameters correspond to at least one particular subject related to the query.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: October 10, 2023
    Assignee: Rovi Guides, Inc.
    Inventors: Ankur Anil Aher, Amith Joseph D'Souza, Nishchit Mahajan
  • Publication number: 20220138268
    Abstract: User experience parameters are applied in formatting results to a query for presentation. The user experience parameters correspond to at least one particular subject related to the query.
    Type: Application
    Filed: January 12, 2022
    Publication date: May 5, 2022
    Inventors: Ankur Anil Aher, Amith Joseph D'Souza, Nishchit Mahajan
  • Patent number: 11256753
    Abstract: User experience parameters are applied in formatting results to a query for presentation. The user experience parameters correspond to at least one particular subject related to the query.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: February 22, 2022
    Assignee: Rovi Guides, Inc.
    Inventors: Ankur Anil Aher, Amith Joseph D'Souza, Nishchit Mahajan
  • Publication number: 20200380041
    Abstract: User experience parameters are applied in formatting results to a query for presentation. The user experience parameters correspond to at least one particular subject related to the query.
    Type: Application
    Filed: May 31, 2019
    Publication date: December 3, 2020
    Inventors: Ankur Anil Aher, Amith Joseph D'Souza, Nishchit Mahajan
  • Publication number: 20150142588
    Abstract: A method of authorizing a transaction at a fuel pump includes receiving a user request to activate the pump, determining whether the user is authorized, determining whether the user is in the proximity of the pump, determining whether the pump is functional, determining whether the pump is already reserved for another user, and determining whether the pump is already in use. In response to those determinations, a message is displayed, either authorizing or declining the transaction.
    Type: Application
    Filed: May 29, 2014
    Publication date: May 21, 2015
    Applicant: SHELL OIL COMPANY
    Inventors: Peng Jong HUM, Christopher Joseph D'SOUZA, Athanasios KOKKINIOTIS
  • Patent number: 6633076
    Abstract: Methods and apparatus of the present invention deposit fluorinated silicate glass (FSG) in such a manner that it strongly adheres to an overlying or underlying barrier layer or etch stop layer, and has a lower dielectric constant, among other benefits. In one embodiment, silicon tetrafluoride (SiF4), oxygen (O2), and argon (Ar) are used as the reactant gases, with the ratio of oxygen to silicon controlled to be at between about 2:1 to 6:1. Such O2 levels help reduce the amount of degradation of ceramic chamber components otherwise caused by the elimination of silane from the process recipe.
    Type: Grant
    Filed: October 30, 2002
    Date of Patent: October 14, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Padmanabhan Krishnaraj, Robert Duncan, Joseph D'Souza, Alan W. Collins, Nasreen Chopra, Kimberly Branshaw
  • Publication number: 20030064556
    Abstract: Methods and apparatus of the present invention deposit fluorinated silicate glass (FSG) in such a manner that it strongly adheres to an overlying or underlying barrier layer or etch stop layer, and has a lower dielectric constant, among other benefits. In one embodiment, silicon tetrafluoride (SiF4), oxygen (O2), and argon (Ar) are used as the reactant gases, with the ratio of oxygen to silicon controlled to be at between about 2:1 to 6:1. Such O2 levels help reduce the amount of degradation of ceramic chamber components otherwise caused by the elimination of silane from the process recipe.
    Type: Application
    Filed: October 30, 2002
    Publication date: April 3, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Padmanabhan Krishnaraj, Robert Duncan, Joseph D'Souza, Alan W. Collins, Nasreen Chopra, Kimberly Branshaw
  • Patent number: 6511922
    Abstract: Methods and apparatus of the present invention deposit fluorinated silicate glass (FSG) in such a manner that it strongly adheres to an overlying or underlying barrier layer or etch stop layer, and has a lower dielectric constant, among other benefits. In one embodiment, silicon tetrafluoride (SiF4), oxygen (O2), and argon (Ar) are used as the reactant gases, with the ratio of oxygen to silicon controlled to be at between about 2:1 to 6:1. Such O2 levels help reduce the amount of degradation of ceramic chamber components otherwise caused by the elimination of silane from the process recipe.
    Type: Grant
    Filed: March 26, 2001
    Date of Patent: January 28, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Padmanabhan Krishnaraj, Robert Duncan, Joseph D'Souza, Alan W. Collins, Nasreen Chopra, Kimberly Branshaw
  • Publication number: 20020173167
    Abstract: Methods and apparatus of the present invention deposit fluorinated silicate glass (FSG) in such a manner that it strongly adheres to an overlying or underlying barrier layer or etch stop layer, and has a lower dielectric constant, among other benefits. In one embodiment, silicon tetrafluoride (SiF4), oxygen (O2), and argon (Ar) are used as the reactant gases, with the ratio of oxygen to silicon controlled to be at between about 2:1 to 6:1. Such O2 levels help reduce the amount of degradation of ceramic chamber components otherwise caused by the elimination of silane from the process recipe.
    Type: Application
    Filed: March 26, 2001
    Publication date: November 21, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Padmanabhan Krishnaraj, Robert Duncan, Joseph D'Souza, Alan W. Collins, Nasreen Chopra, Kimberly Branshaw